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Hexamethyldisiloxane (HMDS) is an organosiloxane consisting of two trimethylsilyl groups covalently bound to a central oxygen. It is a colorless or yellowish transparent liquid with a measured melting point of -68.2°C and a measured boiling point of 100.5°C at 1013 hPa. Hexamethyldisiloxane is easily deliquescent, flammable, and has the risk of causing combustion when exposed to high heat, open flame, and strong oxidizing agents. It is insoluble in water but soluble in many organic solvents.

107-46-0

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107-46-0 Usage

Chemical Description

Hexamethyldisiloxane is a reducing agent used in combination with P4S10 in the thionation reaction.

Uses

Used in Consumer Applications:
Hexamethyldisiloxane is used as a precursor chemical with the addition of helium and oxygen to produce a silica coating. It is used in a variety of consumer applications and can be used as intermediates in the production of silicone polymers.
Used in Personal Care Products:
Hexamethyldisiloxane is used as a base fluid in a wide range of personal care products that require fast evaporation and high spreadability. When blended with Dimethicone fluids, it can adjust the residence time of the silicone on the skin. Unlike other volatile fluids, Hexamethyldisiloxane Fluid does not cool the skin as it evaporates. It is used as a carrying agent and diluent in skin cream lotions, bath oils, suntan lotions, nail polishes, antiperspirants, deodorants, hair sprays, and other beauty and hair care products.
Used in Biocompatible Materials:
Hexamethyldisiloxane is a silicon-based compound that can be used to create potentially biocompatible materials.
Used in Synthesis of Polysiloxane Structures:
Hexamethyldisiloxane is used as a monomer in the synthesis of long chain polysiloxane structures.
Used in Methylation of Mercury(II) Salts:
Hexamethyldisiloxane is used in the methylation of mercury(II) salts.
Used as a Silylating Agent:
Hexamethyldisiloxane can be used as a silylating agent for carboxylic acids and alcohols. It is also used in the preparation of aroyl chlorides and as a precursor for a variety of trimethylsilyl derivatives.
Used in Thin Film Deposition:
Hexamethyldisiloxane (HMDSO) is commonly utilized as a source for plasma-enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute for silane in silicon integrated circuit technology.
Used in Thionating Agent:
The addition of HMDSO to P4S10 improves its efficiency as a thionating agent.

Preparation

Synthesis of hexamethyldisiloxane by hydrolysis of trimethylsilyl chloride, water and sodium hydroxide.

Production Methods

Produced via acid hydrolysis of chlorotrimethylsilane and purification by distillation.

Flammability and Explosibility

Highlyflammable

Purification Methods

Fractionally distil through a column packed with glass helices with ca 15 theoretical 20 1.3777. plates. It is highly flammable and is an irritant. [Mills & McKenzie J Am Chem Soc 76 2672 1954, Csakvari et al. J Organometal Chem 107 287 1976, Beilstein 4 IV 4018.]

Check Digit Verification of cas no

The CAS Registry Mumber 107-46-0 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 1,0 and 7 respectively; the second part has 2 digits, 4 and 6 respectively.
Calculate Digit Verification of CAS Registry Number 107-46:
(5*1)+(4*0)+(3*7)+(2*4)+(1*6)=40
40 % 10 = 0
So 107-46-0 is a valid CAS Registry Number.
InChI:InChI=1/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3

107-46-0 Well-known Company Product Price

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  • TCI America

  • (H0091)  Hexamethyldisiloxane  >98.0%(GC)

  • 107-46-0

  • 25mL

  • 120.00CNY

  • Detail
  • TCI America

  • (H0091)  Hexamethyldisiloxane  >98.0%(GC)

  • 107-46-0

  • 100mL

  • 260.00CNY

  • Detail
  • TCI America

  • (H0091)  Hexamethyldisiloxane  >98.0%(GC)

