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2565-54-0

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2565-54-0 Usage

General Description

(6Z)-6-[(butylamino)methylidene]cyclohexa-2,4-dien-1-one is a chemical compound with the chemical formula C12H17NO. It is also known as N-butylidene-n-butylamine and is a yellow to brown liquid with a faint odor. (6Z)-6-[(butylamino)methylidene]cyclohexa-2,4-dien-1-one is commonly used as an intermediate in the synthesis of pharmaceuticals and agrochemicals. It is also used in organic synthesis as a building block to create more complex chemical structures. However, it is important to handle this compound with caution as it may be harmful if swallowed, inhaled or comes in contact with the skin.

Check Digit Verification of cas no

The CAS Registry Mumber 2565-54-0 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 2,5,6 and 5 respectively; the second part has 2 digits, 5 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 2565-54:
(6*2)+(5*5)+(4*6)+(3*5)+(2*5)+(1*4)=90
90 % 10 = 0
So 2565-54-0 is a valid CAS Registry Number.

2565-54-0SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 14, 2017

Revision Date: Aug 14, 2017

1.Identification

1.1 GHS Product identifier

Product name (6Z)-6-(butylaminomethylidene)cyclohexa-2,4-dien-1-one

1.2 Other means of identification

Product number -
Other names salicylidene-n-butylamine

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:2565-54-0 SDS

2565-54-0Relevant articles and documents

Syntheses, structures and catalytic properties of ruthenium(II) nitrosyl complexes with bidentate and tetradentate Schiff base ligands

Wu, Fule,Wang, Chang-Jiu,Lin, Hui,Jia, Ai-Quan,Zhang, Qian-Feng

, p. 718 - 723 (2018)

Treatment of Ru(NO)Cl3·xH2O with 1 equiv. bidentate Schiff bases in the presence of triethylamine in DMF/THF afforded a series of anionic ruthenium(II) nitrosyl complexes of the type [Et3NH][Ru(κ2-N,O-LR)(NO)Cl3] (HLR = 2-butyliminomethyl-phenol 1, 2-(benzylimino-methyl)-phenol 2, 2-[(4-chloro-phenylimino)-methyl]-phenol 3, 2-[(4-nitro-phenylimino)-methyl]-phenol 4, 2-[(2,6-diisopropyl-phenylimino)-methyl]-phenol 5). Interaction of Ru(NO)Cl3·xH2O and 1 equiv. tetradentate Schiff bases under the same condition led to isolation of an anionic complex [Et3NH][Ru(κ2-N,O-L-CH2CH2-NOH)-(NO)Cl3] (HL-CH2CH2-NOH = N,N′-disalicylidene-1,2-ethanediamine 6) and a neutral complex [Ru(salen-phn)(NO)Cl] (H2salen-phn = N,N′-disalicylidene-1,2-phenyldiamine 7). The molecular structures of 1·?C2H5OH, 2–6, and 7·CH2Cl2 have been determined by single-crystal X-ray crystallography. Investigation of the catalytic properties of ruthenium(II) nitrosyl complexes 1–7 showed that they are efficient catalytic precursors for the transfer hydrogenation of acetophenone.

Anagostic, mono- and hexahapta interactions in Tl(I) dithiocarbamates: A new precursor for the preparation of Tl2S nanoparticles

Gomathi, Govindaraju,Thirumaran, Subbiah,Ciattini, Samuele

, p. 424 - 433 (2015/11/11)

Two new homoleptic complexes, [Tl(bzfdtc)]2 (1) and [Tl(bu2-OHbzdtc)]2 (2) (where bzfdtc = N-benzyl-N-furfuryldithiocarbamate and bu2-OHbzdtc = (N-butyl-N-(2-hydroxybenzyl)dithiocarbamate), have been prepared an

Chemical reactivity and skin sensitization potential for benzaldehydes: Can Schiff base formation explain everything?

Natsch, Andreas,Gfeller, Hans,Haupt, Tina,Brunner, Gerhard

, p. 2203 - 2215 (2013/01/15)

Skin sensitizers chemically modify skin proteins rendering them immunogenic. Sensitizing chemicals have been divided into applicability domains according to their suspected reaction mechanism. The widely accepted Schiff base applicability domain covers aldehydes and ketones, and detailed structure-activity-modeling for this chemical group was presented. While Schiff base formation is the obvious reaction pathway for these chemicals, the in silico work was followed up by limited experimental work. It remains unclear whether hydrolytically labile Schiff bases can form sufficiently stable epitopes to trigger an immune response in the living organism with an excess of water being present. Here, we performed experimental studies on benzaldehydes of highly differing skin sensitization potential. Schiff base formation toward butylamine was evaluated in acetonitrile, and a detailed SAR study is presented. o-Hydroxybenzaldehydes such as salicylaldehyde and the oakmoss allergens atranol and chloratranol have a high propensity to form Schiff bases. The reactivity is highly reduced in p-hydroxy benzaldehydes such as the nonsensitizing vanillin with an intermediate reactivity for p-alkyl and p-methoxy-benzaldehydes. The work was followed up under more physiological conditions in the peptide reactivity assay with a lysine-containing heptapeptide. Under these conditions, Schiff base formation was only observable for the strong sensitizers atranol and chloratranol and for salicylaldehyde. Trapping experiments with NaBH3CN showed that Schiff base formation occurred under these conditions also for some less sensitizing aldehydes, but the reaction is not favored in the absence of in situ reduction. Surprisingly, the Schiff bases of some weaker sensitizers apparently may react further to form stable peptide adducts. These were identified as the amides between the lysine residues and the corresponding acids. Adduct formation was paralleled by oxidative deamination of the parent peptide at the lysine residue to form the peptide aldehyde. Our results explain the high sensitization potential of the oakmoss allergens by stable Schiff base formation and at the same time indicate a novel pathway for stable peptide-adduct formation and peptide modifications by aldehydes. The results thus may lead to a better understanding of the Schiff base applicability domain.

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