78385-26-9

Basic information

• Product Name: 3-BROMOMETHYL-3-METHYLOXETANE
• Synonyms: BUTTPARK 89\10-22;3-BROMOMETHYL-3-METHYLOXETANE;Oxetane, 3-(bromomethyl)-3-methyl- (9CI);3-methyl-3-bromomethyloxetane;3-Bromomethyl-3-methyloxe...;3-BroMoMethyl-3-Methyloxetane Oxetane, 3-(broMoMethyl)-3-Methyl-;Oxetane, 3-(broMoMethyl)-3-Methyl-
• CAS NO: 78385-26-9
• Molecular Formula: C₅H₉BrO
• Molecular Weight: 165.03
• Product Categories: HALOMETYL
• Mol File: 78385-26-9.mol
• Article Data: 12

Chemical Properties

• Boiling Point: 162℃
• Flash Point: 62℃
• Appearance: /
• Density: 1.438
• Vapor Pressure: 2.89mmHg at 25°C
• Refractive Index: 1.4800 to 1.4840
• Storage Temp.: under inert gas (nitrogen or Argon) at 2-8°C
• Stability: No Data Availableg
• CAS DataBase Reference: 3-BROMOMETHYL-3-METHYLOXETANE(CAS DataBase Reference)
• NIST Chemistry Reference: 3-BROMOMETHYL-3-METHYLOXETANE(78385-26-9)
• EPA Substance Registry System: 3-BROMOMETHYL-3-METHYLOXETANE(78385-26-9)

Safety Data

• Hazard Codes: Xn
• Statements: 22
• Hazardous Substances Data: 78385-26-9(Hazardous Substances Data)

Usage

Uses

3-(Bromomethyl)-3-methyloxetane is a monomer for the synthesis of Poly 3-bromomethyl-3-Me oxetane (PolyBrMMO), an energetic thermoplastic elastomer for propellant formulations.

InChI:InChI=1/C5H9BrO/c1-5(2-6)3-7-4-5/h2-4H2,1H3

Upstream product

• 3143-02-0 3-hydroxymethyl-3-methyloxethane 
• 558-13-4 carbon tetrabromide 
• 603-35-0 triphenylphosphine 
• 77-85-0 2-(hydroxymethyl)-2-methylpropane-1,3-diol 
• 99314-44-0 (3-methyloxetan-3-yl)methyl 4-methylbenzenesulfonate 

Downstream Products

• 206191-46-0 (2S,3R)-2-Benzyloxycarbonylamino-3-hydroxy-butyric acid 3-methyl-oxetan-3-ylmethyl ester 
• 150672-50-7 (2S,3R)-2-(9H-Fluoren-9-ylmethoxycarbonylamino)-3-hydroxy-butyric acid 3-methyl-oxetan-3-ylmethyl ester 
• 148150-67-8 N-(9-fluorenylmethyloxycarbonyl)-L-serine 3-methyl-3-(hydroxymethyl)oxetane ester 
• 329041-34-1 (2R,3S)-2-Benzyloxycarbonylamino-3-hydroxy-butyric acid 3-methyl-oxetan-3-ylmethyl ester 
• 613264-80-5 (S)-2-Benzyloxycarbonylamino-succinic acid 1-benzyl ester 4-(3-methyl-oxetan-3-ylmethyl) ester 
• 78385-27-0 2,9-bis(methoxymethyl)-2,9-dimethyl-4,7-dioxadecane-1,10-diol 
• 1258452-60-6 4-bromo-1-((3-methyloxetan-3-yl)methyl)-1H-pyrazole 
• 449177-94-0 3-[(2,2,3,3,3-pentafluoropropoxy)methyl]-3-methyloxetane 

Relevant articles and documents

OXYSTEROLS AND METHODS OF USE THEREOF

Compounds are provided according to Formula (A): and pharmaceutically acceptable salts thereof, and pharmaceutical compositions thereof; wherein R1, R2, R3, R4, R5, R6, and RG are as defined herein. Compounds of the present invention are contemplated useful for the prevention and treatment of a variety of conditions.

Synthesis and characterization of environmentally benign, semifluorinated polymers and their applications in drug delivery

We describe the synthesis, physicochemical studies and pharmaceutical assessment of a class of pegylated semifluorinated amphiphilic block-copolymers based on short pendant fluorinated side chains attached to moderately hydrophobic units. These polymers allowed us to investigate how the balance between hydrophobicity and fluorophilicity in the polymer can be tuned to match that of small molecules to be used in drug delivery. Remarkably, we found that using short perfluoroethyl groups in the polymer allows the preferential stabilization of nanoemulsions based on isoflurane, a fluorinated anesthetic made partly hydrophobic by the presence of a chlorine atom. In comparison, nanoemulsions of sevoflurane, a purely fluorophilic anesthetic, were not as stable. The lipophilicity of the polymers was also investigated in regards to solvation of hydrophobic molecules. Surface properties such as critical micelle concentration (CMC) and surface tension demonstrated the uniqueness of these fluorinated amphiphiles. Finally, the use of short perfluoroethyl chains makes these polymers environmentally benign in terms of bioaccumulation and toxicity.

Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound

An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization products of the oxetane-containing compound.