19600-49-8Relevant academic research and scientific papers
METHOD FOR PRODUCING SALT
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Paragraph 0262-0263, (2021/11/20)
According to the present invention, there is provided a method of producing a salt, including reacting M+X? with YH to generate XH and M+Y? and subsequently removing the generated XH to obtain the M+Y?. In the method of producing a salt, M+X? is a salt of a cation represented by M+ and an anion represented by X?, M+Y? is a salt of the cation represented by M+ and an anion represented by Y?, XH is a conjugate acid of X?, YH is a conjugate acid of Y?, M+Y? is a compound that generates an acid upon irradiation with an active ray or a radioactive ray, a pKa of XH is larger than a pKa of YH, and a ClogP value of XH is larger than 2.
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
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, (2012/11/13)
Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.
Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition
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Page/Page column 103, (2009/01/23)
A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.
PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION
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, (2008/06/13)
A photosensitive composition includes (A) a compound represented by the following formula (I): wherein R1 to R13 each independently represents a hydrogen atom or a substituent, Z represents a single bond or a divalent linking group, and X? represents an anion containing a proton acceptor functional group.
Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition
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, (2008/06/13)
A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiat
