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107-46-0 Usage

Chemical Description

Hexamethyldisiloxane is a reducing agent used in combination with P4S10 in the thionation reaction.

Chemical Properties

Hexamethyldisiloxane (HMDS) is a colorless or yellowish transparent liquid with a measured melting point of -68.2°C and a measured boiling point of 100.5°C at 1013 hPa. The measured vapor pressure is 44.51 hPa at 20 oC. The measured water solubility is 0.93 ± 0.63 mg/L at 23 oC. The measured log Kow of HMDS is 5.20 at 20 oC. Estimated log Koc values using EPISuite v 4.10 range from 2.5 (MCI method) to 4.5 (Kow method). As Episuite does not contain fragments for siloxanes for log Koc predictions, these values should be treated with caution. The potential for hydrolysis of the test substance may have influenced the determination of partition coefficient and water solubility.

Physical properties

Hexamethyldisiloxane is a colorless and transparent liquid. It is easily deliquescent, flammable, and has the risk of causing combustion when exposed to high heat, open flame, and strong oxidizing agents. Boiling point 99.5℃. Flash point -1.1℃. Relative density (d2525) 0.7606. refractive index 1.3750. insoluble in water, soluble in many organic solvents.

Uses

Different sources of media describe the Uses of 107-46-0 differently. You can refer to the following data:
1. The most popular precursor chemical is hexamethyldisiloxane (HMDS) which with the addition of helium and oxygen will produce a silica coating. it is used in a variety of consumer applications and can be used as intermediates in the production of silicone polymers.
2. Hexamethyldisiloxane is used as a base fluid in a wide range of personal care products that require fast evaporation and high spreadability. When blended with Dimethicone fluids, It can adjust the residence time of the silicone on the skin. Unlike other volatile fluids, Hexamethyldisiloxane Fluid does not cool the skin as it evaporates. Hexamethyldisiloxane is used as a carrying agent and diluent in the following: skin cream lotions, bath oils, suntan lotions, nail polishes, antiperspirants, deodorants, hair sprays and other beauty and hair care products. A silicon based compound that can be used to create potentially biocompatible materials. Used as a monomer in the synthesis of long chain polysiloxane structures. Used in the methylation of mercury(II) salts.
3. Hexamethyldisiloxane can be used as silylating agent for carboxylic acids, and alcohols; used in preparation of aroyl chlorides; precursor for a variety of trimethylsilyl derivatives.Hexamethyldisiloxane has been used as an inexpensive starting material for the preparation of numerous synthetically useful trimethylsilyl derivatives.

Preparation

Synthesis of hexamethyldisiloxane by hydrolysis of trimethylsilyl chloride, water and sodium hydroxide.

Definition

ChEBI: Hexamethyldisiloxane is an organosiloxane consisting of two trimethylsilyl groups covalently bound to a central oxygen.

Production Methods

Produced via acid hydrolysis of chlorotrimethylsilane and purification by distillation.

General Description

Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane in silicon integrated circuit technology. Its dissociative ionization by electron impact has been studied by Fourier transform mass spectrometry. Synthesis of plasma-polymerized HMDSO thin films by atmospheric pressure glow (APG) discharge has been reported. Crystals of HMDSO at 148K are monoclinic. Addition of HMDSO to P4S10, improves its efficiency as thionating agent.

Flammability and Explosibility

Highlyflammable

Purification Methods

Fractionally distil through a column packed with glass helices with ca 15 theoretical 20 1.3777. plates. It is highly flammable and is an irritant. [Mills & McKenzie J Am Chem Soc 76 2672 1954, Csakvari et al. J Organometal Chem 107 287 1976, Beilstein 4 IV 4018.]

Check Digit Verification of cas no

The CAS Registry Mumber 107-46-0 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 1,0 and 7 respectively; the second part has 2 digits, 4 and 6 respectively.
Calculate Digit Verification of CAS Registry Number 107-46:
(5*1)+(4*0)+(3*7)+(2*4)+(1*6)=40
40 % 10 = 0
So 107-46-0 is a valid CAS Registry Number.
InChI:InChI=1/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3

107-46-0 Well-known Company Product Price

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  • (Code)Product description
  • CAS number
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  • Detail
  • TCI America

  • (H0091)  Hexamethyldisiloxane  >98.0%(GC)

  • 107-46-0

  • 25mL

  • 120.00CNY

  • Detail
  • TCI America

  • (H0091)  Hexamethyldisiloxane  >98.0%(GC)

  • 107-46-0

  • 100mL

  • 260.00CNY

  • Detail
  • TCI America

  • (H0091)  Hexamethyldisiloxane  >98.0%(GC)

