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Cas No: 107-46-0
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107-46-0 Usage

Uses

A silicon based compound that can be used to create potentially biocompatible materials. Used as a monomer in the synthesis of long chain polysiloxane structures. Used in the methylation of mercury(II) salts.

Chemical Properties

Colorless or yellowish transparent liquid

Definition

ChEBI: An organosiloxane consisting of two trimethylsilyl groups covalently bound to a central oxygen.

Purification Methods

Fractionally distil through a column packed with glass helices with ca 15 theoretical 20 1.3777. plates. It is highly flammable and is an irritant. [Mills & McKenzie J Am Chem Soc 76 2672 1954, Csakvari et al. J Organometal Chem 107 287 1976, Beilstein 4 IV 4018.]
InChI:InChI=1/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3

107-46-0 Well-known Company Product Price

Brand (Code)Product description CAS number Packaging Price Detail
Sigma-Aldrich (01565)  Hexamethyldisiloxane  for GC derivatization, ≥98% (GC) 107-46-0 01565-10X1ML 1,007.37CNY Detail
Sigma-Aldrich (01565)  Hexamethyldisiloxane  for GC derivatization, ≥98% (GC) 107-46-0 01565-1ML 346.32CNY Detail
Aldrich (469300)  Hexamethyldisiloxane  viscosity 0.65 cSt (25 °C) 107-46-0 469300-250ML 4,733.82CNY Detail
Aldrich (469300)  Hexamethyldisiloxane  viscosity 0.65 cSt (25 °C) 107-46-0 469300-50ML 1,291.68CNY Detail
Aldrich (205389)  Hexamethyldisiloxane  ≥98% 107-46-0 205389-500ML 668.07CNY Detail
Aldrich (205389)  Hexamethyldisiloxane  ≥98% 107-46-0 205389-100ML 299.52CNY Detail
Aldrich (205389)  Hexamethyldisiloxane  ≥98% 107-46-0 205389-5ML 284.31CNY Detail
Aldrich (326739)  Hexamethyldisiloxane  NMR grade, ≥99.5% 107-46-0 326739-100G 651.69CNY Detail
Sigma-Aldrich (52630)  Hexamethyldisiloxane  puriss., ≥98.5% (GC) 107-46-0 52630-500ML 996.84CNY Detail
Sigma-Aldrich (52630)  Hexamethyldisiloxane  puriss., ≥98.5% (GC) 107-46-0 52630-100ML 319.41CNY Detail
Alfa Aesar (L16970)  Hexamethyldisiloxane, NMR grade, 99.7%    107-46-0 100g 541.0CNY Detail
Alfa Aesar (L16970)  Hexamethyldisiloxane, NMR grade, 99.7%    107-46-0 25g 196.0CNY Detail

107-46-0SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 10, 2017

Revision Date: Aug 10, 2017

1.Identification

1.1 GHS Product identifier

Product name hexamethyldisiloxane

1.2 Other means of identification

Product number -
Other names HMDO

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Abrasives,Adhesives and sealant chemicals,Anti-adhesive agents,CBI,Intermediates,Laboratory chemicals,Solvents (for cleaning or degreasing),Surface active agents
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:107-46-0 SDS

107-46-0Synthetic route

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With hydrogenchloride at 20℃;100%
With sodium hydroxide In water at 30℃; for 0.416667h; Concentration; Temperature;99.97%
With styrene type I anion exchange resin In water at 45 - 75℃; for 2.5h; Concentration; Temperature; Inert atmosphere;93.8%
trimethylsilan
993-07-7

trimethylsilan

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With hydrogenchloride In diethyl ether at 100℃; for 101.5h;A 84%
B 16%
With hydrogenchloride; diethyl ether In benzene-d6 at 100℃; Reagent/catalyst; Schlenk technique; Inert atmosphere;A 84 %Spectr.
B 16 %Spectr.
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

bis(2-chloroethyl) vinylphosphonate
115-98-0

bis(2-chloroethyl) vinylphosphonate

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

vinylphosphonic acid
1746-03-8

vinylphosphonic acid

Conditions
ConditionsYield
Stage #1: chloro-trimethyl-silane; bis(2-chloroethyl) vinylphosphonate at 0 - 170℃; under 3040.2 Torr; for 24h;
Stage #2: With water for 1 - 2h;
A n/a
B 95%
Trimethylsilanol
1066-40-6

