76392-13-7Relevant academic research and scientific papers
Diester acid protection structure monomer and preparation method thereof
-
Paragraph 0076; 0083; 0086; 0093, (2020/01/03)
The invention relates to the field of optical materials and in particular to a diester acid protection structure monomer and a preparation method thereof. The diester acid protection structure monomeris used as a raw material of a photoresist required in integrated circuit manufacturing. Due to a diester long side chain, the photoresist has a better film-forming property; due to the fact that small-size and high-acid-sensitivity groups hung outside can improve the deprotection reaction efficiency in the photoetching process, the quality of a photoetched product is improved; and in addition, the diester acid protection structure monomer prepared through the process method has high yield and purity, and the performance of the photoresist is further guaranteed.
METHOD FOR THE CONTINUOUS PRODUCTION OF UNSATURATED CARBOXYLIC ACID ANHYDRIDES
-
Page/Page column 3, (2009/10/30)
Process for continuously preparing unsaturated carboxylic anhydrides of the general formula I [in-line-formulae]R—C(O)—O—C(O)—R??(I)[/in-line-formulae] in which R is an unsaturated organic radical having 2 to 12 carbon atoms by transanhydridization of an aliphatic carboxylic anhydride with a carboxylic acid of the general formula II [in-line-formulae]R—COOH??(II)[/in-line-formulae] in which R is as defined above in a rectification column having an upper, middle and lower region, characterized in that f) an inert boiling oil is initially charged in the bottom of the column,g) the reactants are fed into a reaction region in stoichiometric ratios,h) the carboxylic acid formed as the by-product is withdrawn at the top of the column,i) the unconverted reactants are recycled into the reaction region andj) the product of the formula I is obtained via a side draw, preferably between the middle and lower column region.
