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4,4'-Bis(methoxymethyl)-1,1'-biphenyl is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

3753-18-2

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3753-18-2 Usage

Chemical Properties

White crystalline

Check Digit Verification of cas no

The CAS Registry Mumber 3753-18-2 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 3,7,5 and 3 respectively; the second part has 2 digits, 1 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 3753-18:
(6*3)+(5*7)+(4*5)+(3*3)+(2*1)+(1*8)=92
92 % 10 = 2
So 3753-18-2 is a valid CAS Registry Number.

3753-18-2SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 11, 2017

Revision Date: Aug 11, 2017

1.Identification

1.1 GHS Product identifier

Product name 4,4'-Bis(methoxymethyl)-1,1'-biphenyl

1.2 Other means of identification

Product number -
Other names 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:3753-18-2 SDS

3753-18-2Synthetic route

biphenyl
92-52-4

biphenyl

Dimethoxymethane
109-87-5

Dimethoxymethane

A

4-(methoxymethyl)-1,1'-biphenyl
86130-05-4

4-(methoxymethyl)-1,1'-biphenyl

B

4,4′-bis(methoxymethyl)biphenyl
3753-18-2

4,4′-bis(methoxymethyl)biphenyl

Conditions
ConditionsYield
mordenite SiO2/Al2O3 90 In cyclohexane at 120℃; for 4h; Product distribution / selectivity;
4-chlorobenzyl methyl ether
1195-44-4

4-chlorobenzyl methyl ether

4,4′-bis(methoxymethyl)biphenyl
3753-18-2

4,4′-bis(methoxymethyl)biphenyl

Conditions
ConditionsYield
With zinc; 5-trimethylsilyl-2,2'-bipyridine; nickel dibromide In 1-methyl-pyrrolidin-2-one at 20 - 70℃; Inert atmosphere;
With zinc; nickel dibromide; 5,5’-bis(trimethylsilyl)-2,2’-bipyridine In 1-methyl-pyrrolidin-2-one at 20 - 70℃; Inert atmosphere;
diethyl 2-(cycloheptene-1-yl)-cyclobuten-1-yl phosphate

diethyl 2-(cycloheptene-1-yl)-cyclobuten-1-yl phosphate

4-(methoxymethyl)phenylzinc chloride lithium chloride

4-(methoxymethyl)phenylzinc chloride lithium chloride

A

4,4′-bis(methoxymethyl)biphenyl
3753-18-2

4,4′-bis(methoxymethyl)biphenyl

B

1-cycloheptenyl-2-[4-(methoxymethyl)phenyl]cyclobutene

1-cycloheptenyl-2-[4-(methoxymethyl)phenyl]cyclobutene

Conditions
ConditionsYield
With aluminum (III) chloride; C36H28Cl2OP2Pd In tetrahydrofuran at 50℃; for 17h; Negishi Coupling; Overall yield = 73 %; Overall yield = 0.451 g;
4,4′-bis(methoxymethyl)biphenyl
3753-18-2

4,4′-bis(methoxymethyl)biphenyl

4,4'-diformylbiphenyl
66-98-8

4,4'-diformylbiphenyl

Conditions
ConditionsYield
With sodium bromate; acetic acid at 90℃; for 1.5h; Product distribution / selectivity;93.3 %Chromat.

3753-18-2Downstream Products

3753-18-2Relevant academic research and scientific papers

Novel Selective Approach to Terminally Substituted [n]Dendralenes

Polák, Peter,Tobrman, Tomá?

supporting information, p. 957 - 968 (2018/12/11)

Dendralenes are simple alkenes with cross-conjugated double bonds that are frequently synthesized due to being potentially valuable building blocks for the synthesis of more complex structures. The synthetic approaches to dendralenes are based on the cross-coupling reactions of electrophilic and nucleophilic synthons derived from geminally substituted ethylene. Our novel methodology for the synthesis of only terminally substituted [3]- and [4]dendralenes, as well as 2,3-disubstituted buta-1,3-dienes, involves the preparation of 1,2-disubstituted cyclobutenes from readily available 2-bromocyclobutanone and the subsequent thermal ring-opening reactions.

BIPYRIDINE COMPOUND, TRANSITION METAL COMPLEX, AND METHOD FOR PRODUCTION OF CONJUGATED AROMATIC COMPOUND USING THE TRANSITION METAL COMPLEX

-

Page/Page column 43, (2010/04/25)

A bipyridine compound represented by the formula (1): wherein R1, R2 and R3 each independently represent a C1-C10 alkyl group which may be substituted etc., and R4, R5, R6, R7 and R8 each independently represent a hydrogen atom etc., a transition metal complex obtained by contacting a bipyridine compound represented by the formula (1) with a compound of a transition metal belonging to Group 9, 10 or 11, and a method for production of a conjugated aromatic compound comprising reacting an aromatic compound (A) wherein one or two leaving groups are bonded to an aromatic ring with an aromatic compound (A) having the same structure as that of the above-mentioned aromatic compound (A) or an aromatic compound (B) being structurally different from the above-mentioned aromatic compound (A) and having one or two leaving groups bonded to an aromatic ring, in the presence of the transition metal complex.

TRANSITION METAL COMPLEX AND PROCESS FOR PRODUCING CONJUGATED AROMATIC COMPOUND WITH THE TRANSITION METAL COMPLEX

-

Page/Page column 44, (2010/06/17)

A transition metal complex obtained by contacting a bipyridine compound represented by the formula (1): wherein R1, R2 and R3 represent a C1-C10 alkyl group which may be substituted, etc., and R4 and R5 represent a hydrogen atom etc., with a compound of a transition metal belonging to Group 9, 10 or 11, and a process for producing a conjugated aromatic compound comprising reacting an aromatic compound (A) wherein one or two leaving groups are bonded to an aromatic ring with an aromatic compound (A) having the same structure as that of the above-mentioned aromatic compound (A) or an aromatic compound (B) being structurally different from the above-mentioned aromatic compound (A) and having one or two leaving groups bonded to an aromatic ring, in the presence of said transition metal complex.

Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device

-

, (2010/02/17)

An antireflective hardmask composition includes an organic solvent, and at least one polymer represented by Formulae A, B or C: In Formulae A and B, the fluorene group is unsubstituted or substituted, in Formula C, the naphthalene group is unsubstituted or substituted, n is at least 1 and is less than about 750, m is at least 1, and m+n is less than about 750, G is an aromatic ring-containing group having an alkoxy group, and R1 is methylene or includes a non-fluorene-containing aryl linking group.

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