7359-15-1Relevant articles and documents
COMPOSITION AND METHOD FOR MANUFACTURING DEVICE USING SAME
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Paragraph 0295, (2020/02/27)
An onium salt and a composition having high sensitivity and excellent pattern characteristics such as LWR, which is preferably used for a resist composition for a lithography process using two active energy rays of a first active energy ray such as an electron beam or an extreme ultraviolet and a second active energy ray such as UV.