3002-18-4

Basic information

• Product Name: TRIETHANOLAMINE TRIACETATE
• Synonyms: TRIETHANOLAMINE TRIACETATE;2,2’,2’’-nitrilotris-ethanotriacetate(ester);Ethanol,2,2’,2’’-nitrilotris-,triacetate(ester);tris-(2-acetoxy-ethyl)-amine;tris-2-acetoxy-ethyl-amine;2,2',2''-nitrilotrisethyl triacetate;Triethanolamine triacetate,95%
• CAS NO: 3002-18-4
• Molecular Formula: C₁₂H₂₁NO₆
• Molecular Weight: 275.3
• EINECS: 221-089-4
• Mol File: 3002-18-4.mol
• Article Data: 5

Chemical Properties

• Melting Point: -40 °C
• Boiling Point: 285 °C
• Flash Point: 159.6°C
• Appearance: /
• Density: 1.04
• Refractive Index: 1.447-1.449
• PKA: 6.19±0.50(Predicted)
• CAS DataBase Reference: TRIETHANOLAMINE TRIACETATE(CAS DataBase Reference)
• NIST Chemistry Reference: TRIETHANOLAMINE TRIACETATE(3002-18-4)
• EPA Substance Registry System: TRIETHANOLAMINE TRIACETATE(3002-18-4)

Safety Data

• Hazard Codes: Xi
• Statements: 36/37/38
• Safety Statements: 37/39-26
• Hazardous Substances Data: 3002-18-4(Hazardous Substances Data)

Usage

Chemical Properties

dark brown liquid

Upstream product

• 102-71-6 triethanolamine 
• 64-19-7 acetic acid 
• 75-36-5 acetyl chloride 
• 463-51-4 Ketene 

Downstream Products

• 102-71-6 triethanolamine 
• 104568-17-4 methyl-tris (2-acetoxyethyl)-ammonium methosulphate 
• 1169841-30-8 2,2'-((tosylimino)methylazanediyl)bis(ethane-2,1-diyl) diacetate 
• 1169841-34-2 2,2'-((4-methoxyphenylsulfonylimino)methylazanediyl)bis(ethane-1,2-diyl) diacetate 

Relevant articles and documents

Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective film

A photocurable composition includes: (A) an epoxy group-containing polymer compound having repeating units represented by the following formula (1), where R1 to R4 are each a hydrocarbon group, m is an integer of 1 to 100, a, b, c and d are each 0 or a positive number, such that 0 (c+d)/(a+b+c+d) ≤ 1.0, and X and Y are each the formula (2) or (3), provided that at least one group of the formula (3) is present, (B) a photoacid generator represented by the formula (8) and (C) a solvent.

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

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Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process

Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.