  • 107-46-0

  • 500mL

  • 690.00CNY

  • Detail
  • Alfa Aesar

  • (A11848)  Hexamethyldisiloxane, 98+%   

  • 107-46-0

  • 25ml

  • 105.0CNY

  • Detail
  • Alfa Aesar

  • (A11848)  Hexamethyldisiloxane, 98+%   

  • 107-46-0

  • 100ml

  • 150.0CNY

  • Detail
  • Alfa Aesar

  • (A11848)  Hexamethyldisiloxane, 98+%   

  • 107-46-0

  • 500ml

  • 510.0CNY

  • Detail
  • Alfa Aesar

  • (A11848)  Hexamethyldisiloxane, 98+%   

  • 107-46-0

  • 2500ml

  • 2231.0CNY

  • Detail
  • Alfa Aesar

  • (L16970)  Hexamethyldisiloxane, NMR grade, 99.7%   

  • 107-46-0

  • 25g

  • 196.0CNY

  • Detail
  • Alfa Aesar

  • (L16970)  Hexamethyldisiloxane, NMR grade, 99.7%   

  • 107-46-0

  • 100g

  • 541.0CNY

  • Detail
  • Sigma-Aldrich

  • (52630)  Hexamethyldisiloxane  puriss., ≥98.5% (GC)

  • 107-46-0

  • 52630-100ML

  • 319.41CNY

  • Detail
  • Sigma-Aldrich

  • (52630)  Hexamethyldisiloxane  puriss., ≥98.5% (GC)

  • 107-46-0

  • 52630-500ML

  • 996.84CNY

  • Detail
  • Aldrich

  • (326739)  Hexamethyldisiloxane  NMR grade, ≥99.5%

  • 107-46-0

  • 326739-100G

  • 651.69CNY

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107-46-0SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 10, 2017

Revision Date: Aug 10, 2017

1.Identification

1.1 GHS Product identifier

Product name hexamethyldisiloxane

1.2 Other means of identification

Product number -
Other names HMDO

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Abrasives,Adhesives and sealant chemicals,Anti-adhesive agents,CBI,Intermediates,Laboratory chemicals,Solvents (for cleaning or degreasing),Surface active agents
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:107-46-0 SDS

107-46-0Synthetic route

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With hydrogenchloride at 20℃;100%
With sodium hydroxide In water at 30℃; for 0.416667h; Concentration; Temperature;99.97%
With styrene type I anion exchange resin In water at 45 - 75℃; for 2.5h; Concentration; Temperature; Inert atmosphere;93.8%
trimethylsilan
993-07-7

trimethylsilan

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With hydrogenchloride In diethyl ether at 100℃; for 101.5h;A 84%
B 16%
With hydrogenchloride; diethyl ether In benzene-d6 at 100℃; Reagent/catalyst; Schlenk technique; Inert atmosphere;A 84 %Spectr.
B 16 %Spectr.
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

bis(2-chloroethyl) vinylphosphonate
115-98-0

bis(2-chloroethyl) vinylphosphonate

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

vinylphosphonic acid
1746-03-8

vinylphosphonic acid

Conditions
ConditionsYield
Stage #1: chloro-trimethyl-silane; bis(2-chloroethyl) vinylphosphonate at 0 - 170℃; under 3040.2 Torr; for 24h;
Stage #2: With water for 1 - 2h;
A n/a
B 95%
Trimethylsilanol
1066-40-6

Trimethylsilanol

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With 1,1,1,3,3,3-hexamethyl-disilazane; scandium tris(trifluoromethanesulfonate) In chlorobenzene at 70℃; for 1h;82%
With hydrogenchloride
With K2CO3 or Al2O3 In neat (no solvent) react. of (CH3)3SiOH and K2CO3 or Al2O3 at room temp.;;
With K2CO3 or Al2O3 In neat (no solvent) react. of (CH3)3SiOH and K2CO3 or Al2O3 at room temp.;;
1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With ammonium sulfate; urea In 1,2-dimethoxyethane at 90℃; for 0.666667h; Temperature; Reagent/catalyst; Inert atmosphere; Large scale;99.7%
With water; hydrogenchloride at 85.4℃; Mechanism; Equilibrium constant; influence of catalyst concentration;
With potassium dichromate; sulfuric acid; silver sulfate In water for 2h; Mechanism; Heating; other organosilicon compounds, chemical oxygen demand value, oxidizability, glass beads presence;
With water; scandium tris(trifluoromethanesulfonate) In chlorobenzene at 70℃; for 1h; Inert atmosphere;
Trimethylsilanol
1066-40-6