  • 107-46-0

  • 500mL

  • 690.00CNY

  • Detail
  • Alfa Aesar

  • (A11848)  Hexamethyldisiloxane, 98+%   

  • 107-46-0

  • 25ml

  • 105.0CNY

  • Detail
  • Alfa Aesar

  • (A11848)  Hexamethyldisiloxane, 98+%   

  • 107-46-0

  • 100ml

  • 150.0CNY

  • Detail
  • Alfa Aesar

  • (A11848)  Hexamethyldisiloxane, 98+%   

  • 107-46-0

  • 500ml

  • 510.0CNY

  • Detail
  • Alfa Aesar

  • (A11848)  Hexamethyldisiloxane, 98+%   

  • 107-46-0

  • 2500ml

  • 2231.0CNY

  • Detail
  • Alfa Aesar

  • (L16970)  Hexamethyldisiloxane, NMR grade, 99.7%   

  • 107-46-0

  • 25g

  • 196.0CNY

  • Detail
  • Alfa Aesar

  • (L16970)  Hexamethyldisiloxane, NMR grade, 99.7%   

  • 107-46-0

  • 100g

  • 541.0CNY

  • Detail
  • Sigma-Aldrich

  • (52630)  Hexamethyldisiloxane  puriss., ≥98.5% (GC)

  • 107-46-0

  • 52630-100ML

  • 319.41CNY

  • Detail
  • Sigma-Aldrich

  • (52630)  Hexamethyldisiloxane  puriss., ≥98.5% (GC)

  • 107-46-0

  • 52630-500ML

  • 996.84CNY

  • Detail
  • Aldrich

  • (326739)  Hexamethyldisiloxane  NMR grade, ≥99.5%

  • 107-46-0

  • 326739-100G

  • 651.69CNY

  • Detail

107-46-0SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 10, 2017

Revision Date: Aug 10, 2017

1.Identification

1.1 GHS Product identifier

Product name hexamethyldisiloxane

1.2 Other means of identification

Product number -
Other names HMDO

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Abrasives,Adhesives and sealant chemicals,Anti-adhesive agents,CBI,Intermediates,Laboratory chemicals,Solvents (for cleaning or degreasing),Surface active agents
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:107-46-0 SDS

107-46-0Synthetic route

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With hydrogenchloride at 20℃;100%
With sodium hydroxide In water at 30℃; for 0.416667h; Concentration; Temperature;99.97%
With styrene type I anion exchange resin In water at 45 - 75℃; for 2.5h; Concentration; Temperature; Inert atmosphere;93.8%
trimethylsilan
993-07-7

trimethylsilan

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With hydrogenchloride In diethyl ether at 100℃; for 101.5h;A 84%
B 16%
With hydrogenchloride; diethyl ether In benzene-d6 at 100℃; Reagent/catalyst; Schlenk technique; Inert atmosphere;A 84 %Spectr.
B 16 %Spectr.
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

bis(2-chloroethyl) vinylphosphonate
115-98-0

bis(2-chloroethyl) vinylphosphonate

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

vinylphosphonic acid
1746-03-8

vinylphosphonic acid

Conditions
ConditionsYield
Stage #1: chloro-trimethyl-silane; bis(2-chloroethyl) vinylphosphonate at 0 - 170℃; under 3040.2 Torr; for 24h;
Stage #2: With water for 1 - 2h;
A n/a
B 95%
Trimethylsilanol
1066-40-6

Trimethylsilanol

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With 1,1,1,3,3,3-hexamethyl-disilazane; scandium tris(trifluoromethanesulfonate) In chlorobenzene at 70℃; for 1h;82%
With hydrogenchloride
With K2CO3 or Al2O3 In neat (no solvent) react. of (CH3)3SiOH and K2CO3 or Al2O3 at room temp.;;
With K2CO3 or Al2O3 In neat (no solvent) react. of (CH3)3SiOH and K2CO3 or Al2O3 at room temp.;;
1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With ammonium sulfate; urea In 1,2-dimethoxyethane at 90℃; for 0.666667h; Temperature; Reagent/catalyst; Inert atmosphere; Large scale;99.7%
With water; hydrogenchloride at 85.4℃; Mechanism; Equilibrium constant; influence of catalyst concentration;
With potassium dichromate; sulfuric acid; silver sulfate In water for 2h; Mechanism; Heating; other organosilicon compounds, chemical oxygen demand value, oxidizability, glass beads presence;
With water; scandium tris(trifluoromethanesulfonate) In chlorobenzene at 70℃; for 1h; Inert atmosphere;
Trimethylsilanol
1066-40-6

Trimethylsilanol

phenylsilane
694-53-1

phenylsilane

A

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane
27991-58-8

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With nickel(II) bis(2,2,6,6-tetramethylheptane-3,5-dionate) In dichloromethane at 20℃; for 19h; Schlenk technique; Inert atmosphere;A 74%
B 0.15 mmol
1-(Trimethylsilyloxy)cyclohexene
6651-36-1

1-(Trimethylsilyloxy)cyclohexene

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

<2-D>Cyclohexanone
2979-36-4

<2-D>Cyclohexanone

Conditions
ConditionsYield
With hydrogen; Rh(PPh3)3Cl In water-d2 at 50℃; under 760 Torr; for 18h;A n/a
B 95%
Trimethylsilanol
1066-40-6

