216581-76-9Relevant articles and documents
Photoresist resin monomer containing Meldrum's acid structure and synthesis method thereof
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Paragraph 0038-0042, (2021/04/17)
The invention discloses a photoresist resin monomer containing a Meldrum's acid structure, and relates to the field of photoresist resin monomers. The structural formula of the photoresist resin monomer is shown in the specification, R1 is methyl or H, R2 is alkyl, naphthenic base, alkyl containing O atoms, or naphthenic base containing O atoms, R3 is H or alkyl, and the resin monomer is beneficial to increase of the alkali solubility of the photoresist resin, the edge side roughness of a photo-etched pattern can be improved, the etching resistance is better, the resolution of the photo-etched pattern is greatly improved, and the adsorption force of the photoresist on a silicon wafer can be improved.
Chemical amplifying type positive resist composition
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, (2008/06/13)
A chemical amplifying type positive resist composition, excellent in balance of performance of resolution and sensitivity, having high dry etching resistance and comprising; a resin having a polymerization unit derived from a monomer represented by the following formula (I): wherein R1 and R2 independently represent hydrogen or an alkyl group having 1 to 4 carbons, and R3 represents hydrogen or a methyl group, the resin being insoluble in alkali itself but becoming alkali-soluble due to the action of an acid; and an acid generating agent is provided.
POLYMERIZABLE ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME
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, (2008/06/13)
A compound shown by the following formula: ???wherein each of R1a, R2a, R3aand R4arepresents a substituent selected from a non-reactive atom, a non-reactive group, a hydroxyl group and an amino group, and at least two members selected from R1a, R2a, R3aand R4aare a hydroxyl group, a carboxyl group or an amino group; is subjected to an esterification reaction or an amidation reaction with a polymerizable unsaturated compound (e.g., an alcohol, a carboxylic acid, an amine) in the presence of a catalyst comprising an element selected from the Group 3 elements, such as a samarium compound, to obtain a polymerizable adamantane derivative having at least one polymerizable unsaturated group in high yield.