335-06-8Relevant academic research and scientific papers
REACTIONS OF TRIFLUOROMETHYL AND TRIPLET METHYLENE RADICALS WITH SOME ALKYLSILANES
Bell, T. N.,Marciniak, B.,Sherwood, A. G.
, p. 3818 - 3820 (2007/10/02)
The recombination of CF3 and CH2SiF3 radicals was used to prepare CF3CH2SiF3 by collisional stabilization of the initially formed hot molecule, CF3CH2SiF3*.One fate of this hot species, not so far observed, is its decomposition to give CF3CH2 and SiF3 radicals, a process which leads to additional products.In separate studies of the reactions of 3CH2 with CF3CH2SiF3, the formation of CH3SiF3 is observed, and this is suggested to be through a 5-coordinate radical exchange process.
Silicon-substituted derivatives of trifluoro(trifluoromethyl)silane. Some chemistry of the silicon-iodine bond in a polyhalo system
Sharp, Kenneth G.
, p. 1241 - 1244 (2008/10/08)
The fluoroiodosilane CF3SiF2I has been utilized to generate a series of compounds of formula CF3SiF2X, where X = Br, Cl, F, and OSiF2CF3; all but X = F are new compounds. Conversion of Si-I bonds to Si-X is effected by antimony(III) halides or, for oxygen, mercury(II) oxide. Each of the halodifluoro(trifluoromethyl)silanes undergoes pyrolytic decomposition at 100° to generate SiF3X and CF2, although the thermal decomposition of CF3SiF2I is quite complex. Each of the CF3SiF2X species (other than CF3SiF3) reacts with water vapor to generate CF3SiF3 and, for X = Br or I, CF2HX. The halodifluoromethanes evidently result from the reaction of CF2 with HX - the CF2 in turn resulting from the interaction of water vapor and CF3SiF3 at room temperature. Correlations of fluorine chemical shifts and directly bonded silicon-fluorine coupling constants between CF3SiF2X species and the corresponding SiF3X species are presented.
