Welcome to LookChem.com Sign In|Join Free

CAS

  • or

1631-46-5

1631-46-5

Post Buying Request

1631-46-5 Suppliers

Recommended suppliersmore

  • Product
  • FOB Price
  • Min.Order
  • Supply Ability
  • Supplier
  • Contact Supplier

1631-46-5 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 1631-46-5 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,6,3 and 1 respectively; the second part has 2 digits, 4 and 6 respectively.
Calculate Digit Verification of CAS Registry Number 1631-46:
(6*1)+(5*6)+(4*3)+(3*1)+(2*4)+(1*6)=65
65 % 10 = 5
So 1631-46-5 is a valid CAS Registry Number.
InChI:InChI=1/C4H12Ge/c1-3-5-4-2/h3-5H2,1-2H3

1631-46-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 18, 2017

Revision Date: Aug 18, 2017

1.Identification

1.1 GHS Product identifier

Product name DIETHYLGERMANE

1.2 Other means of identification

Product number -
Other names Diaethyl-dihydro-germanium

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1631-46-5 SDS

1631-46-5Related news

Adsorption and decomposition of DIETHYLGERMANE (cas 1631-46-5) on porous silicon surfaces07/24/2019

Diethylgermane [(CH3CH2)2GeH2], (DEG), is a potential molecular precursor for germanium deposition on silicon surfaces. In this study, Fourier transform infrared (FTIR) transmission spectroscopy was employed to examine the adsorption and decomposition of DEG on high surface area porous silicon s...detailed

1631-46-5Relevant articles and documents

Chemical Vapour Deposition of Germanium Films by Laser-induced Photolysis of Ethylgermanes

Pola, Josef,Parsons, Jonathan P.,Taylor, Roger

, p. 1637 - 1642 (2007/10/02)

Excimer laser photolysis of ethylgermanes EtnGeH4-n (n = 1-4) at 193 nm yields ethane, ethene and butane along with germanium deposited on the inner surface of the reactor.The distribution of gaseous products is remarkably different

Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1

What can I do for you?
Get Best Price

Get Best Price for 1631-46-5