19600-49-8Relevant academic research and scientific papers
METHOD FOR PRODUCING SALT
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, (2021/11/20)
According to the present invention, there is provided a method of producing a salt, including reacting M+X? with YH to generate XH and M+Y? and subsequently removing the generated XH to obtain the M+Y?. In the method of producing a salt, M+X? is a salt of a cation represented by M+ and an anion represented by X?, M+Y? is a salt of the cation represented by M+ and an anion represented by Y?, XH is a conjugate acid of X?, YH is a conjugate acid of Y?, M+Y? is a compound that generates an acid upon irradiation with an active ray or a radioactive ray, a pKa of XH is larger than a pKa of YH, and a ClogP value of XH is larger than 2.
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
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, (2012/11/13)
Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.
PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION
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, (2008/06/13)
A photosensitive composition includes (A) a compound represented by the following formula (I): wherein R1 to R13 each independently represents a hydrogen atom or a substituent, Z represents a single bond or a divalent linking group, and X? represents an anion containing a proton acceptor functional group.
Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition
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Page/Page column 103, (2009/01/23)
A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.
Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition
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, (2008/06/13)
A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiat
