5943-21-5

Usage

Uses

Used in Corrosion Protection Industry:
1,10-Decyldiphosphonic acid is used as an anodic inhibitor for corrosion protection. Its application reason lies in its ability to self-assemble on metal surfaces, forming a protective layer that prevents the anodic reactions responsible for corrosion. This self-assembly property allows it to effectively inhibit the corrosion process, thereby extending the service life of metal structures and components in various industries, such as automotive, aerospace, and construction.

Upstream product

• 5943-62-4 tetraethyl decane-1,10-diyldiphosphonate 
• 4101-68-2 1,10-dibromodecane 
• 122-52-1 triethyl phosphite 

Relevant academic research and scientific papers

Rapid one-pot synthesis of alkane-α ω, diylbisphosphonic acids from dihalogenoalkanes under microwave irradiation

A one-pot, two-step synthesis of alkylenebisphosphonic acids from dihalogenoalkanes was performed under microwave irradiation. The reaction is very rapid and convenient for the synthesis of small samples of alkylenebisphosphonic acids. Copyright Taylor & Francis Group, LLC.

Microwave michaelis-becker synthesis of diethyl phosphonates, tetraethyl diphosphonates, and their total or partial dealkylation

Diethyl phosphonates and tetraethyl alkyldiphosphonates were efficiently and rapidly prepared via the Michaelis-Becker reaction, under microwave irradiation. These compounds were then hydrolyzed to phosphonic and diphosphonic acids or selectively monodealkylated to give monoesters of phosphonic acids and symmetrical diethyl esters of diphosphonic acids. These reactions were also achieved rapidly in satisfactory yields with microwave methodology. This methodology was applied with success to the functionalization of a polymer resin.

ADSORPTION OF ORDERED ZIRCONIUM PHOSPHONATE MULTILAYER FILMS ON SILICON AND GOLD SURFACES.

Multilayer films of zirconium 1,10-decanediylbis(phosphonate) have been prepared on silicon and gold substrates and characterized by ellipsometry, XPS, and electrochemical measurements. The deposition technique requires first covalent attachment or adsorption of a phosphonic acid anchoring agent. The functionalized substrates are exposed alternately to aqueous ZrOCl//2 and 1,10-decanediylbis(phosphonic acid) solutions to yield multilayer films. Ellipsometry shows an increase in film thickness, on Si, of 17 Angstrom/layer, which corresponds to the layer spacing in bulk Zr(O//3PC//1//0H//2//0PO//3). Variable take-off angle X-ray photoelectron spectra from four-layer films have attenuated Si peaks but strong Zr and P peaks when the detector is 70 degree off the surface normal, implying that the films on Si are continuous.