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bis(trichlorosilyl)bis(trimethylgermyl)silane is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

239478-65-0

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239478-65-0 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 239478-65-0 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 2,3,9,4,7 and 8 respectively; the second part has 2 digits, 6 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 239478-65:
(8*2)+(7*3)+(6*9)+(5*4)+(4*7)+(3*8)+(2*6)+(1*5)=180
180 % 10 = 0
So 239478-65-0 is a valid CAS Registry Number.

239478-65-0SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name bis(trichlorosilyl)bis(trimethylgermyl)silane

1.2 Other means of identification

Product number -
Other names -

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:239478-65-0 SDS

239478-65-0Downstream Products

239478-65-0Relevant academic research and scientific papers

Trichlorosilylation of chlorogermanes and chlorostannanes with HSiCl3/Net3 followed by base-catalysed formation of (Me3Ge)2Si(SiCl3)2 and related branched stannylsilanes

Mueller, Lars,Du Mont, Wolf-Walther,Ruthe, Frank,Jones, Peter G.,Marsmann, Heinrich C.

, p. 156 - 163 (2007/10/03)

Chlorotrimethylgermane 1 and dichlorodimethylgermane 4 react with trichlorosilane and triethylamine to provide trichlorosilylgermanes Me4-nGe(SiCl3)n (n = 1: 2; n = 2: 5) in fair yields, as distillable liquids. The formation of 2 is followed by base-catalysed decomposition reactions leading to novel solid (Me3Ge)2Si(SiCl3)2 3. Chlorotrialkylstannanes 6a-c (6a: R = CH3, 6b: R = C2H5, 6c: R = n-C4H9) react with trichlorosilane and triethylamine providing the branched silylstannanes (R3Sn)2Si(SiCl3)2 7a-c and traces of silylstannanes R3SnSiCl3 8a-c. Only 7a was isolated in a pure state. Heating 7a or crude 7b and 7c with benzyl chloride leads to the formation of benzyltrichlorosilane (10). The constitution of compounds 2, 3, 5 and 7a was confirmed by MS, NMR and analytical data. The structures of C6D6-solvated 3 and C6H6-solvated 7a were determined by X-ray diffraction, and shown to be isotypic.

Intermediates and products of the hexachlorodisilane cleavage of group 14 element phosphanes and amines - Molecular structure of di-tert- butyl(trichlorosilyl)phosphane in the gas phase determined by electron diffraction and ab Initio calculations

Du Mont, Wolf-W.,Müller, Lars,Martens, Reiner,Papathomas, Paul M.,Smart, Bruce A.,Robertson, Heather E.,Rankin, David W. H.

, p. 1381 - 1392 (2007/10/03)

Reactions of dialkyl(trimethylsilyl)phosphanes RR'PSiMe3 (1: R, R' = tBu; 3: R, R' = iPr; 5: R = iPr, R' = tBu) with Si2Cl6 provide stable trichlorosilylphosphanes RR'PSiCl3 (2, 4, 6); the reactions of silyl- and stannylamines of iPr2NMMe3 (M = Si: 11; M = Sn: 12) with Si2Cl6, however, provide the stable pentachlorodisilanylamine iPr2NSi2Cl5 (13). Heating of 1 with the technical mixture Me2(Cl)SiSiCl2Me/(MeCl2Si)2 yields the stable silylphosphane tBu2PSiMe2Cl (8) and the disilanylphosphane tBu2PSi(Me)(Cl)Si(Me)Cl2 (9). Methylation of 9 with MeLi gave tBu2PSi2Me5 10, which was isolated in a pure state. Reactions of tBu(iPr)PSiMe3 (5) and of organometal phosphanes tBu(iPr)PMR3 (14: M = Ge, R = Me; 17a-c: M = Sn; R = Me, Et, nBu) with Si2Cl6 were monitored by 31P, 29Si, and 119Sn NMR. - In the first step of these reactions, new tBu(iPr)PSi2Cl5 (7) is formed. 7 is accompanied by increasing amounts of tBu(iPr)PSiCl3 (6) and Me3GeSiCl3 (15)/(Me3Ge)2Si(SiCl3)2 (16) or traces of compounds R3SnSiCl3 (19a-c) that decompose providing (R3Sn)2Si(SiCl3)2 (18a-c) and nBu3SnSi(SiCl3)3 (20c). Subsequently, compounds 19a-c decompose providing increasing amounts of 18a-c. Stannylphosphane 17b is also cleaved by SiCl4 leading to 6 with liberation of Et3SnCl, whereas 17b is formed from the reaction of 5 with Et3SnCl under liberation of Me3SiCl. The suggestion of an extra stabilisation of P-Si bonds of trichlorosilylphosphanes was subjected to direct evidence through the structure determination of the trichlorosilylphosphane tBu2PSiCl3 (2) in the gas phase by electron diffraction. This crowded molecule has a 'normal' P-Si bond length of 225.0(12) pm; its C1 symmetric conformation with both tBu groups and the SiCl3 group twisted about 17°from the perfectly staggered positions, and with each of the three groups tilted about 6°away from each other, allows to reduce steric strain.

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