Trimethylsilanol

phenylsilane
694-53-1

phenylsilane

A

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane
27991-58-8

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With nickel(II) bis(2,2,6,6-tetramethylheptane-3,5-dionate) In dichloromethane at 20℃; for 19h; Schlenk technique; Inert atmosphere;A 74%
B 0.15 mmol
1-(Trimethylsilyloxy)cyclohexene
6651-36-1

1-(Trimethylsilyloxy)cyclohexene

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

<2-D>Cyclohexanone
2979-36-4

<2-D>Cyclohexanone

Conditions
ConditionsYield
With hydrogen; Rh(PPh3)3Cl In water-d2 at 50℃; under 760 Torr; for 18h;A n/a
B 95%
Trimethylsilanol
1066-40-6

Trimethylsilanol

phenylsilane
694-53-1

phenylsilane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

C9H16OSi2

C9H16OSi2

Conditions
ConditionsYield
With (triphenylphosphine)gold(I) chloride; tributylphosphine In tetrahydrofuran at 25℃; for 13h; Reagent/catalyst; Solvent; Inert atmosphere;A 15%
B 85%
Trimethylsilanol
1066-40-6

Trimethylsilanol

phenylsilane
694-53-1

phenylsilane

A

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane
27991-58-8

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

C9H16OSi2

C9H16OSi2

Conditions
ConditionsYield
With (triphenylphosphine)gold(I) chloride; tributylphosphine In N,N-dimethyl acetamide at 25℃; for 13h; Inert atmosphere;A 6%
B 48%
C 71%
Trimethylsilanol
1066-40-6

Trimethylsilanol

2-methyl a l l y l t r i s-(trimethylsiloxy)silane
37611-52-2

2-methyl a l l y l t r i s-(trimethylsiloxy)silane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane
3555-47-3

1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane

Conditions
ConditionsYield
With Amberlyst-15 In acetonitrile at 20℃;
triethylsilane
617-86-7

triethylsilane

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

triethylsilyl chloride
994-30-9

triethylsilyl chloride

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

1,1,1-triethyl-3,3,3-trimethyl-disiloxane
2652-41-7

1,1,1-triethyl-3,3,3-trimethyl-disiloxane

Conditions
ConditionsYield
With Mo(CO)5(trimethylamine); N,N-dimethyl-formamide In benzene-d6 at 20℃; for 144h; Sealed tube; Inert atmosphere;
1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

nitrogen
7727-37-9

nitrogen

Conditions
ConditionsYield
With cesium fluoride; dinitrogen monoxide In dimethylsulfoxide-d6 at 20℃; under 750.075 Torr; for 4h; Reagent/catalyst;A 77 %Chromat.
B n/a
bis(trimethylsilyl)sulphate
18306-29-1

bis(trimethylsilyl)sulphate

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With potassium sulfate at 250℃; for 3h;82%
With sodium at 150℃;68%
With hydrogen iodide In octane at 0℃;56%
With water
1-nitro-1-phenylmethane

1-nitro-1-phenylmethane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 96%
1-methyl-2-(2-nitroethyl)benzene

