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1873-77-4

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1873-77-4 Usage

Chemical Properties

clear colorless to pale yellow liquid

Uses

Different sources of media describe the Uses of 1873-77-4 differently. You can refer to the following data:
1. Reducing and hydrosilyating agent.
2. Tris(trimethylsilyl)silane is used in hydrosilylations of carbonyls, radical reactions, reductions of acid chlorides, and carbon-halogen bonds. It acts a mediator of radical reactions and considered to be a nontoxic substitute for tri-n-butylstannane in radical reactions. It forms complexes with transition metals and main group elements. Further, it is utilized in carbon-carbon bond forming reactions.
3. Tris(trimethylsilyl)silane) is used in the synthesis of silated alkenes and alkynes. Also used in the preparation of fused quinolines.

Application

Undergoes exothermic decomposition at >100 °C. Radical-based reducing agent for organic halides, selenides, xanthates and isocyanides and ketones in high yields. Can provide complementary stereoselectivity to tri-n-butyltin hydride in the reduction of gem dihalides. Mild reducing agent in nucleoside chemistry.

General Description

Tris(trimethylsilyl)silane is an organosilicon generally used as a radical reducing agent for xanthates, organic halides, isocyanides, selenides, and acid chlorides. It is also used for hydrosilylation of alkenes, alkynes, and dialkyl ketones.

Purification Methods

Purify it by fractional distillation and taking the middle cut. Store it under N2 or Ar as it is PYROPHORIC and is an IRRITANT. [Chatgilialoglu et al. J Org Chem 53 3641 1988, Balestri et al. J Org Chem 56 678 1991, Chatgilialoglu Acc Chem Res 25 188 1992, NMR: Gilman et al. J Organomet Chem 4 163 1965.]

Check Digit Verification of cas no

The CAS Registry Mumber 1873-77-4 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,8,7 and 3 respectively; the second part has 2 digits, 7 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 1873-77:
(6*1)+(5*8)+(4*7)+(3*3)+(2*7)+(1*7)=104
104 % 10 = 4
So 1873-77-4 is a valid CAS Registry Number.
InChI:InChI=1/C9H28Si4/c1-11(2,3)10(12(4,5)6)13(7,8)9/h10H,1-9H3

1873-77-4 Well-known Company Product Price

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  • Alfa Aesar

  • (B22457)  Tris(trimethylsilyl)silane, 97%   

  • 1873-77-4

  • 1g

  • 293.0CNY

  • Detail
  • Alfa Aesar

  • (B22457)  Tris(trimethylsilyl)silane, 97%   

  • 1873-77-4

  • 5g

  • 886.0CNY

  • Detail
  • Alfa Aesar

  • (B22457)  Tris(trimethylsilyl)silane, 97%   

  • 1873-77-4

  • 25g

  • 3763.0CNY

  • Detail
  • Aldrich

  • (360716)  Tris(trimethylsilyl)silane  97%

  • 1873-77-4

  • 360716-5G

  • 1,023.75CNY

  • Detail
  • Aldrich

  • (360716)  Tris(trimethylsilyl)silane  97%

  • 1873-77-4

  • 360716-25G

  • 2,782.26CNY

  • Detail

1873-77-4SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 13, 2017

Revision Date: Aug 13, 2017

1.Identification

1.1 GHS Product identifier

Product name TRIS(TRIMETHYLSILYL)SILANE

1.2 Other means of identification

Product number -
Other names 1,1,1,3,3,3-Hexamethyl-2-(trimethylsilyl)trisilane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1873-77-4 SDS

1873-77-4Synthetic route

tris(trimethylsilyl)silyl potassium

tris(trimethylsilyl)silyl potassium

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
With sulfuric acid In tetrahydrofuran; diethyl ether93%
tetrakis(trimethylsilyl)silane
4098-98-0

tetrakis(trimethylsilyl)silane

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran at 30 - 33℃; for 5h;
Stage #2: With acetic acid In water at 5 - 10℃; for 2h;
90.3%
With methyllithium lithium bromide In diethyl ether at 20℃; for 19h; Inert atmosphere;77%
Multi-step reaction with 2 steps
1: 80 percent / tetrahydrofuran / 1 h
2: 93 percent / H2SO4 / tetrahydrofuran; diethyl ether
View Scheme
chlorotris(trimethylsilyl)silane
5565-32-2

chlorotris(trimethylsilyl)silane

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
With sodium tetrahydroborate
tris(trimethylsilyl)silyl bromide
5089-31-6

tris(trimethylsilyl)silyl bromide

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
With sodium tetrahydroborate
Tris(trimethylsilyl)iodsilan
26245-35-2