Trimethylsilanol

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With 1,1,1,3,3,3-hexamethyl-disilazane; scandium tris(trifluoromethanesulfonate) In chlorobenzene at 70℃; for 1h;82%
With hydrogenchloride
With K2CO3 or Al2O3 In neat (no solvent) react. of (CH3)3SiOH and K2CO3 or Al2O3 at room temp.;;
With K2CO3 or Al2O3 In neat (no solvent) react. of (CH3)3SiOH and K2CO3 or Al2O3 at room temp.;;
1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With ammonium sulfate; urea In 1,2-dimethoxyethane at 90℃; for 0.666667h; Temperature; Reagent/catalyst; Inert atmosphere; Large scale;99.7%
With water; hydrogenchloride at 85.4℃; Mechanism; Equilibrium constant; influence of catalyst concentration;
With potassium dichromate; sulfuric acid; silver sulfate In water for 2h; Mechanism; Heating; other organosilicon compounds, chemical oxygen demand value, oxidizability, glass beads presence;
With water; scandium tris(trifluoromethanesulfonate) In chlorobenzene at 70℃; for 1h; Inert atmosphere;
Trimethylsilanol
1066-40-6

Trimethylsilanol

phenylsilane
694-53-1

phenylsilane

A

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane
27991-58-8

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With nickel(II) bis(2,2,6,6-tetramethylheptane-3,5-dionate) In dichloromethane at 20℃; for 19h; Schlenk technique; Inert atmosphere;A 74%
B 0.15 mmol
1-(Trimethylsilyloxy)cyclohexene
6651-36-1

1-(Trimethylsilyloxy)cyclohexene

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

<2-D>Cyclohexanone
2979-36-4

<2-D>Cyclohexanone

Conditions
ConditionsYield
With hydrogen; Rh(PPh3)3Cl In water-d2 at 50℃; under 760 Torr; for 18h;A n/a
B 95%
Trimethylsilanol
1066-40-6

Trimethylsilanol

phenylsilane
694-53-1

phenylsilane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

C9H16OSi2

C9H16OSi2

Conditions
ConditionsYield
With (triphenylphosphine)gold(I) chloride; tributylphosphine In tetrahydrofuran at 25℃; for 13h; Reagent/catalyst; Solvent; Inert atmosphere;A 15%
B 85%
Trimethylsilanol
1066-40-6

Trimethylsilanol

phenylsilane
694-53-1

phenylsilane

A

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane
27991-58-8

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

C9H16OSi2

C9H16OSi2

Conditions
ConditionsYield
With (triphenylphosphine)gold(I) chloride; tributylphosphine In N,N-dimethyl acetamide at 25℃; for 13h; Inert atmosphere;A 6%
B 48%
C 71%
Trimethylsilanol
1066-40-6

Trimethylsilanol

2-methyl a l l y l t r i s-(trimethylsiloxy)silane
37611-52-2

2-methyl a l l y l t r i s-(trimethylsiloxy)silane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane
3555-47-3

1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane

Conditions
ConditionsYield
With Amberlyst-15 In acetonitrile at 20℃;
triethylsilane
617-86-7

triethylsilane

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

triethylsilyl chloride
994-30-9

triethylsilyl chloride

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

1,1,1-triethyl-3,3,3-trimethyl-disiloxane
2652-41-7

1,1,1-triethyl-3,3,3-trimethyl-disiloxane

Conditions
ConditionsYield
With Mo(CO)5(trimethylamine); N,N-dimethyl-formamide In benzene-d6 at 20℃; for 144h; Sealed tube; Inert atmosphere;
1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

nitrogen
7727-37-9

nitrogen

Conditions
ConditionsYield
With cesium fluoride; dinitrogen monoxide In dimethylsulfoxide-d6 at 20℃; under 750.075 Torr; for 4h; Reagent/catalyst;A 77 %Chromat.
B n/a
bis(trimethylsilyl)sulphate
18306-29-1

bis(trimethylsilyl)sulphate

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With potassium sulfate at 250℃; for 3h;82%
With sodium at 150℃;68%
With hydrogen iodide In octane at 0℃;56%
With water
1-nitro-1-phenylmethane