1-methyl-2-(2-nitroethyl)benzene

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

2-Methylbenzonitrile
529-19-1

2-Methylbenzonitrile

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 90%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

tris(trimethylsilyl)amine
1586-73-8

tris(trimethylsilyl)amine

D

1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

Conditions
ConditionsYield
With sodium; cis-{tungsten(dinitrogen)2(P(methyl)2Ph)4} In tetrahydrofuran at 30℃; for 4h; Further byproducts given;A 71.8 % Chromat.
B n/a
C 2.9 % Chromat.
D 1.6 % Chromat.
With sodium; cis-(molybdenum-bis(dinitrogen)(PMe2Ph)4) In tetrahydrofuran at 30℃; for 15h; Further byproducts given;A 39.0 % Chromat.
B n/a
C 36.6 % Chromat.
D 1.1 % Chromat.
1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With hydrogenchloride; diethyl ether at 120℃; for 70h; Sealed tube;100%
With carbon monoxide; hydrogen; nickel at 200℃; under 750.06 Torr; for 2h;59%
With bromobenzene; calcium In water for 1h; Ambient temperature;5%
trimethylsilyl fluoride
420-56-4

trimethylsilyl fluoride

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With potassium hydroxide Heating; Yield given;
With calcium hydroxide; potassium hydroxide In water
With calcium hydroxide; potassium hydroxide In water
3-nitroxylene
38362-90-2

3-nitroxylene

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

3-Methylbenzonitrile
620-22-4

3-Methylbenzonitrile

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 93%
1-nitroadamantane
7575-82-8

1-nitroadamantane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

1-iodoadamantane
768-93-4

1-iodoadamantane

C

NO, 0.5I2

NO, 0.5I2

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 98%
C n/a
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

Dimethylphenylsilane
766-77-8

Dimethylphenylsilane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

pentamethyl(phenyl)disiloxane
14920-92-4

pentamethyl(phenyl)disiloxane

C

1,1,3,3-tetramethyl-1,3-diphenyldisiloxane
56-33-7

1,1,3,3-tetramethyl-1,3-diphenyldisiloxane

D

phenyldimethylsilyl chloride
768-33-2

phenyldimethylsilyl chloride

Conditions
ConditionsYield
With Mo(CO)5(trimethylamine); N,N-dimethyl-formamide In benzene-d6 at 20℃; for 192h; Sealed tube; Inert atmosphere;
triethylsilane
617-86-7

triethylsilane

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

triethylsilyl chloride
994-30-9

triethylsilyl chloride

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

1,1,1-triethyl-3,3,3-trimethyl-disiloxane
2652-41-7

1,1,1-triethyl-3,3,3-trimethyl-disiloxane

D

hexaethyl disiloxane
994-49-0

hexaethyl disiloxane

Conditions
ConditionsYield
With Mo(CO)5(trimethylamine); N,N-dimethyl-formamide In benzene-d6 at 50℃; for 3h; Sealed tube; Inert atmosphere;
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

methyldiphenylsilane
776-76-1

methyldiphenylsilane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

1,1,1,3-tetramethyl-3,3-diphenyl-disiloxane
1719-04-6

1,1,1,3-tetramethyl-3,3-diphenyl-disiloxane

C

chloromethyldiphenylsilane
144-79-6

chloromethyldiphenylsilane

D

1,3-Dimethyl-1,1,3,3-tetraphenyldisiloxan
807-28-3

1,3-Dimethyl-1,1,3,3-tetraphenyldisiloxan

Conditions
ConditionsYield
With Mo(CO)5(trimethylamine); N,N-dimethyl-formamide In benzene-d6 at 20℃; for 408h; Sealed tube; Inert atmosphere;
1-nitrocyclohexane
1122-60-7

1-nitrocyclohexane

A

Cyclohexanone oxime
100-64-1

Cyclohexanone oxime

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

I2

I2

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A 84%
B n/a
C n/a
1,3-bis(iodomethyl)-1,1,3,3-tetramethyl-disiloxane
2943-69-3

1,3-bis(iodomethyl)-1,1,3,3-tetramethyl-disiloxane

2-Mercaptobenzothiazole
149-30-4

2-Mercaptobenzothiazole

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

2-[({3-[(1,3-benzotiazolium-2-ylsulfanyl)methyl]-1,1,3,3-tetramethyldisiloxanyl}methyl)sulfanyl]-1,3-benzotiazolium diiodide

2-[({3-[(1,3-benzotiazolium-2-ylsulfanyl)methyl]-1,1,3,3-tetramethyldisiloxanyl}methyl)sulfanyl]-1,3-benzotiazolium diiodide