Tris(trimethylsilyl)iodsilan

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
With sodium tetrahydroborate
{(CH3)3Si}3SiCHO
112044-12-9

{(CH3)3Si}3SiCHO

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In benzene-d6 at 100℃; Rate constant; decomposition;
tris(trimethylsilyl)-2-fluoroethoxysilane
182255-93-2

tris(trimethylsilyl)-2-fluoroethoxysilane

A

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

B

C15H45FSi7

C15H45FSi7

C

C17H49FOSi7

C17H49FOSi7

Conditions
ConditionsYield
at 350℃; under 1E-06 Torr; for 0.166667h; Product distribution; thermolysis at various pressure and temperature;
lithium tris(trimethylsilyl)silanolate

lithium tris(trimethylsilyl)silanolate

A

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

B

1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)-2-trisilanol
7428-60-6

1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)-2-trisilanol

C

1,1,1-tris(trimethylsilyl)trimethyldisiloxane

1,1,1-tris(trimethylsilyl)trimethyldisiloxane

D

H2

H2

Conditions
ConditionsYield
at 180℃; Product distribution;A 55 % Chromat.
B 13 % Chromat.
C 10 % Chromat.
D n/a
(η5-C5H5)(η5-C5Me5)Zr{Si(SiMe3)3}Me

(η5-C5H5)(η5-C5Me5)Zr{Si(SiMe3)3}Me

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In benzene-d6 gradually decompn. in C6D6;
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(4-methylphenyl)silane
931-70-4

(4-methylphenyl)silane

A

(η5-C5H5)(η5-C5Me5)HfClSiH2(p-MeC6H4)

(η5-C5H5)(η5-C5Me5)HfClSiH2(p-MeC6H4)

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given detected by (1)H-NMR;A 65-75
B n/a
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

benzylsilane
766-06-3

benzylsilane

A

(η5-C5H5)(η5-C5Me5)HfClSiH2(CH2Ph)

(η5-C5H5)(η5-C5Me5)HfClSiH2(CH2Ph)

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given detected by (1)H-NMR;A 65-75
B n/a
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

methylphenylsilane
766-08-5

methylphenylsilane

A

(η5-C5H5)(η5-C5Me5)HfClSiH(C6H5)CH3

(η5-C5H5)(η5-C5Me5)HfClSiH(C6H5)CH3

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given room light, 1-2 d, ratio of educts 1:1, react. to 7:5 mixt. of diastereomers; detected by (1)H-NMR;A 65-75
B n/a
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

cyclohexylsilane
18162-96-4

cyclohexylsilane

A

(η5-C5H5)(η5-C5Me5)HfClSiH2(c-C6H11)

(η5-C5H5)(η5-C5Me5)HfClSiH2(c-C6H11)

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given detected by (1)H-NMR;A 65-75
B n/a
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(2,4,6-trimethylphenyl)silane
120578-34-9

(2,4,6-trimethylphenyl)silane

A

(η5-C5H5)(η5-C5Me5)HfClSiH2(2,4,6-Me3Ph)

(η5-C5H5)(η5-C5Me5)HfClSiH2(2,4,6-Me3Ph)

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given room light, 1-2 d, ratio of educts 1:1; detected by (1)H-NMR;A 65-75
B n/a
triethylsilane
617-86-7

triethylsilane

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

A

(η5-C5H5)(η5-C5Me5)HfClSiEt3

(η5-C5H5)(η5-C5Me5)HfClSiEt3

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given room light, ratio of educts 1:1, very slow react.;
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

trimethylsilan
993-07-7

trimethylsilan

A

(η5-C5H5)(η5-C5Me5)HfClSiMe3

(η5-C5H5)(η5-C5Me5)HfClSiMe3

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given room light, ratio of educts 1:1, very slow react.;
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

phenylsilane
694-53-1

phenylsilane

A

(η5-C5H5)(η5-C5Me5)HfClSiH2Ph

(η5-C5H5)(η5-C5Me5)HfClSiH2Ph

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In pentane Irradiation (UV/VIS); fluorescent room lighting, 1h;A >99
B >99
In benzene Irradiation (UV/VIS); fluorescent room lighting, 1h;A >99
B >99
In not given darkness, 2 d, room temp.;A >99
B n/a
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

diphenylsilane
775-12-2

diphenylsilane

A

(η5-C5H5)(η5-C5Me5)HfClSiHPh2

(η5-C5H5)(η5-C5Me5)HfClSiHPh2

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given room light, 1-2 d, ratio of educts 1:1; detected by (1)H-NMR;A 65-75
B n/a
(η5-C5H5)(η5-C5Me5)Zr{Si(SiMe3)3}Cl

