36634-74-9Relevant articles and documents
Dehydrogenative heck reaction of furans and thiophenes with styrenes under mild conditions and influence of the oxidizing agent on the reaction rate
Vasseur, Alexandre,Muzart, Jacques,Le Bras, Jean
supporting information; experimental part, p. 12556 - 12560 (2011/12/04)
CiH vs. CiBr in Heck: The direct dehydrogenative coupling of furans and thiophenes with styrenes occurs under mild conditions (see scheme). This method allows the coupling of brominated substrates through CiH bond activation. In addition, DMSO and benzoquinone had a positive effect on the reaction rate.