1-nitro-1-phenylmethane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 96%
1-methyl-2-(2-nitroethyl)benzene

1-methyl-2-(2-nitroethyl)benzene

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

2-Methylbenzonitrile
529-19-1

2-Methylbenzonitrile

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 90%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

tris(trimethylsilyl)amine
1586-73-8

tris(trimethylsilyl)amine

D

1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

Conditions
ConditionsYield
With sodium; cis-{tungsten(dinitrogen)2(P(methyl)2Ph)4} In tetrahydrofuran at 30℃; for 4h; Further byproducts given;A 71.8 % Chromat.
B n/a
C 2.9 % Chromat.
D 1.6 % Chromat.
With sodium; cis-(molybdenum-bis(dinitrogen)(PMe2Ph)4) In tetrahydrofuran at 30℃; for 15h; Further byproducts given;A 39.0 % Chromat.
B n/a
C 36.6 % Chromat.
D 1.1 % Chromat.
1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With hydrogenchloride; diethyl ether at 120℃; for 70h; Sealed tube;100%
With carbon monoxide; hydrogen; nickel at 200℃; under 750.06 Torr; for 2h;59%
With bromobenzene; calcium In water for 1h; Ambient temperature;5%
trimethylsilyl fluoride
420-56-4

trimethylsilyl fluoride

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With potassium hydroxide Heating; Yield given;
With calcium hydroxide; potassium hydroxide In water
With calcium hydroxide; potassium hydroxide In water
3-nitroxylene
38362-90-2

3-nitroxylene

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

3-Methylbenzonitrile
620-22-4

3-Methylbenzonitrile

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 93%
1-nitroadamantane
7575-82-8

1-nitroadamantane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

1-iodoadamantane
768-93-4

1-iodoadamantane

C

NO, 0.5I2

NO, 0.5I2

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 98%
C n/a
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

Dimethylphenylsilane
766-77-8

Dimethylphenylsilane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

pentamethyl(phenyl)disiloxane
14920-92-4

pentamethyl(phenyl)disiloxane

C

1,1,3,3-tetramethyl-1,3-diphenyldisiloxane
56-33-7

1,1,3,3-tetramethyl-1,3-diphenyldisiloxane

D

phenyldimethylsilyl chloride
768-33-2

phenyldimethylsilyl chloride

Conditions
ConditionsYield
With Mo(CO)5(trimethylamine); N,N-dimethyl-formamide In benzene-d6 at 20℃; for 192h; Sealed tube; Inert atmosphere;
triethylsilane
617-86-7

triethylsilane

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

triethylsilyl chloride
994-30-9

triethylsilyl chloride

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

1,1,1-triethyl-3,3,3-trimethyl-disiloxane
2652-41-7

1,1,1-triethyl-3,3,3-trimethyl-disiloxane

D

hexaethyl disiloxane
994-49-0

hexaethyl disiloxane

Conditions
ConditionsYield
With Mo(CO)5(trimethylamine); N,N-dimethyl-formamide In benzene-d6 at 50℃; for 3h; Sealed tube; Inert atmosphere;
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

methyldiphenylsilane
776-76-1

methyldiphenylsilane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

1,1,1,3-tetramethyl-3,3-diphenyl-disiloxane
1719-04-6

1,1,1,3-tetramethyl-3,3-diphenyl-disiloxane

C

chloromethyldiphenylsilane
144-79-6

chloromethyldiphenylsilane

D

1,3-Dimethyl-1,1,3,3-tetraphenyldisiloxan
807-28-3

1,3-Dimethyl-1,1,3,3-tetraphenyldisiloxan

Conditions
ConditionsYield
With Mo(CO)5(trimethylamine); N,N-dimethyl-formamide In benzene-d6 at 20℃; for 408h; Sealed tube; Inert atmosphere;
1-nitrocyclohexane
1122-60-7