(η5-C5H5)(η5-C5Me5)Zr{Si(SiMe3)3}Cl

phenylsilane
694-53-1

phenylsilane

A

((η5-C5H5)(η5-C5Me5)ZrHCl)2

((η5-C5H5)(η5-C5Me5)ZrHCl)2

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

C

Phenylsilylene
102389-83-3

Phenylsilylene

Conditions
ConditionsYield
In benzene-d6 darkness, 6h; silanes not isolated, detected by NMR;
(η5-C5H5)(η5-C5Me5)Zr{Si(SiMe3)3}Cl

(η5-C5H5)(η5-C5Me5)Zr{Si(SiMe3)3}Cl

phenylsilane
694-53-1

phenylsilane

A

(η5-C5H5)(η5-C5Me5)ZrClSiH2Ph

(η5-C5H5)(η5-C5Me5)ZrClSiH2Ph

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given Irradiation (UV/VIS); 5 min, fluorescent room light;A >99
B >99
tris(trimethylsilyl)silyl yttrium diiodide tris(tetrahydrofuran)

tris(trimethylsilyl)silyl yttrium diiodide tris(tetrahydrofuran)

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
With water
With hydrogen at 50℃; under 760.051 Torr; for 12h; Temperature;
With tert-butyl alcohol
tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

chlorotris(trimethylsilyl)silane
5565-32-2

chlorotris(trimethylsilyl)silane

Conditions
ConditionsYield
With hexachloroethane; palladium dichloride at 20℃; for 1h;100%
With tetrachloromethane for 2h; Heating;95%
With tetrachloromethane for 20h;76%
tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

O-octyl O'-isopropyl thionocarbonate

O-octyl O'-isopropyl thionocarbonate

O-octyl S-tris(trimethylsilyl)silyl thiocarbonate

O-octyl S-tris(trimethylsilyl)silyl thiocarbonate

Conditions
ConditionsYield
With 2,2'-azobis(isobutyronitrile) In benzene for 4h; Heating;100%
tris(trimethylsilyl)silyl potassium

tris(trimethylsilyl)silyl potassium

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
With sulfuric acid In tetrahydrofuran; diethyl ether93%
tetrakis(trimethylsilyl)silane
4098-98-0

tetrakis(trimethylsilyl)silane

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
Stage #1: tetrakis(trimethylsilyl)silane With potassium tert-butylate In tetrahydrofuran at 30 - 33℃; for 5h;
Stage #2: With acetic acid In water at 5 - 10℃; for 2h;
90.3%
With methyllithium lithium bromide In diethyl ether at 20℃; for 19h; Inert atmosphere;77%
Multi-step reaction with 2 steps
1: 80 percent / tetrahydrofuran / 1 h
2: 93 percent / H2SO4 / tetrahydrofuran; diethyl ether
View Scheme
chlorotris(trimethylsilyl)silane
5565-32-2

chlorotris(trimethylsilyl)silane

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
With sodium tetrahydroborate
tris(trimethylsilyl)silyl bromide
5089-31-6

tris(trimethylsilyl)silyl bromide

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
With sodium tetrahydroborate
Tris(trimethylsilyl)iodsilan
26245-35-2

Tris(trimethylsilyl)iodsilan

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
With sodium tetrahydroborate
{(CH3)3Si}3SiCHO
112044-12-9

{(CH3)3Si}3SiCHO

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In benzene-d6 at 100℃; Rate constant; decomposition;
tris(trimethylsilyl)-2-fluoroethoxysilane
182255-93-2

tris(trimethylsilyl)-2-fluoroethoxysilane

A

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

B

C15H45FSi7

C15H45FSi7

C

C17H49FOSi7

C17H49FOSi7

Conditions
ConditionsYield
at 350℃; under 1E-06 Torr; for 0.166667h; Product distribution; thermolysis at various pressure and temperature;
lithium tris(trimethylsilyl)silanolate

lithium tris(trimethylsilyl)silanolate

A

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

B

1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)-2-trisilanol
7428-60-6

1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)-2-trisilanol

C

1,1,1-tris(trimethylsilyl)trimethyldisiloxane

1,1,1-tris(trimethylsilyl)trimethyldisiloxane

D

H2

H2

Conditions
ConditionsYield
at 180℃; Product distribution;A 55 % Chromat.
B 13 % Chromat.
C 10 % Chromat.
D n/a
(η5-C5H5)(η5-C5Me5)Zr{Si(SiMe3)3}Me