Trimethylsilanol

phenylsilane
694-53-1

phenylsilane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

C9H16OSi2

C9H16OSi2

Conditions
ConditionsYield
With (triphenylphosphine)gold(I) chloride; tributylphosphine In tetrahydrofuran at 25℃; for 13h; Reagent/catalyst; Solvent; Inert atmosphere;A 15%
B 85%
Trimethylsilanol
1066-40-6

Trimethylsilanol

phenylsilane
694-53-1

phenylsilane

A

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane
27991-58-8

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

C9H16OSi2

C9H16OSi2

Conditions
ConditionsYield
With (triphenylphosphine)gold(I) chloride; tributylphosphine In N,N-dimethyl acetamide at 25℃; for 13h; Inert atmosphere;A 6%
B 48%
C 71%
Trimethylsilanol
1066-40-6

Trimethylsilanol

2-methyl a l l y l t r i s-(trimethylsiloxy)silane
37611-52-2

2-methyl a l l y l t r i s-(trimethylsiloxy)silane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane
3555-47-3

1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane

Conditions
ConditionsYield
With Amberlyst-15 In acetonitrile at 20℃;
triethylsilane
617-86-7

triethylsilane

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

triethylsilyl chloride
994-30-9

triethylsilyl chloride

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

1,1,1-triethyl-3,3,3-trimethyl-disiloxane
2652-41-7

1,1,1-triethyl-3,3,3-trimethyl-disiloxane

Conditions
ConditionsYield
With Mo(CO)5(trimethylamine); N,N-dimethyl-formamide In benzene-d6 at 20℃; for 144h; Sealed tube; Inert atmosphere;
1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

nitrogen
7727-37-9

nitrogen

Conditions
ConditionsYield
With cesium fluoride; dinitrogen monoxide In dimethylsulfoxide-d6 at 20℃; under 750.075 Torr; for 4h; Reagent/catalyst;A 77 %Chromat.
B n/a
bis(trimethylsilyl)sulphate
18306-29-1

bis(trimethylsilyl)sulphate

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With potassium sulfate at 250℃; for 3h;82%
With sodium at 150℃;68%
With hydrogen iodide In octane at 0℃;56%
With water
1-nitro-1-phenylmethane

1-nitro-1-phenylmethane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 96%
1-methyl-2-(2-nitroethyl)benzene

1-methyl-2-(2-nitroethyl)benzene

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

2-Methylbenzonitrile
529-19-1

2-Methylbenzonitrile

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 90%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

tris(trimethylsilyl)amine
1586-73-8

tris(trimethylsilyl)amine

D

1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

Conditions
ConditionsYield
With sodium; cis-{tungsten(dinitrogen)2(P(methyl)2Ph)4} In tetrahydrofuran at 30℃; for 4h; Further byproducts given;A 71.8 % Chromat.
B n/a
C 2.9 % Chromat.
D 1.6 % Chromat.
With sodium; cis-(molybdenum-bis(dinitrogen)(PMe2Ph)4) In tetrahydrofuran at 30℃; for 15h; Further byproducts given;A 39.0 % Chromat.
B n/a
C 36.6 % Chromat.
D 1.1 % Chromat.
1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With hydrogenchloride; diethyl ether at 120℃; for 70h; Sealed tube;100%
With carbon monoxide; hydrogen; nickel at 200℃; under 750.06 Torr; for 2h;59%
With bromobenzene; calcium In water for 1h; Ambient temperature;5%
trimethylsilyl fluoride
420-56-4

trimethylsilyl fluoride

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With potassium hydroxide Heating; Yield given;
With calcium hydroxide; potassium hydroxide In water
With calcium hydroxide; potassium hydroxide In water
3-nitroxylene
38362-90-2

3-nitroxylene

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

3-Methylbenzonitrile
620-22-4

3-Methylbenzonitrile

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 93%
1-nitroadamantane
7575-82-8

1-nitroadamantane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

1-iodoadamantane
768-93-4

1-iodoadamantane

C

NO, 0.5I2

NO, 0.5I2

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 98%
C n/a
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

Dimethylphenylsilane
766-77-8

Dimethylphenylsilane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

pentamethyl(phenyl)disiloxane
14920-92-4

pentamethyl(phenyl)disiloxane

C

1,1,3,3-tetramethyl-1,3-diphenyldisiloxane
56-33-7

1,1,3,3-tetramethyl-1,3-diphenyldisiloxane

D

phenyldimethylsilyl chloride
768-33-2

phenyldimethylsilyl chloride

Conditions
ConditionsYield
With Mo(CO)5(trimethylamine); N,N-dimethyl-formamide In benzene-d6 at 20℃; for 192h; Sealed tube; Inert atmosphere;
triethylsilane
617-86-7