Conditions
ConditionsYield
at 150℃; for 3h;A n/a
B 81%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

Me3Si(CH2)4OSiMe3
7140-91-2

Me3Si(CH2)4OSiMe3

D

1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

Conditions
ConditionsYield
With sodium; molybdenum(V) chloride In tetrahydrofuran at 30℃; for 4h;A 8.6 % Chromat.
B n/a
C 34.6 % Chromat.
D 2.0 % Chromat.
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

A

trimethylsilyl fluoride
420-56-4

trimethylsilyl fluoride

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With potassium fluoride; 18-crown-6 ether In water; chlorobenzene at 90 - 100℃; for 2h;A 41%
B n/a
1-nitrohexane
646-14-0

1-nitrohexane

A

hexanenitrile
628-73-9

hexanenitrile

B

hexanal oxime
6033-61-0

hexanal oxime

C

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A 10%
B 81%
C n/a
(2-nitroethenyl)benzene
102-96-5

(2-nitroethenyl)benzene

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

phenylacetonitrile
140-29-4

phenylacetonitrile

Conditions
ConditionsYield
With trimethylsilyl iodide In dichloromethane at 25℃; for 16h;A n/a
B 71%
C-trimethylsiloxymethyl-C,N-bis(trimethylsilyl)ketimine
104724-76-7

C-trimethylsiloxymethyl-C,N-bis(trimethylsilyl)ketimine

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

α-trimethylsilylacrylonitrile
96475-89-7

α-trimethylsilylacrylonitrile

Conditions
ConditionsYield
With boron trifluoride diethyl etherate In dichloromethane at -78℃; or other Lewis acids;A n/a
B 88%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

(acetylthiomethyl)trifluorosilane
91258-92-3

(acetylthiomethyl)trifluorosilane

acetylthiomethyl(trimethylsiloxy)difluorosilane

acetylthiomethyl(trimethylsiloxy)difluorosilane

Conditions
ConditionsYield
In tetrachloromethane Ambient temperature;100%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

mono-trimethylsilylphosphite
91076-68-5

mono-trimethylsilylphosphite

Conditions
ConditionsYield
With phosphonic Acid Heating;100%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

S-(tert-butyl)-S-phenylsulfoximine
222306-90-3

S-(tert-butyl)-S-phenylsulfoximine

S-tert-butyl-N-trimethylsilyl-S-phenylsulfoximine
222306-91-4

S-tert-butyl-N-trimethylsilyl-S-phenylsulfoximine

Conditions
ConditionsYield
at 85℃; for 0.666667h;100%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

S-methyl-S-phenylsulfoximine
4381-25-3

S-methyl-S-phenylsulfoximine

S-methyl-S-phenyl-N-(trimethylsilyl)sulfoximine
89902-44-3

S-methyl-S-phenyl-N-(trimethylsilyl)sulfoximine

Conditions
ConditionsYield
at 85℃; for 0.666667h;100%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

[trans-C5H8(PCy2)2Pt(CH2CMe3)H]

[trans-C5H8(PCy2)2Pt(CH2CMe3)H]

[trans-C5H8(PCy2)2Pt(CH2CMe3)CH2SiMe2OSiMe3]

[trans-C5H8(PCy2)2Pt(CH2CMe3)CH2SiMe2OSiMe3]

Conditions
ConditionsYield
In neat (no solvent) byproducts: CMe4; inert atm.; stirring (67°C, several h); evapn. (vac.);100%

107-46-0Related news

The effects of hydrogen addition on silica aggregate growth in atmospheric-pressure, 1-D methane/air flames with Hexamethyldisiloxane (cas 107-46-0) admixture08/26/2019

The effect of hydrogen addition on silica growth in burner-stabilized methane/air flames with trace amounts of hexamethyldisiloxane are reported. Profiles of the aggregates' radius of gyration Rg and monomer radius a versus residence time were measured by laser light scattering. Experiments...detailed

Microstructured SiOx thin films deposited from hexamethyldisilazane and Hexamethyldisiloxane (cas 107-46-0) using atmospheric pressure thermal microplasma jet08/25/2019

