6876-42-2Relevant articles and documents
THE GAS PHASE MOLECULAR STRUCTURE OF SILYL FORMATE, DETERMINED BY ELECTRON DIFFRACTION
Bett, W.,Cradock, S.,Rankin, D. W. H.
, p. 159 - 164 (1980)
The structure of silyl formate, HCOOSiH3, in the gas phase is determined by electron diffraction.The principal bond lengths and angles (ra) are r(Si-O) = 169.5 +/- 0.3 pm, r(C-O) = 131.5 +/- 0.6 pm, r(C=O) = 120.9 +/- 0.7 pm, (C-O-Si) angle = 116.8 +/- 0.5 deg, (O=C-O) angle = 123.5 +/- 0.5 deg.The silyl group is twisted by 21 deg away from the planar cis conformation but there is nevertheless a very short (286.5 +/- 1.0 pm) non-bonded Si...O contact.
Diformatosilane: Preparation, Characterisation, and Molecular Structure in the Gas Phase by Electron Diffraction
Anderson, David G.,Cradock, Stephen
, p. 113 - 118 (2007/10/02)
The first bis-ester derivative of silane, SiH2(OCHO)2, has been prepared and characterised by a variety of spectroscopic techniques and by electron diffraction in the gas phase.The electron-diffraction investigation shows it to have an asymmetric conformation, one formate group apparently being close to the cis arrangement abbout its SiO bond, the other close to trans.The two formate groups are, however equivalent on the n.m.r. time-scale.