triethylsilane

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

triethylsilyl chloride
994-30-9

triethylsilyl chloride

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

1,1,1-triethyl-3,3,3-trimethyl-disiloxane
2652-41-7

1,1,1-triethyl-3,3,3-trimethyl-disiloxane

D

hexaethyl disiloxane
994-49-0

hexaethyl disiloxane

Conditions
ConditionsYield
With Mo(CO)5(trimethylamine); N,N-dimethyl-formamide In benzene-d6 at 50℃; for 3h; Sealed tube; Inert atmosphere;
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

methyldiphenylsilane
776-76-1

methyldiphenylsilane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

1,1,1,3-tetramethyl-3,3-diphenyl-disiloxane
1719-04-6

1,1,1,3-tetramethyl-3,3-diphenyl-disiloxane

C

chloromethyldiphenylsilane
144-79-6

chloromethyldiphenylsilane

D

1,3-Dimethyl-1,1,3,3-tetraphenyldisiloxan
807-28-3

1,3-Dimethyl-1,1,3,3-tetraphenyldisiloxan

Conditions
ConditionsYield
With Mo(CO)5(trimethylamine); N,N-dimethyl-formamide In benzene-d6 at 20℃; for 408h; Sealed tube; Inert atmosphere;
1-nitrocyclohexane
1122-60-7

1-nitrocyclohexane

A

Cyclohexanone oxime
100-64-1

Cyclohexanone oxime

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

I2

I2

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A 84%
B n/a
C n/a
1,3-bis(iodomethyl)-1,1,3,3-tetramethyl-disiloxane
2943-69-3

1,3-bis(iodomethyl)-1,1,3,3-tetramethyl-disiloxane

2-Mercaptobenzothiazole
149-30-4

2-Mercaptobenzothiazole

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

2-[({3-[(1,3-benzotiazolium-2-ylsulfanyl)methyl]-1,1,3,3-tetramethyldisiloxanyl}methyl)sulfanyl]-1,3-benzotiazolium diiodide

2-[({3-[(1,3-benzotiazolium-2-ylsulfanyl)methyl]-1,1,3,3-tetramethyldisiloxanyl}methyl)sulfanyl]-1,3-benzotiazolium diiodide

Conditions
ConditionsYield
at 150℃; for 3h;A n/a
B 81%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

Me3Si(CH2)4OSiMe3
7140-91-2

Me3Si(CH2)4OSiMe3

D

1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

Conditions
ConditionsYield
With sodium; molybdenum(V) chloride In tetrahydrofuran at 30℃; for 4h;A 8.6 % Chromat.
B n/a
C 34.6 % Chromat.
D 2.0 % Chromat.
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

trimethylsilyl fluoride
420-56-4

trimethylsilyl fluoride

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With potassium fluoride; 18-crown-6 ether In water; chlorobenzene at 90 - 100℃; for 2h;A 41%
B n/a
1-nitrohexane
646-14-0

1-nitrohexane

A

hexanenitrile
628-73-9

hexanenitrile

B

hexanal oxime
6033-61-0

hexanal oxime

C

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A 10%
B 81%
C n/a
(2-nitroethenyl)benzene
102-96-5

(2-nitroethenyl)benzene

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

phenylacetonitrile
140-29-4

phenylacetonitrile

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 71%
C-trimethylsiloxymethyl-C,N-bis(trimethylsilyl)ketimine
104724-76-7

C-trimethylsiloxymethyl-C,N-bis(trimethylsilyl)ketimine

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

α-trimethylsilylacrylonitrile
96475-89-7

α-trimethylsilylacrylonitrile

Conditions
ConditionsYield
With boron trifluoride diethyl etherate In dichloromethane at -78℃; or other Lewis acids;A n/a
B 88%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

(acetylthiomethyl)trifluorosilane
91258-92-3

(acetylthiomethyl)trifluorosilane

acetylthiomethyl(trimethylsiloxy)difluorosilane

acetylthiomethyl(trimethylsiloxy)difluorosilane

Conditions
ConditionsYield
In tetrachloromethane Ambient temperature;100%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

mono-trimethylsilylphosphite
91076-68-5

mono-trimethylsilylphosphite

Conditions
ConditionsYield
With phosphonic Acid Heating;100%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

S-(tert-butyl)-S-phenylsulfoximine
222306-90-3

S-(tert-butyl)-S-phenylsulfoximine

S-tert-butyl-N-trimethylsilyl-S-phenylsulfoximine
222306-91-4

S-tert-butyl-N-trimethylsilyl-S-phenylsulfoximine

Conditions
ConditionsYield
at 85℃; for 0.666667h;100%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

S-methyl-S-phenylsulfoximine
4381-25-3

S-methyl-S-phenylsulfoximine

S-methyl-S-phenyl-N-(trimethylsilyl)sulfoximine
89902-44-3

S-methyl-S-phenyl-N-(trimethylsilyl)sulfoximine

Conditions
ConditionsYield
at 85℃; for 0.666667h;100%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

[trans-C5H8(PCy2)2Pt(CH2CMe3)H]

[trans-C5H8(PCy2)2Pt(CH2CMe3)H]