Mictrostructured silicon oxide (SiOx) thin films were deposited on glass and metal substrates from 1,1,1,3,3,3-hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO) by using atmospheric-pressure thermal microplasma jet. Two kinds of string-like products, randomly bent string-like product...detailed

Hexamethyldisiloxane (cas 107-46-0) cold plasma treatment and amylose content determine the structural, barrier and mechanical properties of starch-based films08/24/2019

In this study, the effect of amylose content and cold plasma treatment on starch films properties was investigated. Films from normal (30%) and high amylose (50 and 70%) starches were subjected to hexamethyldisiloxane (HMDSO) cold plasma treatment. Morphological, structural, mechanical and barri...detailed

Ionization cross section of radicals produced by Hexamethyldisiloxane (cas 107-46-0) dissociation08/23/2019

The ionization cross section of hexamethyldisiloxane (HMDSO) molecules (m/z = 162), pentamethyldisiloxane radicals (m/z = 147) and tetramethyl hydro disiloxane radicals (m/z = 133) have been measured versus electron energy up to 30 eV. The radicals are produced selectively by two different mecha...detailed

Fabrication of transparent bistable switching memory device using plasmapolymerized Hexamethyldisiloxane (cas 107-46-0) layers with embedded graphene quantum dots08/22/2019

We demonstrated the feasibility to fabricate two-terminal non-volatile-memory (NVM) devices using pulsed radio frequency (rf) plasma polymerization and simple solution route. The two-terminal NVM devices were fabricated based on a metal-insulator-metal structure consisting of graphene quantum do...detailed

The ice repellency of plasma polymerized Hexamethyldisiloxane (cas 107-46-0) coating08/21/2019

A superhydrophobic thin film was deposited on an aluminium oxide substrate by low pressure plasma polymerization of hexamethyldisiloxane (HMDSO). The coating was determined to be superhydrophobic due to its high water contact angle (∼158°) and low contact angle hysteresis. The aim of this work...detailed

Low-energy mass-selected ion beam production of fragments produced from Hexamethyldisiloxane (cas 107-46-0) for the formation of silicon oxide film08/20/2019

Fragment ions produced from hexamethyldisiloxane (HMDSO) with a hot tungsten wire in a Freeman-type ion source were studied using a low-energy mass-selected ion beam system. The mass numbers of the fragment ions were identified. Although the chemical formulae of these fragments were not complete...detailed

Fundamental equation of state correlation for Hexamethyldisiloxane (cas 107-46-0) based on experimental and molecular simulation data08/19/2019

An empirical fundamental equation of state correlation in terms of the Helmholtz energy is presented for hexamethyldisiloxane. The relatively small amount of thermodynamic data that is available in the literature for this substances is considerably extended by speed of sound measurements and num...detailed

Thermal stability of Hexamethyldisiloxane (cas 107-46-0) and octamethyltrisiloxane08/18/2019

A thermal stability test-rig for organic Rankine cycles working fluids was designed and commissioned at the Laboratory of Compressible-fluid dynamics for Renewable Energy Applications (CREA Lab) of Politecnico di Milano, in collaboration with the University of Brescia. The set-up is composed by ...detailed

107-46-0Relevant academic research and scientific papers

Reactions of organosilicon-group V compounds with nitrosyl chloride

Byrne, Joseph E.,Russ, Charles R.

, p. 357 - 360 (1970)

The reactions of (CH3)3SiN(CH3)2, (CH3)3SiP(CH3)2, and (CH3)3SiAs(CH3)2 with NOCl have been studied. The products observed are, respectively: (CH3)3SiCl and (CH3)2NNO; (CH3)3SiOSi(CH3)3, N2O, NO, N2, (CH3)3SiCl, (CH3)2P(O)Cl, and a glassy solid; (CH3)3SiOSi(CH3)3, N2O, and (CH3)2AsCl.

