3795-46-8Relevant academic research and scientific papers
Siloxane with low dielectric constant and loss at high frequency, preparation method and application thereof
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Paragraph 0092-0093; 0097-0099; 0100-0101; 0105-0107, (2020/11/22)
The invention relates to siloxane with low dielectric constant and loss at high frequency, a preparation method and application thereof. Specifically, the invention discloses a siloxane monomer, wherein a resin obtained by curing the monomer has the advantages of low dielectric constant, low dielectric loss, high heat resistance, favorable processability and low water absorptivity at high frequency, and is especially suitable for preparing high-frequency circuit boards.
Une synthese originale et rapide de (methyldiethoxysilyl)benzenes fonctionnels
Cros, S.,Bennetau, B.,Dunogues, J.,Babin, P.
, p. 69 - 74 (2007/10/02)
In the presence of a catalytic amount of tetrakis(triphenylphosphine)palladium(0), the 1,1,2,2-tetraethoxydimethyldisilane reacts with various functional bromoarenes giving the corresponding aryldiethoxymethylsilanes in good yields.The creation of Si-CAr bonds involving a polyalcoxydisilane as the silylating reagent is here reported for the first time.Key words: Silyl; Palladium