[trans-C5H8(PCy2)2Pt(CH2CMe3)CH2SiMe2OSiMe3]

[trans-C5H8(PCy2)2Pt(CH2CMe3)CH2SiMe2OSiMe3]

Conditions
ConditionsYield
In neat (no solvent) byproducts: CMe4; inert atm.; stirring (67°C, several h); evapn. (vac.);100%

107-46-0Related news

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The effect of hydrogen addition on silica growth in burner-stabilized methane/air flames with trace amounts of hexamethyldisiloxane are reported. Profiles of the aggregates' radius of gyration Rg and monomer radius a versus residence time were measured by laser light scattering. Experiments...detailed

Microstructured SiOx thin films deposited from hexamethyldisilazane and Hexamethyldisiloxane (cas 107-46-0) using atmospheric pressure thermal microplasma jet08/25/2019

Mictrostructured silicon oxide (SiOx) thin films were deposited on glass and metal substrates from 1,1,1,3,3,3-hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO) by using atmospheric-pressure thermal microplasma jet. Two kinds of string-like products, randomly bent string-like product...detailed

Hexamethyldisiloxane (cas 107-46-0) cold plasma treatment and amylose content determine the structural, barrier and mechanical properties of starch-based films08/24/2019

In this study, the effect of amylose content and cold plasma treatment on starch films properties was investigated. Films from normal (30%) and high amylose (50 and 70%) starches were subjected to hexamethyldisiloxane (HMDSO) cold plasma treatment. Morphological, structural, mechanical and barri...detailed

Ionization cross section of radicals produced by Hexamethyldisiloxane (cas 107-46-0) dissociation08/23/2019

The ionization cross section of hexamethyldisiloxane (HMDSO) molecules (m/z = 162), pentamethyldisiloxane radicals (m/z = 147) and tetramethyl hydro disiloxane radicals (m/z = 133) have been measured versus electron energy up to 30 eV. The radicals are produced selectively by two different mecha...detailed

Fabrication of transparent bistable switching memory device using plasmapolymerized Hexamethyldisiloxane (cas 107-46-0) layers with embedded graphene quantum dots08/22/2019

We demonstrated the feasibility to fabricate two-terminal non-volatile-memory (NVM) devices using pulsed radio frequency (rf) plasma polymerization and simple solution route. The two-terminal NVM devices were fabricated based on a metal-insulator-metal structure consisting of graphene quantum do...detailed

The ice repellency of plasma polymerized Hexamethyldisiloxane (cas 107-46-0) coating08/21/2019

A superhydrophobic thin film was deposited on an aluminium oxide substrate by low pressure plasma polymerization of hexamethyldisiloxane (HMDSO). The coating was determined to be superhydrophobic due to its high water contact angle (∼158°) and low contact angle hysteresis. The aim of this work...detailed

Low-energy mass-selected ion beam production of fragments produced from Hexamethyldisiloxane (cas 107-46-0) for the formation of silicon oxide film08/20/2019

Fragment ions produced from hexamethyldisiloxane (HMDSO) with a hot tungsten wire in a Freeman-type ion source were studied using a low-energy mass-selected ion beam system. The mass numbers of the fragment ions were identified. Although the chemical formulae of these fragments were not complete...detailed

Fundamental equation of state correlation for Hexamethyldisiloxane (cas 107-46-0) based on experimental and molecular simulation data08/19/2019

An empirical fundamental equation of state correlation in terms of the Helmholtz energy is presented for hexamethyldisiloxane. The relatively small amount of thermodynamic data that is available in the literature for this substances is considerably extended by speed of sound measurements and num...detailed

Thermal stability of Hexamethyldisiloxane (cas 107-46-0) and octamethyltrisiloxane08/18/2019

A thermal stability test-rig for organic Rankine cycles working fluids was designed and commissioned at the Laboratory of Compressible-fluid dynamics for Renewable Energy Applications (CREA Lab) of Politecnico di Milano, in collaboration with the University of Brescia. The set-up is composed by ...detailed

107-46-0Relevant articles and documents

Baay,MacDiarmid

, p. 159 (1967)

Wannagat et al.

, p. 62,69 (1964)

Siloxane derivatives of 2-mercaptobenzothiazole

Zhilitskaya, Larisa V.,Yarosh, Nina O.,Shagun, Lyudmila G.,Dorofeev, Ivan A.,Larina, Lyudmila I.

, p. 352 - 354 (2017)

First organosilicon captax derivatives were obtained from 2-mercaptobenzothiazole and 1-(iodomethyl)-1,1,3,3,3-pentamethyl-or 1,3-bis(iodomethyl)-1,1,3,3-tetramethyldisiloxanes in the absence or in the presence of bases.

First Ionization Band of 1,1-Dimethylsilaethylene by Transient Photoelectron Spectroscopy

Koenig, T.,McKenna, William

, p. 1212 - 1213 (1981)

-

-

Whitmore et al.