Siloxane derivatives of 2-mercaptobenzothiazole

Zhilitskaya, Larisa V.,Yarosh, Nina O.,Shagun, Lyudmila G.,Dorofeev, Ivan A.,Larina, Lyudmila I.

, p. 352 - 354 (2017)

First organosilicon captax derivatives were obtained from 2-mercaptobenzothiazole and 1-(iodomethyl)-1,1,3,3,3-pentamethyl-or 1,3-bis(iodomethyl)-1,1,3,3-tetramethyldisiloxanes in the absence or in the presence of bases.

Reactivity of Cyclic Silenolates Revisited

Haas, Michael,Leypold, Mario,Schuh, Lukas,Fischer, Roland,Torvisco, Ana,Stueger, Harald

, p. 3765 - 3773 (2017)

The stable exocyclic silenolates 2a-c (2a, R = Mes; 2b, R = o-Tol; 2c, R = 1-Ad) were fully characterized by NMR and UV-vis spectroscopy. According to spectroscopic and structural features, 2a-c are best described as acyl silyl anions (tautomeric structure I) in solution. This behavior is also reflected by the reaction of 2a,c with MeI. Both alkylation reactions take place at the corresponding silicon atom and lead to the formation of the methylated structures 4a,b in nearly quantitative yields. Furthermore, the thermal stability of exocyclic silenolates 2a,c was investigated. In the case of 2a, a thermally induced intramolecular sila-Peterson alkenation was observed at 60 °C. This transformation allowed straightforward access to 2-oxahexasilabicyclo[3.2.1]octan-8-ide 5 as a structurally complex, bicyclic silicon framework. In contrast to that, heating of 2c, as an example of an alkyl-substituted silenolate, led to an unexpected degradation to uncharacterized polymers. However, we were able to isolate the 1-adamantyl-substituted, bicyclic compound 8, which is structurally closely related to 5, by the treatment of 1,4-dipotassium-1,4-bis(trimethylsilyl)cyclohexasilane with 1 equiv of 1-adamantoyl chloride. Again an intramolecular sila-Peterson alkenation is responsible for the formation of 8. The mechanism for this highly selective reaction sequence is outlined and supported by density functional theory (DFT) calculations, which highlight the thermodynamic driving force and the low activation barriers of this multistep transformation.

Ether-like Si-Ge hydrides for applications in synthesis of nanostructured semiconductors and dielectrics

Tice, Jesse B.,Weng, Change,Tolle, John,D'Costa, Vijay R.,Singh, Rachna,Menendez, Jose,Kouvetakis, John,Chizmeshya, Andrew V. G.

, p. 6773 - 6782 (2009)

Hydrolysis reactions of silyl-germyl triflates are used to produce ether-like Si-Ge hydride compounds including H3SiOSiH3 and the previously unknown O(SiH2GeH3)2. The structural, energetic and vibrati

Mechanistic insights on azide-nitrile cycloadditions: On the dialkyltin oxide-trimethylsilyl azide route and a new vilsmeier-haack-type organocatalyst

Cantillo, David,Gutmann, Bernhard,Kappe, C. Oliver

, p. 4465 - 4475 (2011)

The mechanism of the azide-nitrile cycloaddition mediated by the known dialkylltin oxide-trimethylsilyl azide catalyst system has been addressed through DFT calculations. The catalytic cycle for this tin/silicon complex-based mechanism has been thoroughly examined, disclosing the most plausible intermediates and the energetics involved in the rate enhancement. In addition, a new catalyst, 5-azido-1-methyl-3,4-dihydro-2H-pyrrolium azide, is presented for the formation of tetrazoles by cycloaddition of sodium azide with organic nitriles under neutral conditions. The efficiency of this organocatalyst, generated in situ from N-methyl-2-pyrrolidone (NMP), sodium azide, and trimethylsilyl chloride under reaction conditions, has been examined by preparation of a series of 5-substituted-1H-tetrazoles. The desired target structures were obtained in high yields within 15-25 min employing controlled microwave heating. An in depth computational analysis of the proposed catalytic cycle has also been addressed to understand the nature of the rate acceleration. The computed energy barriers have been compared to the dialkylltin oxide-trimethylsilyl azide metal-based catalyst system. Both the tin/silicon species and the new organocatalyst accelerate the azide-nitrile coupling by activating the nitrile substrate. As compared to the dialkylltin oxide-trimethylsilyl azide method, the organocatalytic system presented herein has the advantage of higher reactivity, in situ generation from inexpensive materials, and low toxicity.