(η5-C5H5)(η5-C5Me5)Zr{Si(SiMe3)3}Me

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In benzene-d6 gradually decompn. in C6D6;
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(4-methylphenyl)silane
931-70-4

(4-methylphenyl)silane

A

(η5-C5H5)(η5-C5Me5)HfClSiH2(p-MeC6H4)

(η5-C5H5)(η5-C5Me5)HfClSiH2(p-MeC6H4)

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given detected by (1)H-NMR;A 65-75
B n/a
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

benzylsilane
766-06-3

benzylsilane

A

(η5-C5H5)(η5-C5Me5)HfClSiH2(CH2Ph)

(η5-C5H5)(η5-C5Me5)HfClSiH2(CH2Ph)

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given detected by (1)H-NMR;A 65-75
B n/a
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

methylphenylsilane
766-08-5

methylphenylsilane

A

(η5-C5H5)(η5-C5Me5)HfClSiH(C6H5)CH3

(η5-C5H5)(η5-C5Me5)HfClSiH(C6H5)CH3

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given room light, 1-2 d, ratio of educts 1:1, react. to 7:5 mixt. of diastereomers; detected by (1)H-NMR;A 65-75
B n/a
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

cyclohexylsilane
18162-96-4

cyclohexylsilane

A

(η5-C5H5)(η5-C5Me5)HfClSiH2(c-C6H11)

(η5-C5H5)(η5-C5Me5)HfClSiH2(c-C6H11)

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given detected by (1)H-NMR;A 65-75
B n/a
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(2,4,6-trimethylphenyl)silane
120578-34-9

(2,4,6-trimethylphenyl)silane

A

(η5-C5H5)(η5-C5Me5)HfClSiH2(2,4,6-Me3Ph)

(η5-C5H5)(η5-C5Me5)HfClSiH2(2,4,6-Me3Ph)

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given room light, 1-2 d, ratio of educts 1:1; detected by (1)H-NMR;A 65-75
B n/a
triethylsilane
617-86-7

triethylsilane

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

A

(η5-C5H5)(η5-C5Me5)HfClSiEt3

(η5-C5H5)(η5-C5Me5)HfClSiEt3

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given room light, ratio of educts 1:1, very slow react.;
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

trimethylsilan
993-07-7

trimethylsilan

A

(η5-C5H5)(η5-C5Me5)HfClSiMe3

(η5-C5H5)(η5-C5Me5)HfClSiMe3

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given room light, ratio of educts 1:1, very slow react.;
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

phenylsilane
694-53-1

phenylsilane

A

(η5-C5H5)(η5-C5Me5)HfClSiH2Ph

(η5-C5H5)(η5-C5Me5)HfClSiH2Ph

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In pentane Irradiation (UV/VIS); fluorescent room lighting, 1h;A >99
B >99
In benzene Irradiation (UV/VIS); fluorescent room lighting, 1h;A >99
B >99
In not given darkness, 2 d, room temp.;A >99
B n/a
(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

(η5-C5H5)(η5-C5Me5)HfClSi(SiMe3)3

diphenylsilane
775-12-2

diphenylsilane

A

(η5-C5H5)(η5-C5Me5)HfClSiHPh2

(η5-C5H5)(η5-C5Me5)HfClSiHPh2

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given room light, 1-2 d, ratio of educts 1:1; detected by (1)H-NMR;A 65-75
B n/a
(η5-C5H5)(η5-C5Me5)Zr{Si(SiMe3)3}Cl

(η5-C5H5)(η5-C5Me5)Zr{Si(SiMe3)3}Cl

phenylsilane
694-53-1

phenylsilane

A

((η5-C5H5)(η5-C5Me5)ZrHCl)2

((η5-C5H5)(η5-C5Me5)ZrHCl)2

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

C

Phenylsilylene
102389-83-3

Phenylsilylene

Conditions
ConditionsYield
In benzene-d6 darkness, 6h; silanes not isolated, detected by NMR;
(η5-C5H5)(η5-C5Me5)Zr{Si(SiMe3)3}Cl