1-nitrocyclohexane

A

Cyclohexanone oxime
100-64-1

Cyclohexanone oxime

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

I2

I2

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A 84%
B n/a
C n/a
1,3-bis(iodomethyl)-1,1,3,3-tetramethyl-disiloxane
2943-69-3

1,3-bis(iodomethyl)-1,1,3,3-tetramethyl-disiloxane

2-Mercaptobenzothiazole
149-30-4

2-Mercaptobenzothiazole

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

2-[({3-[(1,3-benzotiazolium-2-ylsulfanyl)methyl]-1,1,3,3-tetramethyldisiloxanyl}methyl)sulfanyl]-1,3-benzotiazolium diiodide

2-[({3-[(1,3-benzotiazolium-2-ylsulfanyl)methyl]-1,1,3,3-tetramethyldisiloxanyl}methyl)sulfanyl]-1,3-benzotiazolium diiodide

Conditions
ConditionsYield
at 150℃; for 3h;A n/a
B 81%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

Me3Si(CH2)4OSiMe3
7140-91-2

Me3Si(CH2)4OSiMe3

D

1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

Conditions
ConditionsYield
With sodium; molybdenum(V) chloride In tetrahydrofuran at 30℃; for 4h;A 8.6 % Chromat.
B n/a
C 34.6 % Chromat.
D 2.0 % Chromat.
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

trimethylsilyl fluoride
420-56-4

trimethylsilyl fluoride

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With potassium fluoride; 18-crown-6 ether In water; chlorobenzene at 90 - 100℃; for 2h;A 41%
B n/a
1-nitrohexane
646-14-0

1-nitrohexane

A

hexanenitrile
628-73-9

hexanenitrile

B

hexanal oxime
6033-61-0

hexanal oxime

C

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A 10%
B 81%
C n/a
(2-nitroethenyl)benzene
102-96-5

(2-nitroethenyl)benzene

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

phenylacetonitrile
140-29-4

phenylacetonitrile

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 71%
C-trimethylsiloxymethyl-C,N-bis(trimethylsilyl)ketimine
104724-76-7

C-trimethylsiloxymethyl-C,N-bis(trimethylsilyl)ketimine

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

α-trimethylsilylacrylonitrile
96475-89-7

α-trimethylsilylacrylonitrile

Conditions
ConditionsYield
With boron trifluoride diethyl etherate In dichloromethane at -78℃; or other Lewis acids;A n/a
B 88%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

(acetylthiomethyl)trifluorosilane
91258-92-3

(acetylthiomethyl)trifluorosilane

acetylthiomethyl(trimethylsiloxy)difluorosilane

acetylthiomethyl(trimethylsiloxy)difluorosilane

Conditions
ConditionsYield
In tetrachloromethane Ambient temperature;100%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

mono-trimethylsilylphosphite
91076-68-5

mono-trimethylsilylphosphite

Conditions
ConditionsYield
With phosphonic Acid Heating;100%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

S-(tert-butyl)-S-phenylsulfoximine
222306-90-3

S-(tert-butyl)-S-phenylsulfoximine

S-tert-butyl-N-trimethylsilyl-S-phenylsulfoximine
222306-91-4

S-tert-butyl-N-trimethylsilyl-S-phenylsulfoximine

Conditions
ConditionsYield
at 85℃; for 0.666667h;100%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

S-methyl-S-phenylsulfoximine
4381-25-3

S-methyl-S-phenylsulfoximine

S-methyl-S-phenyl-N-(trimethylsilyl)sulfoximine
89902-44-3

S-methyl-S-phenyl-N-(trimethylsilyl)sulfoximine

Conditions
ConditionsYield
at 85℃; for 0.666667h;100%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

[trans-C5H8(PCy2)2Pt(CH2CMe3)H]

[trans-C5H8(PCy2)2Pt(CH2CMe3)H]

[trans-C5H8(PCy2)2Pt(CH2CMe3)CH2SiMe2OSiMe3]

