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56428-93-4

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56428-93-4 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 56428-93-4 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 5,6,4,2 and 8 respectively; the second part has 2 digits, 9 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 56428-93:
(7*5)+(6*6)+(5*4)+(4*2)+(3*8)+(2*9)+(1*3)=144
144 % 10 = 4
So 56428-93-4 is a valid CAS Registry Number.

56428-93-4Relevant articles and documents

Liquid-phase oxidation of pentamethyldisilane with oxygen [3]

Timokhin,Zaborovskii,Ferreri,Chatgilialoglu

, p. 469 - 469 (2007/10/03)

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The hydroxyl radical reaction rate constants and atmospheric reaction products of three siloxanes

Markgraf, Stewart J.,Wells

, p. 445 - 451 (2007/10/03)

The relative rate technique has been used to measure the hydroxyl radical (OH) reaction rate constant of hexamethyldisiloxane (MM, (CH3)3Si-O-Si(CH3)3), octamethyltrisiloxane (MDM, (CH3)3Si-O-Si(CH3)2-O-Si(CH 3)3), and decamethyltetrasiloxane (MD2M, (CH3)3Si-O-Si(CH3)2-O-Si(CH 3)2-O-Si(CH3)3). Hexamethyldisiloxane, octamethyltrisiloxane, and decamethyltetrasiloxane react with OH with bimolecular rate constants of 1.32 ± 0.05 × 10-12 cm3molecule-1s-1, 1.83 ± 0.09 × 10-12 cm3 molecule-1, and 2.66 ±0.13 × 10-12 cm3molecule-1s-1, respectively. Investigation of the OH + siloxane reaction products yielded trimethylsilanol, pentamethyldisiloxanol, heptamethyltetrasiloxanol, hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane, and other compounds. Several of these products have not been reported before because these siloxanes and the proposed reaction mechanisms yielding these products are complicated. Some unusual cyclic siloxane products were observed and their formation pathways are discussed in light of current understanding of siloxane atmospheric chemistry.

Reaction of O(3P) with Hexamethyldisilane

Hoffmeyer, H.,Potzinger, P.,Reimann, B.

, p. 4829 - 4831 (2007/10/02)

The title reaction has been investigated at room temperature in a discharge flow system and also by stationary Hg(3P1)-sensitized N2O photolysis experiments.By far the most important reaction is the insertion of O(3P) atoms into the Si-Si bond yielding a vibrationally excited hexamethyldisiloxane.The rate constant for this reaction has been measured to be (1.3 +/- 0.3) x 10-13 cm3 s-1.The vibrationally excited hexamethyldisiloxane could not be stabilized at pressures up to 1 bar, decomposing mainly by Si-C bond cleavage.A reaction mechanism is proposed to account for the observed products.

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