Welcome to LookChem.com Sign In|Join Free

CAS

  • or

49778-01-0

Post Buying Request

49778-01-0 Suppliers

Recommended suppliersmore

  • Product
  • FOB Price
  • Min.Order
  • Supply Ability
  • Supplier
  • Contact Supplier

49778-01-0 Usage

Uses

Imino-tris(dimethylamino)phosphorane is a base that can be used:As a reagent in the deboronation of ortho and meta carboranes.As an organocatalyst in the synthesis of cyclic organic carbonates using glycerol under solvent-free conditions.

Check Digit Verification of cas no

The CAS Registry Mumber 49778-01-0 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 4,9,7,7 and 8 respectively; the second part has 2 digits, 0 and 1 respectively.
Calculate Digit Verification of CAS Registry Number 49778-01:
(7*4)+(6*9)+(5*7)+(4*7)+(3*8)+(2*0)+(1*1)=170
170 % 10 = 0
So 49778-01-0 is a valid CAS Registry Number.

49778-01-0 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
  • Price
  • Detail
  • Aldrich

  • (445274)  Imino-tris(dimethylamino)phosphorane  97%

  • 49778-01-0

  • 445274-1G

  • 973.44CNY

  • Detail

49778-01-0SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 18, 2017

Revision Date: Aug 18, 2017

1.Identification

1.1 GHS Product identifier

Product name N-[bis(dimethylamino)phosphinimyl]-N-methylmethanamine

1.2 Other means of identification

Product number -
Other names N,N,N',N',N",N"-Hexamethylphosphorimidic triamide

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:49778-01-0 SDS

49778-01-0Relevant articles and documents

First Evidence for a Curtius Type Rearrangement Involving a Charged Atom. An Easy Synthesis of an Iminophosphonium Salt

Mulliez, Michel,Majoral, Jean-Pierre,Bertrand, Guy

, p. 284 - 285 (1984)

Irradiation of azidophosphonium salts (Me2N)3P+N3,X- (1; X = PF6) and (4; X = Br) leads either to an iminophosphonium salt (Me2N)2P+=N-NMe2,PF6- (2) or to an iminophosphorane (Me2N)3P=NH (7) depending on the nature of the anion; these differences in the photochemical behaviour of (1) and (4) are rationalized by the transient existence of a phosphonitrenium salt (Me2N)3P=N+,X- (8).

PHOSPHAZENE COMPOUND, PREPARATION METHOD AND USE THEREOF

-

Paragraph 0102-0106, (2019/10/29)

Provided are a phosphazene compound, a method for preparing a phosphazene compound and a method for producing a polymer with a phosphazene compound as a catalyst. The compound of formula (I) or a solvate thereof, where A is a six- or eight-membered ring consisting of repeated ?P═N?, and B is at least one of unsubstituted or substituted C1-6 alkylamino, unsubstituted or substituted C1-6 cycloalkylamino, unsubstituted or substituted arylamino, or halogen, and B is attached to A at phosphorus in ?P═N?, where R is unsubstituted or substituted C1-6 alkyl, unsubstituted or substituted C1-6 cycloalkyl, unsubstituted or substituted aryl, or unsubstituted or substituted benzyl, or R forms C1-6 heterocycloalkyl together with N attached thereto.

Application to photoreactive materials of photochemical generation of superbases with high efficiency based on photodecarboxylation reactions

Arimitsu, Koji,Endo, Ryosuke

, p. 4461 - 4463 (2014/01/06)

A thin film of polystyrene containing 4c was spin-coated on a CaF2 plate and irradiated with 365 nm light. The absorption band arising from the carboxylate of 4c at 1372 cm-1 in the FTIR spectrum decreased after UV irradiation. Radical UV curing materials that are well established in the marketplace have drawbacks because of high volume shrinkage and oxygen inhibition. The anionically cured film showed high transparency and no volume shrinkage, in contrast to a conventional radical UV curing system, which showed large volume shrinkage. This is probably due to relatively low quantum yields for photobase generation and weaker basicity of photo-generated bases, leading to low photosensitivity of photoreactive materials sensitized with photobase generators. Furthermore, many of the photobase generators reported are generally prepared via several synthetic steps.

Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1

What can I do for you?
Get Best Price

Get Best Price for 49778-01-0