, p. 1551 (1947)

-

Mechanistic insights on azide-nitrile cycloadditions: On the dialkyltin oxide-trimethylsilyl azide route and a new vilsmeier-haack-type organocatalyst

Cantillo, David,Gutmann, Bernhard,Kappe, C. Oliver

, p. 4465 - 4475 (2011)

The mechanism of the azide-nitrile cycloaddition mediated by the known dialkylltin oxide-trimethylsilyl azide catalyst system has been addressed through DFT calculations. The catalytic cycle for this tin/silicon complex-based mechanism has been thoroughly examined, disclosing the most plausible intermediates and the energetics involved in the rate enhancement. In addition, a new catalyst, 5-azido-1-methyl-3,4-dihydro-2H-pyrrolium azide, is presented for the formation of tetrazoles by cycloaddition of sodium azide with organic nitriles under neutral conditions. The efficiency of this organocatalyst, generated in situ from N-methyl-2-pyrrolidone (NMP), sodium azide, and trimethylsilyl chloride under reaction conditions, has been examined by preparation of a series of 5-substituted-1H-tetrazoles. The desired target structures were obtained in high yields within 15-25 min employing controlled microwave heating. An in depth computational analysis of the proposed catalytic cycle has also been addressed to understand the nature of the rate acceleration. The computed energy barriers have been compared to the dialkylltin oxide-trimethylsilyl azide metal-based catalyst system. Both the tin/silicon species and the new organocatalyst accelerate the azide-nitrile coupling by activating the nitrile substrate. As compared to the dialkylltin oxide-trimethylsilyl azide method, the organocatalytic system presented herein has the advantage of higher reactivity, in situ generation from inexpensive materials, and low toxicity.

Emeleus, H. J.,Miller, N.

, p. 996 - 997 (1938)

Hunter, M. J.,Warrick, E. L.,Hyde, J. F.,Currie, C. C.

, p. 2284 - 2290 (1946)

REACTION OF BIS(TRIMETHYLSILYL) SULFATE WITH HYDROGEN HALIDES AND WITH PHOSPHORUS AND SULFUR HALIDES AND OXYHALIDES

Voronkov, M. G.,Roman, V. K.,Maletina, E. A.,Korotaeva, I. M.

, p. 621 - 623 (1982)

-

Catalytic Metal-Free Deoxygenation of Nitrous Oxide with Disilanes

Anthore-Dalion, Lucile,Nicolas, Emmanuel,Cantat, Thibault

, p. 11563 - 11567 (2019)

Because of its high kinetic stability, conditions to reduce the greenhouse gas N2O are limited; therefore, a better understanding of N2O chemistry and N-O bond cleavage is required. In this work, N2O was deoxygenated under metal-free conditions. Using disilanes as reducing agents and a catalytic amount of fluoride anions or alkoxides allowed a mild reduction at ambient pressure and temperature. DFT calculations unveiled the mechanism, which shows a nucleophilic addition of a silyl anion to the central N atom of N2O and release of N2 from a pseudo-Brook rearrangement.

Persson, Christina,Andersson, Carlaxel

, p. 847 - 850 (1992)

Trimethylethoxysilane Liquid-Phase Hydrolysis Equilibrium and Dimerization Kinetics: Catalyst, Nonideal Mixing, and the Condensation Route

Rankin, Stephen E.,Sefcik, Jan,McCormick, Alon V.

, p. 4233 - 4241 (1999)

Although the kinetics of organoethoxysilane hydrolytic (poly)condensation have been studied under kinetically simplified conditions, materials are actually synthesized from nonideal mixtures with high monomer and catalyst concentrations. Using 29Si nuclear magnetic resonance, we study the hydrolysis of trimethylethoxysilane and the dimerization of the resulting silanol in aqueous ethanol at monomer and catalyst concentrations typical of organically modified silicate synthesis. Under acidic conditions, we find that when (and only when) the effects of solvent composition on catalyst activity are considered, it becomes clear that water-producing condensation is the dominant dimerization route. Under basic conditions, the extent of deprotonation of the weakly acidic silanol passes through a minimum during reaction, thereby producing an anomolous trend in reaction rate. This necessitates a kinetic model which is first order in both silanol and deprotonated silanol and which accounts for changing deprotonation.

Stationary and Pulsed Photolysis and Pyrolysis of 1,1-Dimethylsilacyclobutane

Brix, Th.,Arthur, N. L.,Potzinger, P.

