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Tris(trimethylsilyl)iodsilan, also known as (trimethylsilyl)iodosilane, is an organosilicon compound with the chemical formula (Me3Si)3SiI. It is a colorless, volatile liquid that is sensitive to air and moisture. Tris(trimethylsilyl)iodsilan is primarily used as a reagent in organic synthesis, particularly for the introduction of the trimethylsilyl (TMS) protecting group to various functional groups, such as alcohols, amines, and carboxylic acids. The TMS group is often used to protect these functional groups during chemical reactions, preventing unwanted side reactions and facilitating the synthesis of complex molecules. Tris(trimethylsilyl)iodsilan is also employed in the preparation of other organosilicon compounds and as a silylating agent in various chemical transformations. Due to its reactivity, it is essential to handle Tris(trimethylsilyl)iodsilan with care, using appropriate safety measures and under an inert atmosphere.

26245-35-2

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26245-35-2 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 26245-35-2 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 2,6,2,4 and 5 respectively; the second part has 2 digits, 3 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 26245-35:
(7*2)+(6*6)+(5*2)+(4*4)+(3*5)+(2*3)+(1*5)=102
102 % 10 = 2
So 26245-35-2 is a valid CAS Registry Number.

26245-35-2Upstream product

26245-35-2Downstream Products

26245-35-2Relevant academic research and scientific papers

Reductive elimination of hypersilyl halides from zinc(II) complexes. implications for electropositive metal thin film growth

Sirimanne, Chatu T.,Kerrigan, Marissa M.,Martin, Philip D.,Kanjolia, Ravindra K.,Elliott, Simon D.,Winter, Charles H.

, p. 7 - 9 (2015)

Treatment of Zn(Si(SiMe3)3)2 with ZnX2 (X = Cl, Br, I) in tetrahydrofuran (THF) at 23 °C afforded [Zn(Si(SiMe3)3)X(THF)]2 in 83-99% yield. X-ray crystal structures revealed dimeric structures with Zn2X2 cores. Thermogravimetric analyses of [Zn(Si(SiMe3)3)X(THF)]2 demonstrated a loss of coordinated THF between 50 and 155°C and then single-step weight losses between 200 and 275°C. The nonvolatile residue was zinc metal in all cases. Bulk thermolyses of [Zn(Si(SiMe3)3)X(THF)]2 between 210 and 250°C afforded zinc metal in 97-99% yield, Si(SiMe3)3X in 91-94% yield, and THF in 81-98% yield. Density functional theory calculations confirmed that zinc formation becomes energetically favorable upon THF loss. Similar reactions are likely to be general for M(SiR3)n/MXn pairs and may lead to new metal-film-growth processes for chemical vapor deposition and atomic layer deposition.

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