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2814-79-1

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2814-79-1 Usage

General Description

Ethylsilane, also known as ethylsilicon hydride, is a colorless, flammable gas with a strong, unpleasant odor. It is a type of organosilicon compound, with the chemical formula C2H7Si. Ethylsilane is commonly used as a precursor for the production of silicon-based materials, such as silicone rubbers and resins, as well as in the synthesis of specialty chemicals and pharmaceuticals. It is also used as a dopant in the semiconductor industry. However, ethylsilane is highly reactive and requires careful handling due to its flammability and potential for hazardous reactions with air and moisture. It is important to follow strict safety protocols and use proper protective equipment when working with ethylsilane.

Check Digit Verification of cas no

The CAS Registry Mumber 2814-79-1 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 2,8,1 and 4 respectively; the second part has 2 digits, 7 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 2814-79:
(6*2)+(5*8)+(4*1)+(3*4)+(2*7)+(1*9)=91
91 % 10 = 1
So 2814-79-1 is a valid CAS Registry Number.
InChI:InChI=1/C2H8Si/c1-2-3/h2H2,1,3H3

2814-79-1SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 18, 2017

Revision Date: Aug 18, 2017

1.Identification

1.1 GHS Product identifier

Product name ETHYLSILANE

1.2 Other means of identification

Product number -
Other names 1-Silapropane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:2814-79-1 SDS

2814-79-1Relevant articles and documents

Catalytic Disproportionation of Alkylsilanes over Sulfated ZrO2

Fujisawa, Hideo,Yamaguchi, Tsutomu

, p. 593 - 596 (1993)

Gas phase heterogeneous catalytic conversions of diethylsilane(E2), triethylsilane(E3) and diethyldimethylsilane(E2M2) were examined at 373 - 573 K in a closed recirculation reactor by using a sulfated ZrO2(SO3/ZrO2) catalyst. The catalyst exhibited high disproportionation activity even at 373 K.

Reaction of Hydrogen Peroxide with Organosilanes under Chemical Vapour Deposition Conditions

Moore, Darren L.,Taylor, Mark P.,Timms, Peter L.

, p. 2673 - 2678 (2007/10/03)

When a stream of vapour at low pressure which contained a mixture of H2O2 with an organosilane, RSiH3 (R = alkyl or alkenyl), impinged on a silicon wafer, deposition of oxide films of nominal composition RxSiO(2-0.5x), where x 3 or higher alkenyl groups. or higher alkenylgroups. Possible mechanism for the Si-C bond cleavage reaction are discussed, with energetic rearrangement of radical intermediates of type Si(H)(R)(OOH)' being favoured.

Infrared photochemistry of alkyl- and arylsilanes.

Francisco, J. S.,Joyce, S. A.,Steinfeld, J. I.,Walsh, F.

, p. 3098 - 3103 (2007/10/02)

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