Bonding studies on zinc, cadmium, and mercury alkyls and amides, Zn(CH2EMe3)2 (E = C or Si) and M2 (M = Zn, Cd, or Hg). Heats of hydrolysis, standard heats of formation, and Zn-C and M-N (M = Zn, Cd, or Hg) bond energy terms

Guemruekcueoglue, Ismail E.,Jeffery, John,Lappert, Michael F.,Pedley, J. Brian,Rai, Audesh K.

, p. 53 - 62 (1988)

Calorimetric measurements have been carried out on the heats of hydrolysis of the homoleptic zinc alkyls Zn(CH2EMe3)2 (E = C or Si) and bis(trimethylsilyl)amides M2 (M = Zn, Cd, or Hg) at 25 +/- 0.01 deg C in aqueous hydrochloric (1 M; for the

1,2-Migration of the trimethylsilyl group in free radicals

Harris, Joanna M.,MacInnes, Iain,Walton, John C.,Maillard, Bernard

, p. C25 - C28 (1991)

EPR spectroscopic observations and product studies showed that the trimethylsilyl group undergos 1,2-migration from carbon to nitrogen in aminyl radicals, Me3SiCH2NH -> CH2NHSiMe3, and from carbon to oxygen in alkoxyl radicals, Me3SiCH2O -> CH2OSiMe3.

Generation and Reactivity of a NiIII2(μ-1,2-peroxo) Complex

Zhao, Norman,Filatov, Alexander S.,Xie, Jiaze,Hill, Ethan A.,Rogachev, Andrey Yu.,Anderson, John S.

, p. 21634 - 21639 (2020)

High-valent transition metal-oxo, -peroxo, and -superoxo complexes are crucial intermediates in both biological and synthetic oxidation of organic substrates, water oxidation, and oxygen reduction. While high-valent oxygenated complexes of Mn, Fe, Co, and Cu are increasingly well-known, high-valent oxygenated Ni complexes are comparatively rarer. Herein we report the isolation of such an unusual high-valent species in a thermally unstable NiIII2(μ-1,2-peroxo) complex, which has been characterized using single-crystal X-ray diffraction and X-ray absorption, NMR, and UV-vis spectroscopies. Reactivity studies show that this complex is stable toward dissociation of oxygen but reacts with simple nucleophiles and electrophiles.

Laser-powered homogeneous pyrolysis of 1,1-dimethyl-1-silacyclobutane in the presence of some common monomers

Pola, Josef,Cukanova, Dana,Minarik, Milan,Lycka, Antonin,Tlaskal, Jaroslav

, p. 23 - 34 (1992)

Laser-induced homogeneous pyrolysis of 1,1-dimethyl-1-silacyclobutane yields 1,1,3,3-tetramethyl-1,3-disilacyclobutane and ethene as major products.In the presence of vinyl acetate, allyl methyl ether, acrolein, methyl vinyl ether, methyl acrylate or meth

Catalytic Metal-Free Deoxygenation of Nitrous Oxide with Disilanes

Anthore-Dalion, Lucile,Nicolas, Emmanuel,Cantat, Thibault

, p. 11563 - 11567 (2019)

Because of its high kinetic stability, conditions to reduce the greenhouse gas N2O are limited; therefore, a better understanding of N2O chemistry and N-O bond cleavage is required. In this work, N2O was deoxygenated under metal-free conditions. Using disilanes as reducing agents and a catalytic amount of fluoride anions or alkoxides allowed a mild reduction at ambient pressure and temperature. DFT calculations unveiled the mechanism, which shows a nucleophilic addition of a silyl anion to the central N atom of N2O and release of N2 from a pseudo-Brook rearrangement.

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