(η5-C5H5)(η5-C5Me5)Zr{Si(SiMe3)3}Cl

phenylsilane
694-53-1

phenylsilane

A

(η5-C5H5)(η5-C5Me5)ZrClSiH2Ph

(η5-C5H5)(η5-C5Me5)ZrClSiH2Ph

B

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
In not given Irradiation (UV/VIS); 5 min, fluorescent room light;A >99
B >99
tris(trimethylsilyl)silyl yttrium diiodide tris(tetrahydrofuran)

tris(trimethylsilyl)silyl yttrium diiodide tris(tetrahydrofuran)

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Conditions
ConditionsYield
With water
With hydrogen at 50℃; under 760.051 Torr; for 12h; Temperature;
With tert-butyl alcohol
tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

chlorotris(trimethylsilyl)silane
5565-32-2

chlorotris(trimethylsilyl)silane

Conditions
ConditionsYield
With hexachloroethane; palladium dichloride at 20℃; for 1h;100%
With tetrachloromethane for 2h; Heating;95%
With tetrachloromethane for 20h;76%
tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

O-octyl O'-isopropyl thionocarbonate

O-octyl O'-isopropyl thionocarbonate

O-octyl S-tris(trimethylsilyl)silyl thiocarbonate

O-octyl S-tris(trimethylsilyl)silyl thiocarbonate

Conditions
ConditionsYield
With 2,2'-azobis(isobutyronitrile) In benzene for 4h; Heating;100%
2,2-dimethyl-3-butyne
917-92-0

2,2-dimethyl-3-butyne

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

(E)-2-(3,3-dimethylbut-1-en-1-yl)-1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilane
110577-09-8

(E)-2-(3,3-dimethylbut-1-en-1-yl)-1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilane

Conditions
ConditionsYield
With Eosin Y; potassium carbonate; triisopropylsilanethiol In 1,4-dioxane; water at 20℃; for 4h; Inert atmosphere; Irradiation; stereoselective reaction;99%
With triethyl borane In benzene for 2h; Ambient temperature;88%
tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

phenylacetylene
536-74-3

phenylacetylene

(Z)-1,1,1,3,3,3-hexamethyl-2-styryl-2-(trimethylsilyl)trisilane
139526-41-3

(Z)-1,1,1,3,3,3-hexamethyl-2-styryl-2-(trimethylsilyl)trisilane

Conditions
ConditionsYield
With oxygen In water at 20℃; for 24h; optical yield given as %de; stereoselective reaction;99%
With 2,2'-azobis(isobutyronitrile) In toluene at 130℃; for 0.0833333h; optical yield given as %de; stereoselective reaction;96%
With oxygen at 20℃; for 0.5h; in sealed vial;93%
tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Propiolic acid
471-25-0

Propiolic acid

(Z)-3-[tris(trimethylsilyl)silyl]propenoic acid
838852-54-3

(Z)-3-[tris(trimethylsilyl)silyl]propenoic acid

Conditions
ConditionsYield
With oxygen In water at 20℃; for 24h; optical yield given as %de; stereoselective reaction;99%
With tris-(trimethylsilyl)silane; 2-hydroxyethanethiol In water at 100℃; for 4h;95%
at 20℃;90%
5-Hexen-1-ol
821-41-0

5-Hexen-1-ol

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

6-[tris(trimethylsilyl)]-1-hexanol
1001067-36-2

6-[tris(trimethylsilyl)]-1-hexanol

Conditions
ConditionsYield
With 1,1'-azobis(1-cyanocyclohexanenitrile) In water at 100℃; for 4h;99%
1-octen-3-ol
3391-86-4

1-octen-3-ol

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

6-[tris(trimethylsilyl)]-3-octanol
1001067-37-3

6-[tris(trimethylsilyl)]-3-octanol

Conditions
ConditionsYield
With 1,1'-azobis(1-cyanocyclohexanenitrile) In water at 100℃; for 4h;99%
tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

di-tert-butylmercury
23587-90-8

di-tert-butylmercury

bis(tris(trimethylsilyl)silyl)mercury
61576-80-5

bis(tris(trimethylsilyl)silyl)mercury

Conditions
ConditionsYield
In hexane room temp. 24 h;99%
In pentane Ar atm.; stirring (24 h, room temp.); cooling (-60°C), crystn.;87%
In n-heptane byproducts: isobutane; Ar-atmosphere; 85°C; evapn., crystn.;82%
C5(CH3)5(C3H7)2C6H3NTaH(CH2Si(Si(CH3)3)2Si(CH3)2)H