, p. 8193 - 8197 (1989)

A study of the photolysis of 1,1-dimethylsilacyclobutane at 147 - 214 nm shows that of the four primary processes identified the predominant mode of decomposition is to C2H4 and dimethylsilaethene.Evidence from experiments in the presence of SF6 suggests that the dimethylsilaethene is formed initially in a vibrationally excited state: +hν -> Me2SiCH2v + CH2=CH2.Laser pulsed photolysis experiments at 193 nm have been carried out to measure tha absorption spectrum of Me2SiCH2, its absorption cross section, and the rate constant for Me2SCH2 combination: 2Me2SiCH2 -> (Me2SiCH2)2.The values obtained are ? (240 nm, base e) = (1.0 +/- 0.2)E-17 cm2 and k7 = (3.3 +/- 0.8)E-11 cm3 s-1.The kinetics of the pyrolysis of have also been reexamined, yielding the following rate constant expressions: k1/(s-1) = E(15.46 +/- 0.13) exp(-(31043 +/- 218)/T) and k-1/k71/2/(cm3/2s-1/2) = E(-7.0 +/- 0.3) exp(-(7850 +/- 300)/T).From these results, the heat of formation, ?-bond energy, and entropy of Me2SiCH2, have been deduced: ΔHfθ (g, 298 K) = 36 +/- 7 kJ mol-1, B? = 157 +/- 11 kJ mol-1, and Sθ(g, 298 K) = 332 +/- 8 J mol-1 K-1.

Catalytic Iodination of the Aliphatic C-F Bond by YbI3(THF)3: Mechanistic Insight and Synthetic Utility

Janjetovic, Mario,Ekebergh, Andreas,Tr?ff, Annika M.,Hilmersson, G?ran

, p. 2804 - 2807 (2016)

A facile iodination protocol of unactivated alkyl fluorides using catalytic amounts of YbI3(THF)3 in the presence of iodotrimethylsilane as a stoichiometric fluoride trapping agent is presented. 1H NMR spectroscopy demonstrates a two-step catalytic cycle where TMSI regenerates active YbI3(THF)3. Finally, the catalytic reaction is extended into a one-pot procedure to demonstrate a potential application of the method. Overall, the findings present a distinct strategy for C-F bond transformations in the presence of catalytic YbI3(THF)3.

-

Pearlson, W. H.,Brice, T. J.,Simons, J. H.

, p. 1769 - 1770 (1945)

-

The pentamethylcyclopentadienylsilicon(II) cation as a catalyst for the specific degradation of oligo(ethyleneglycol) diethers

Leszczynska, Kinga,Mix, Andreas,Berger, Raphael J. F.,Rummel, Britta,Neumann, Beate,Stammler, Hans-Georg,Jutzi, Peter

, p. 6843 - 6846 (2011)

Catalytic open sandwiches: Oligo(ethyleneglycol) diethers RO(CH 2CH2O)nR are degraded by the unusual catalyst Cp Si+ (see scheme). The open coordination sphere at silicon allows up to four Si-O contacts; crystal structure data of the reactive compounds [Cp Si(dme)]+BR4- and [Cp Si([12]crown-4)] +BR4- (R=C6F5) show weakly bound ether molecules. Copyright

Unusual desilanolysis of 1,1-Dimethyl-1-(trimethylsiloxy)-3-phenylpropyne

Boyarkina,Mirskov,Voronkov,Rakhlin

, p. 316 - 316 (2001)

-

Reactions of trimethyliodosilane with mono-, di-, and trioxacycloalkanes

Voronkov, M. G.,Dubinskaya, E. I.

, p. 13 - 32 (1991)

The reactions of Me3SiI with mono-, di-, and trioxacycloalkanes have been studied first.Preparative methods for the synthesis of some promising synthones, namely α,ω-diiodoalkanes, α,ω-alkanediols, and iodomethyl ω-iodoalkyl ethers, have been developed based on these reactions.The effect of the cycle size and the nature of the substituent on the course of the reactions is demonstrated.Schemes for the mechanism of the reactions are suggested.

Reaction of Trimethylsilyl Benzhydryl Ethers with Methyl N-(Trimethylsilyl)pyroglutamate: An Easy and Rapid N-Alkylation

Rigo, Beno?t,Gautret, Philippe,Legrand, Anne,Hénichart, Jean-Pierre,Couturier, Daniel

, p. 998 - 1000 (1997)

In the presence of a small amount of catalyst (mainly triflic acid), methyl N-(trimethylsilyl)pyroglutamate quickly reacts with benzhydryl chlorides or preferentially with trimethylsilyl benzhydryl ethers to give methyl N-(benzhydryl)pyroglutamates in nearly quantitative isolated yields.

Fessenden,Freenor

, p. 1681 (1961)

-

Seyferth,D. et al.

, p. 1080 - 1082 (1968)

-

Metathesis of silicon-containing olefins. X. Metathesis of vinyltrimethylsilane catalyzed by ruthenium complexes

Marciniec, Bogdan,Pietraszuk, Cezary,Foltynowicz, Zenon

, p. 83 - 88 (1994)

Self metathesis of vinyltrimethylsilane in the presence of an oxygenated benzene solution of RuCl2(PPh3)3 and RuH2(PPh3)4 follows an unusual course and yields two products, 1,2-bis(silyl)ethene (E) and 1,1-bis(silyl)ethene, with products of dimerization, namely 1,4-bis(silyl)butenes-2 (E + Z) and butenylsilanes as well as hexamethyldisiloxane.Gaseous ethylene and traces of ethane were also detected.It is proposed that vinylsilane is inserted into the Ru-Si bond (via ortho-metallation of the ruthenium triphenylphosphine complex) in competition with pathways involving metal-carbene species.Complexes of ruthenium containing no phenylphosphine give stereoselectively only the (E)-product of metathesis (even in the absence of oxygen and hydrosilane co-catalysts) accompanied by traces of the same by-products. Key words: Silicon; Ruthenium; Metathesis; Olefin

THE SEARCH FOR THE ETHYNYL CATION: NITROSATION OF N,N-BIS(TRIMETHYLSILYL)YNAMINES

Alvarez, Roberto Martinez,Hanack, Michael,Schmid, Thomas,Subramanian, L. R.

