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Benzoic acid, 2-[(trimethylsilyl)methyl]- is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

71435-93-3

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71435-93-3 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 71435-93-3 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 7,1,4,3 and 5 respectively; the second part has 2 digits, 9 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 71435-93:
(7*7)+(6*1)+(5*4)+(4*3)+(3*5)+(2*9)+(1*3)=123
123 % 10 = 3
So 71435-93-3 is a valid CAS Registry Number.

71435-93-3SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 19, 2017

Revision Date: Aug 19, 2017

1.Identification

1.1 GHS Product identifier

Product name o-[(trimethylsilyl)methyl]benzoic acid

1.2 Other means of identification

Product number -
Other names 2-(Trimethylsilyl-methyl)-benzoesaeure

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:71435-93-3 SDS

71435-93-3Relevant academic research and scientific papers

Addition of N-Heterocyclic Carbene Catalyst to Aryl Esters Induces Remote C-Si Bond Activation and Benzylic Carbon Functionalization

Wang, Hongling,Chen, Xingkuan,Li, Yongjia,Wang, Jilan,Wu, Shuquan,Xue, Wei,Yang, Song,Chi, Yonggui Robin

supporting information, p. 333 - 336 (2018/01/28)

Through the incorporation of a silicon atom to an aryl carboxylic ester substrate, the resulting C-Si bond can be activated via the addition of a carbene catalyst on a remote site. This strategy allows for efficient functionalization of the benzylic sp3-carbons of aryl carboxylic esters.

Synthesis and application of benzyl-TMS derivatives as bench stable benzyl anion equivalents

Das, Manas,O'Shea, Donal F.

, p. 6448 - 6460 (2013/07/26)

The regioselective benzylic metalation of toluenes using BuLi/KO tBu/TMP(H) (LiNK metalation conditions) and subsequent transmetalation to Si by reaction with TMSCl provides a general one-pot procedure for the synthesis of substituted benzyltrimethylsilanes. ArCH 2Si(Me)3 derivatives are bench stable reagents yet can serve as benzyl anion equivalents under mild reaction conditions. Following activation with fluoride they can successfully participate in a wide range of additions to both non-enolizable and enolizable carbonyls. In addition, their use in the synthesis of isochromanones and trifluoromethylated amines is illustrated. The broad synthetic scope and mild practical conditions of use for ArCH2Si(Me)3 reagents demonstrate their general potential as benzyl anion equivalents.

THE PHOTOCHEMISTRY OF o-ACETOPHENONE

Bergmark, William R.,Meador, Michael,Isaacs, James,Thiim, Michael

, p. 1109 - 1111 (2007/10/02)

The title compound was prepared and irradiated under a variety of conditions to produce no change.Irradiation id DMSO-d6 and methanol-d4 results in D incorporation into the o-(trimethylsilyl)methyl group.Irradiation in 2-propanol results in photoreduction (φ=0.012) which could be quenched with dienes (kqτ=4.5).These results are taken to suggest a rapid, efficient, and reversible H-transfer with no detectable silyl transfer.

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