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2,4-dimethoxy-4'-fluorobenzophenone is an organic compound with the molecular formula C15H13FO3. It is a derivative of benzophenone, featuring two methoxy groups (-OCH3) at the 2 and 4 positions, and a fluorine atom (-F) at the 4' position of the benzene ring. This chemical is characterized by its aromatic structure, with a central carbonyl group (C=O) connecting two phenyl rings. It is a colorless to pale yellow solid and is soluble in organic solvents. 2,4-dimethoxy-4'-fluorobenzophenone has potential applications in the synthesis of pharmaceuticals, agrochemicals, and other specialty chemicals due to its unique structure and reactivity.

7359-15-1

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7359-15-1 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 7359-15-1 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 7,3,5 and 9 respectively; the second part has 2 digits, 1 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 7359-15:
(6*7)+(5*3)+(4*5)+(3*9)+(2*1)+(1*5)=111
111 % 10 = 1
So 7359-15-1 is a valid CAS Registry Number.

7359-15-1SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name (2,4-Dimethoxy-phenyl)-(4-fluoro-phenyl)methanone

1.2 Other means of identification

Product number -
Other names -

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:7359-15-1 SDS

7359-15-1Relevant academic research and scientific papers

COMPOSITION AND METHOD FOR MANUFACTURING DEVICE USING SAME

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Paragraph 0295, (2020/02/27)

An onium salt and a composition having high sensitivity and excellent pattern characteristics such as LWR, which is preferably used for a resist composition for a lithography process using two active energy rays of a first active energy ray such as an electron beam or an extreme ultraviolet and a second active energy ray such as UV.

BENZOFURAN AND BENZOTHIOPHENE-2-CARBOXYLIC ACID AMIDE DERIVATIVES

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Page/Page column 26, (2009/02/11)

The present invention relates to compounds of formula I wherein X, A and R1 to R4 are as defined in the description and claims, and pharmaceutically acceptable salts thereof. The compounds are useful for the treatment and/or prevention of diseases which are associated with the modulation of H3 receptors.

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