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9,10-Dihydro-9,10-[1,2]benzenoanthracene-9-carboxylic acid is a complex organic compound with the molecular formula C21H14O2. It is a derivative of anthracene, a tricyclic aromatic hydrocarbon, with a benzene ring fused to the anthracene structure. 9,10-Dihydro-9,10-[1,2]benzenoanthracene-9-carboxylic acid is characterized by its unique molecular structure, which includes a dihydro (reduced) anthracene core and a carboxylic acid functional group at the 9-position. The presence of the carboxylic acid group imparts acidic properties to the molecule, making it a potential candidate for various chemical reactions and applications in fields such as organic synthesis, pharmaceuticals, and materials science. Due to its complex structure, 9,10-dihydro-9,10-[1,2]benzenoanthracene-9-carboxylic acid may exhibit unique chemical and physical properties that distinguish it from simpler anthracene derivatives.

4423-49-8

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4423-49-8 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 4423-49-8 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 4,4,2 and 3 respectively; the second part has 2 digits, 4 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 4423-49:
(6*4)+(5*4)+(4*2)+(3*3)+(2*4)+(1*9)=78
78 % 10 = 8
So 4423-49-8 is a valid CAS Registry Number.
InChI:InChI=1/C21H14O2/c22-20(23)21-16-10-4-1-7-13(16)19(14-8-2-5-11-17(14)21)15-9-3-6-12-18(15)21/h1-12,19H,(H,22,23)

4423-49-8Relevant academic research and scientific papers

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

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Paragraph 0575-0576, (2020/07/28)

A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component (wherein Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4 , Ry1 , Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR

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Paragraph 1161, (2019/12/06)

A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rx1 to Rx4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ry1 to Ry2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rz1 to Rz4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rx1 to Rx4, Ry1 to Ry2 and Rz1 to Rz4 has an anion group, M1m+ represents a sulfonium cation having a sulfonyl group, R001 to R003 each independently represent a monovalent organic group; provided that at least one of R001 to R003 is an organic group having an acid dissociable group; and M3m+ represents an m-valent organic cation having an electron-withdrawing group.

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID GENERATOR

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Paragraph 0727, (2018/06/09)

A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein R01 to R014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R01 to R014 may be mutually bonded to form a ring structure, provided that at least two of R01 to R014 are mutually bonded to form a ring structure, and at least one of R01 to R014 has an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m).

TRIPTYCENE DERIVATIVES FOR NUCLEIC ACID JUNCTION STABILIZATION

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Paragraph 00331; 00332, (2017/04/11)

The present invention is directed to compositions and methods using triptycene derivatives (TCDs) for three way junctions (TWJs).

Synthesis of 9-Substituted Triptycene Building Blocks for Solid-Phase Diversification and Nucleic Acid Junction Targeting

Yoon, Ina,Suh, Sung-Eun,Barros, Stephanie A.,Chenoweth, David M.

supporting information, p. 1096 - 1099 (2016/03/15)

Triptycenes have been shown to bind nucleic acid three-way junctions, but rapid and efficient methods to diversify the triptycene core are lacking. An efficient synthesis of a 9-substituted triptycene scaffold is reported that can be used as a building block for solid-phase peptide synthesis and rapid diversification. The triptycene building block was diversified to produce a new class of tripeptide-triptycenes, and their binding abilities toward d(CAG)·(CTG) repeat junctions were investigated.

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