22705-33-5

Usage

Uses

Used in Semiconductor Industry:
BIS(DIMETHYLAMINO)METHYLSILANE is used as a precursor for chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. These processes are essential for the formation of thin films on surfaces, which are crucial in the semiconductor industry for creating various electronic components and devices. BIS(DIMETHYLAMINO)METHYLSILANE's properties make it a valuable material in this field, contributing to the development and manufacturing of advanced semiconductor technologies.

InChI:InChI=1/C5H15N2Si/c1-6(2)8(5)7(3)4/h1-5H3

Synthetic route

Dichloromethylsilane (75-54-7) + dimethyl amine (124-40-3) → bis(dimethylamino)(methyl)silane (22705-33-5)

Conditions	Yield
In diethyl ether

dimethyl sulfide-arachno-nonaborane (32357-02-1) + bis(dimethylamino)(methyl)silane (22705-33-5) → 9-(dimethylamine)-6-methyl-6-sila-arachno-decaborane(12) (176704-47-5)

Conditions	Yield
In neat (no solvent) N2-atmosphere; stirring (80°C, overnight); evapn., C6H6 addn., recrystn. (C6H6 / hexane); elem. anal.;	85%

nido-decaborane (17702-41-9) + bis(dimethylamino)(methyl)silane (22705-33-5) → 1,2-dimethyl-1,2-disila-closo-dodecaborane(12) (128270-48-4) + 6,9-(Me2NH)2B10H12 (128270-50-8)

Conditions	Yield
In neat (no solvent) in inert atmosphere; slow addn. of the Si-compd. by syringe to the B-compd., stirring of the react. mixt. while the temp. is slowly raised to 80°C, stirring 5 min. at this temp., after ceasing of gas evolution stirring for 48 h at 110°C; cooling to room temp., removing of volatiles under reduced pressure, suspending of residue (toluene), stirring (room temp., overnight), filtn., storing (3°C 8 h, -12°C), filtn., concg., cooling: silaborane, complete evapn.: aminoborane;	A 25% B 72%
In toluene in inert atmosphere; dropwise addn. (with stirring at room temp.) of the Si-compd. to the B-compd. in dry toluene, stirring and heating at reflux under Ar for 24 h; filtn. and evapn. of the filtrate (reduced pressure), extn. of residue (hot benzene), filtn. of extracts, cooling to 3°C, pptn. of silaborane, isolation of aminoborane by evapn. of the remaining soln. (detection: NMR, mass spectra); elem. anal.;	A 15% B 58%

nido-decaborane (17702-41-9) + bis(dimethylamino)(methyl)silane (22705-33-5) → 1,2-dimethyl-1,2-disila-closo-dodecaborane(12) (128270-48-4) + {(CH3)2NH}2B10H12

Conditions	Yield
In toluene byproducts: H2, (CH3)2NH; under Ar, dropwise addn. of silan to soln. of borane at room temp., reflux for 24 h; filtn. from withe solid, evapn. of filtrate, extn. of residue with hot benzene, (1)H- and (11)B-NMR and MS detn. of the aminoborane, sublimation of disilaborane, elem. anal.;	A 15% B 58%

Dichloromethylsilane (75-54-7) + decaborane(14) + bis(dimethylamino)(methyl)silane (22705-33-5) → 1,2-dimethyl-1,2-disila-closo-dodecaborane(12) (128270-48-4)

Conditions	Yield
In neat (no solvent) N2 atm.; Cl2SiH(Me) as solvent, stirring (overnight, 40°C), heating (115°C, 6 h); evapn. (vac.), sublimation (120°C, vac.);	24.7%

bis(dimethylamino)(methyl)silane (22705-33-5) + 4-nitrobenzaldehdye (555-16-8) → (4-nitrobenzyloxy)bis(dimethylamino)(methyl)silane

Conditions	Yield
With bis(perfluorocatecholato)silane In dichloromethane-d2 at 25℃; for 0.5h;	92 %Spectr.

Upstream product

• 75-54-7 Dichloromethylsilane 
• 124-40-3 dimethyl amine 

Relevant academic research and scientific papers

Chloraminosilanes II. Preparation and spectroscopic studies on alkyl-(dimethylamino)chlorosilanes

Several new compounds containing both chloro and dimethylamino groups linked to silicon have been prepared. The general method involved reacting a solution of the appropriate polychlorosilane in ether at ca. - 50° with a chilled ethereal solution of dimethylamine. Prepared in this fashion were CH3Si(NMe2)Cl2, CH3Si(NMe2)2-Cl, PhSi(NMe2)Cl2, PhSi(NMe2)2Cl, CH3(H)Si(NMe2)Cl, (CH3)2Si(NMe2)Cl, CH2CH(CH3)Si(NMe2)Cl, and Ph2Si(NMe2)Cl. Comparison of the spectra of these compounds with those in the perhalo and peramine series showed that replacement of NMe2 for Cl resulted in an upfield shift of the resonances of the other groups linked to silicon, a shift which parallels that observed upon substitution of CH3 for Cl. The relationship of ν(SiH) in the IR and δ(SiH) in the NMR spectra was linear.