400-53-3Relevant articles and documents
Metastable ion study of organosilicon compounds. Part IX. CH3COOSi(CH3)3 and CF3COOSi(CH3)3
Mori, Shigeru,Okada, Fumio,Sekiguchi, Osamu,Fujishige, Masao,Koitabashi, Risei,Tajima, Susumu
, p. 277 - 282 (1997)
The unimolecular metastable dissociation of trimethylsilyl acetate, CH3COOSi(CH3)3 (1), and its fluorine analogue, trimethylsilyl trifluoroacetate, CF3COOSi(CH3)3 (2), upon electron impact have been investigated by means of a B/E linked scan, high resolution data, and D-labeling. The results are compared with those of the carbon analogue, tert-butyl acetate, CH3COOC(CH3)3 (3). No molecular ion of any of these compounds can be observed, but loss of CH3 occurs exclusively from the trimethylsilyl or tert-butyl groups. The fragmentation of 1+. is slightly different from that of 3+., and quite different from that of 2+.. In the case of 3+., (CH3)2C=O is eliminated from [3-CH3]+, giving rise to the peak at m/z 43, but the loss of (CH3)2Si=O does not occur from [1-CH3]+. In the case of 2+., an interesting fluorine atom (F) migration is observed.
TREATING AGENT COMPOSITION FOR BEVEL PART AND METHOD FOR MANUFACTURING WAFER
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Paragraph 0069, (2021/01/20)
This beveled part treatment agent composition is used to treat a beveled part of a wafer and contains a silylating agent, wherein the bevel part treatment agent composition has characteristics in which a surface modification index Y and a surface modification index Z measured by prescribed procedures satisfies 0.5 ≤ Y / Z ≤ 1.0.
Reaction of 10,10-dimethyl-9-trimethylsiloxy-9,10-dihydrophenanthrene-9- carbonitrile with acids
Bushmelev,Genaev,Sal'nikov,Shubin
experimental part, p. 1057 - 1061 (2011/11/12)
The behavior of 10,10-dimethyl-9-trimethylsiloxy-9,10-dihydrophenanthrene- 9-carbonitrile in trifluoromethanesulfonic acid and acid systems CF 3SO3H-CD2Cl2, HSO 3F-SO2ClF-CD2Cl2, and CF 3COOH-CD2Cl2 were studied by NMR spectroscopy. Principal reaction schemes were determined; the first step in these schemes is protonation of the initial compound at the oxygen or nitrogen atom.