C5(CH3)5(C3H7)2C6H3NTaH(CH2Si(Si(CH3)3)2Si(CH3)2)H

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

2,6-dimethylphenyl isonitrile
119072-54-7, 2769-71-3

2,6-dimethylphenyl isonitrile

Cp*(DippN=)Ta[η2-C(N-2,6-Me2C6H3)CH2Si(SiMe3)2SiMe2H]H

Cp*(DippN=)Ta[η2-C(N-2,6-Me2C6H3)CH2Si(SiMe3)2SiMe2H]H

Conditions
ConditionsYield
In benzene-d6 xylyl isocyanide was added to soln. of Ta-complex and HSi(SiMe3)3 in benzene-d6, 36 h, stirred for 1 h under N2; solvent was removed in vacuo;99%
benzophenone
119-61-9

benzophenone

C5(CH3)5(C3H7)2C6H3NTaH(CH2Si(Si(CH3)3)2Si(CH3)2)H

C5(CH3)5(C3H7)2C6H3NTaH(CH2Si(Si(CH3)3)2Si(CH3)2)H

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

C5(CH3)5(C3H7)2C6H3NTaOCH(C6H5)2(CH2Si(Si(CH3)3)2Si(CH3)2)H2

C5(CH3)5(C3H7)2C6H3NTaOCH(C6H5)2(CH2Si(Si(CH3)3)2Si(CH3)2)H2

Conditions
ConditionsYield
In hexane hexane soln. of benzophenone was added to soln. of Ta-complex and HSi(SiMe3)3 in hexane, 72 h, stirred for 1 h at room temp. under N2; solvent was removed in vacuo;99%
but-3-yn-1-yl acetate
56703-55-0

but-3-yn-1-yl acetate

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

(Z)-4-(1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilan-2-yl)but-3-en-1-yl acetate

(Z)-4-(1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilan-2-yl)but-3-en-1-yl acetate

Conditions
ConditionsYield
With Eosin Y; potassium carbonate; triisopropylsilanethiol In 1,4-dioxane; water at 20℃; for 4h; Catalytic behavior; Reagent/catalyst; Inert atmosphere; Irradiation; stereoselective reaction;99%
5-hexyl-1-ol
928-90-5

5-hexyl-1-ol

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

(Z)-6-(1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilan-2-yl)hex-5-en-1-ol

(Z)-6-(1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilan-2-yl)hex-5-en-1-ol

Conditions
ConditionsYield
With Eosin Y; potassium carbonate; triisopropylsilanethiol In 1,4-dioxane; water at 20℃; for 4h; Inert atmosphere; Irradiation; stereoselective reaction;99%
n-octyne
629-05-0

n-octyne

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

(Z)-1,1,1,3,3,3-hexamethyl-2-(oct-1-en-1-yl)-2-(trimethylsilyl)trisilane
1038563-57-3

(Z)-1,1,1,3,3,3-hexamethyl-2-(oct-1-en-1-yl)-2-(trimethylsilyl)trisilane

Conditions
ConditionsYield
With Eosin Y; potassium carbonate; triisopropylsilanethiol In 1,4-dioxane; water at 20℃; for 4h; Quantum yield; Solvent; Inert atmosphere; Irradiation; stereoselective reaction;99%
tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

propargyl alcohol
107-19-7

propargyl alcohol

(Z)-3-(1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilan-2-yl)prop-2-en-1-ol

(Z)-3-(1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilan-2-yl)prop-2-en-1-ol

Conditions
ConditionsYield
With oxygen; 2-hydroxyethanethiol In water at 20℃; for 24h; optical yield given as %de; stereoselective reaction;98%
With 2,2'-azobis(isobutyronitrile) In toluene Heating;
tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

Propargylamine
2450-71-7

Propargylamine

(Z)-3-(1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilan-2-yl)prop-2-en-1-amine