, p. 191 - 194 (1995)

The reaction of bis-silylated ynamines with different nitrosyl reagents affords products derived from an electrophilic attack at the β-carbon atom and not the expected alkynyldiazonium salts.

-

Sommer et al.

, p. 156 (1946)

-

CO2 conversion to isocyanate via multiple N-Si bond cleavage at a bulky uranium(III) complex

Camp, Clément,Chatelain, Lucile,Kefalidis, Christos E.,Pécaut, Jacques,Maron, Laurent,Mazzanti, Marinella

, p. 15454 - 15457 (2015)

The reaction of the sterically saturated uranium(iii) tetrasilylamido complex [K(18c6)][U(N(SiMe3)2)4] with CO2 leads to CO2 insertion into the U-N bond affording the stable U(iv) isocyanate complex [K(18c6)][U(N(SiMe3)2)3(NCO)2]n that was crystallographically characterized. DFT studies indicate that the reaction involves the [2+2] cyclo-addition of a double bond of OCO to the U-N(SiMe3)2 bond and proceeds to the final product through multiple silyl migration steps.

Facile Synthesis of the Dicyanophosphide Anion via Electrochemical Activation of White Phosphorus: An Avenue to Organophosphorus Compounds

Liu, Liu Leo,Mei, Yanbo,Yan, Zeen

supporting information, p. 1517 - 1522 (2022/02/01)

Organophosphorus compounds (OPCs) have gained tremendous interest in the past decades due to their wide applications ranging from synthetic chemistry to materials and biological sciences. We describe herein a practical and versatile approach for the trans

Dimensional Reduction of Lewis Acidic Metal-Organic Frameworks for Multicomponent Reactions

Feng, Xuanyu,Song, Yang,Lin, Wenbin

supporting information, p. 8184 - 8192 (2021/06/27)

Owing to hindered diffusions, the application of porous catalytic materials has been limited to relatively simple organic transformations with small substrates. Herein we report a dimensional reduction strategy to construct a two-dimensional metal-organic framework (MOF), Zr6OTf-BTB, with 96% accessible Lewis acidic sites as probed by the bulky Lewis base pivalonitrile. With nearly free substrate accessibility, Zr6OTf-BTB outperformed two three-dimensional MOF counterparts of similar Lewis acidity (Zr6OTf-BPDC and Zr6OTf-BTC) in catalyzing sterically hindered multicomponent reactions (MCRs) for the construction of tetrahydroquinoline and aziridine carboxylate derivatives with high turnover numbers (TONs). Zr6OTf-BTB was also superior to the homogeneous benchmark Sc(OTf)3 with nearly 14 times higher TON and 9 times longer catalyst lifetime. Furthermore, the topology-activity relationships in these Zr-based Lewis acidic MOFs were rationalized by comparing their Lewis acidity, numbers of Lewis acidic sites, and sterically accessible Lewis acidic sites. Zr6OTf-BTB was successfully used to construct several bioactive molecules via MCRs with excellent efficiency. This dimensional reduction strategy should allow the development of other MOF catalysts for synthetically useful and complicated organic transformations.

Sustainable Catalytic Synthesis of Diethyl Carbonate

Putro, Wahyu S.,Ikeda, Akira,Shigeyasu, Shinji,Hamura, Satoshi,Matsumoto, Seiji,Lee, Vladimir Ya.,Choi, Jun-Chul,Fukaya, Norihisa

, p. 842 - 846 (2020/12/07)

New sustainable approaches should be developed to overcome equilibrium limitation of dialkyl carbonate synthesis from CO2 and alcohols. Using tetraethyl orthosilicate (TEOS) and CO2 with Zr catalysts, we report the first example of sustainable catalytic synthesis of diethyl carbonate (DEC). The disiloxane byproduct can be reverted to TEOS. Under the same conditions, DEC can be synthesized using a wide range of alkoxysilane substrates by investigating the effects of the number of ethoxy substituent in alkoxysilane substrates, alkyl chain, and unsaturated moiety on the fundamental property of this reaction. Mechanistic insights obtained by kinetic studies, labeling experiments, and spectroscopic investigations reveal that DEC is generated via nucleophilic ethoxylation of a CO2-inserted Zr catalyst and catalyst regeneration by TEOS. The unprecedented transformation offers a new approach toward a cleaner route for DEC synthesis using recyclable alkoxysilane.

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