[trans-C5H8(PCy2)2Pt(CH2CMe3)CH2SiMe2OSiMe3]

Conditions
ConditionsYield
In neat (no solvent) byproducts: CMe4; inert atm.; stirring (67°C, several h); evapn. (vac.);100%

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The effects of hydrogen addition on silica aggregate growth in atmospheric-pressure, 1-D methane/air flames with Hexamethyldisiloxane (cas 107-46-0) admixture08/26/2019

The effect of hydrogen addition on silica growth in burner-stabilized methane/air flames with trace amounts of hexamethyldisiloxane are reported. Profiles of the aggregates' radius of gyration Rg and monomer radius a versus residence time were measured by laser light scattering. Experiments...detailed

Microstructured SiOx thin films deposited from hexamethyldisilazane and Hexamethyldisiloxane (cas 107-46-0) using atmospheric pressure thermal microplasma jet08/25/2019

Mictrostructured silicon oxide (SiOx) thin films were deposited on glass and metal substrates from 1,1,1,3,3,3-hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO) by using atmospheric-pressure thermal microplasma jet. Two kinds of string-like products, randomly bent string-like product...detailed

Hexamethyldisiloxane (cas 107-46-0) cold plasma treatment and amylose content determine the structural, barrier and mechanical properties of starch-based films08/24/2019

In this study, the effect of amylose content and cold plasma treatment on starch films properties was investigated. Films from normal (30%) and high amylose (50 and 70%) starches were subjected to hexamethyldisiloxane (HMDSO) cold plasma treatment. Morphological, structural, mechanical and barri...detailed

Ionization cross section of radicals produced by Hexamethyldisiloxane (cas 107-46-0) dissociation08/23/2019

The ionization cross section of hexamethyldisiloxane (HMDSO) molecules (m/z = 162), pentamethyldisiloxane radicals (m/z = 147) and tetramethyl hydro disiloxane radicals (m/z = 133) have been measured versus electron energy up to 30 eV. The radicals are produced selectively by two different mecha...detailed

Fabrication of transparent bistable switching memory device using plasmapolymerized Hexamethyldisiloxane (cas 107-46-0) layers with embedded graphene quantum dots08/22/2019

We demonstrated the feasibility to fabricate two-terminal non-volatile-memory (NVM) devices using pulsed radio frequency (rf) plasma polymerization and simple solution route. The two-terminal NVM devices were fabricated based on a metal-insulator-metal structure consisting of graphene quantum do...detailed

The ice repellency of plasma polymerized Hexamethyldisiloxane (cas 107-46-0) coating08/21/2019

A superhydrophobic thin film was deposited on an aluminium oxide substrate by low pressure plasma polymerization of hexamethyldisiloxane (HMDSO). The coating was determined to be superhydrophobic due to its high water contact angle (∼158°) and low contact angle hysteresis. The aim of this work...detailed

Low-energy mass-selected ion beam production of fragments produced from Hexamethyldisiloxane (cas 107-46-0) for the formation of silicon oxide film08/20/2019

Fragment ions produced from hexamethyldisiloxane (HMDSO) with a hot tungsten wire in a Freeman-type ion source were studied using a low-energy mass-selected ion beam system. The mass numbers of the fragment ions were identified. Although the chemical formulae of these fragments were not complete...detailed

Fundamental equation of state correlation for Hexamethyldisiloxane (cas 107-46-0) based on experimental and molecular simulation data08/19/2019

An empirical fundamental equation of state correlation in terms of the Helmholtz energy is presented for hexamethyldisiloxane. The relatively small amount of thermodynamic data that is available in the literature for this substances is considerably extended by speed of sound measurements and num...detailed

Thermal stability of Hexamethyldisiloxane (cas 107-46-0) and octamethyltrisiloxane08/18/2019

A thermal stability test-rig for organic Rankine cycles working fluids was designed and commissioned at the Laboratory of Compressible-fluid dynamics for Renewable Energy Applications (CREA Lab) of Politecnico di Milano, in collaboration with the University of Brescia. The set-up is composed by ...detailed

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