(Z)-3-(1,1,1,3,3,3-hexamethyl-2-(trimethylsilyl)trisilan-2-yl)prop-2-en-1-amine

Conditions
ConditionsYield
With oxygen; 2-hydroxyethanethiol In water at 20℃; for 24h; optical yield given as %de; stereoselective reaction;98%
2,2-dimethyl-[1,3]dithiolane
6008-78-2

2,2-dimethyl-[1,3]dithiolane

tris-(trimethylsilyl)silane
1873-77-4

tris-(trimethylsilyl)silane

2-propylsulfanylethylsulfanyltris(trimethylsilyl)silane

2-propylsulfanylethylsulfanyltris(trimethylsilyl)silane

Conditions
ConditionsYield
With 2,2'-azobis(isobutyronitrile) In toluene at 93℃; for 1h; Inert atmosphere;98%

1873-77-4Relevant articles and documents

The thermolysis of ε-halodisilanes: A preference for 1,2-Si Si→O rearrangement or Si-O cleavage over Si=O bond formation

Roos, Christopher,McGibbon, Graham A.,Brook, Michael A.

, p. 1470 - 1479 (1996)

Tris(trimethylsilyl)-2,2,2-trifluoroethoxysilane 6, tris(trimethylsilyl)-2-fluoroethoxysilane 7, and tris(trimethylsilyl)-2-chloroethoxysilane 8 were synthesized and characterized by 1H, 13C and 29Si NMR, IR spectroscopy, and EI and CI mass spectrometry. Thermodynamic considerations would suggest that, as a result of the driving force provided by the formation of a Si-F or Si-Cl bond, the thermolyses of these compounds would lead to the formation of bis(trimethylsilyl)silanone 4. To examine this question, gas chromatography - mass spectrometry was as used a detection technique for products resulting from the high-pressure thermolyses of 6-8. The elimination of (Me3Si)3SiCl appears to be the major thermolytic pathway of decomposition for 8 at ambient or higher pressures, although it is accompanied by the formation of other products, some of which could have arisen from the addition of various halosilanes to a silanone. Neither 6 nor 7 thermolyzed cleanly; the former compound was essentially unreactive under the thermolysis temperatures used (850°C). Of the products produced in the thermolysis of 7, no evidence for the formation of the silanone was obtained. Independently, mass spectrometry was used to study unimolecular reactions of molecular ions derived from 6-8. The major route to solitary ions appears to involve a 1,2-trimethylsilyl migration from Si to O (9→10) prior to decomposition, for example, of the m/z 346 parent ion in the decomposition of 6. The preparation of the ionized silanone may be a minor pathway. Some of the other fragmentation pathways for 6-8 are discussed.

Tris(trimethylsilyl)silyllithium

Gilman, Henry,Smith, Clifford L.

, p. 91 - 101 (1968)

An investigation has been made of the relative reactivity of tris(trimethylsilyl)silyllithium (I) in an attempt to estimate the importance of (dπ-pπ) bonding involving two contiguous silicon atoms. The procedure used were: (1) a comparative metalation reaction; (2) a kinetic study; and (3) a cleavage reaction of a silicon-silicon bond. The results are not definitive; although they seem to imply that the reactivity of I is comparable to or less than that of triphenylsilyllithium. The reactivity of I, together with its ultraviolet and NMR spectra, has been explained in terms of dative π-bonding.

TRIS(TRIMETHYLSILYL)SILANE:A CATALYST FOR RADICAL MEDIATED REDUCTION REACTIONS

Lesage, M.,Chatgilialoglu, C.,Griller, D.

, p. 2733 - 2734 (1989)

Tris(trimethylsilyl)silane was an effective substitute for toxic, tributyltin hydride in free radical chain reductions of organic halides.It was used in catalytic amounts and was regenerated, in situ, by using sodium borohydride.

Process for preparing tetrakis (trimethylsily) silane and tris (trimethysilyl) silane

-

Example 3, (2008/06/13)

Tetrakis(trimethylsilyl)silane is prepared by reacting tetrachlorosilane with chlorotrimethylsilane in the presence of lithium metal, adding a compound with active proton(s) to the reaction mixture for treating the residual lithium metal therewith while maintaining the mixture neutral or acidic, and separating tetrakis(trimethylsilyl)silane from the organic layer. The residual lithium metal is treated in a safe and simple manner. Reaction of the tetrakis(trimethylsilyl)silane with an alkyl lithium or alkali metal alkoxide, followed by acid hydrolysis, affords tris(trimethylsilyl)silane. The desired compounds are prepared in high yields and on an industrial scale.

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