81416-37-7

Basic information

• Product Name: (4-METHYLPHENYL)DIPHENYL SULFONIUM TRIFLUOROMETHANESULFONATE
• Synonyms: (4-METHYLPHENYL)DIPHENYLSULFONIUM TRIFLATE;(4-METHYLPHENYL)DIPHENYL SULFONIUM TRIFLUOROMETHANESULFONATE;DIPHENYL(4-METHYLPHENYL)SULFONIUM TRIFLATE;DIPHENYL-4-METHYLPHENYLSULFONIUM TRIFLUOROMETHANESULFONATE;DIPHENYL(4-METHYLPHENYL)SULPHONIUM TRIFLATE;(4-METHYLPHENYL)DIPHENYLSULFONIUM TRIFLA
• CAS NO: 81416-37-7
• Molecular Formula: CF₃O₃S*C₁₉H₁₇S
• Molecular Weight: 426.47
• Mol File: 81416-37-7.mol
• Article Data: 8

Chemical Properties

• Melting Point: 98-102 °C(lit.)
• Appearance: White crystals
• Density: 1.27g/cm³
• Refractive Index: 1.547
• CAS DataBase Reference: (4-METHYLPHENYL)DIPHENYL SULFONIUM TRIFLUOROMETHANESULFONATE(CAS DataBase Reference)
• NIST Chemistry Reference: (4-METHYLPHENYL)DIPHENYL SULFONIUM TRIFLUOROMETHANESULFONATE(81416-37-7)
• EPA Substance Registry System: (4-METHYLPHENYL)DIPHENYL SULFONIUM TRIFLUOROMETHANESULFONATE(81416-37-7)

Safety Data

• Hazard Codes: Xi,C
• Statements: 36/37/38
• Safety Statements: 26-36
• WGK Germany: 3
• Hazardous Substances Data: 81416-37-7(Hazardous Substances Data)

Usage

General Description

(4-Methylphenyl)diphenyl sulfonium trifluoromethanesulfonate is a chemical compound commonly used in organic synthesis and as a photoinitiator for polymerization reactions. It is a stable and crystalline salt that is soluble in organic solvents, making it useful for various applications in the field of chemistry. (4-METHYLPHENYL)DIPHENYL SULFONIUM TRIFLUOROMETHANESULFONATE is known for its ability to initiate radical reactions under mild conditions and is often used in the production of polymers, coatings, and adhesives. It is also widely used in the electronics industry for photolithography processes and as a crosslinking agent for polymer materials. Overall, (4-Methylphenyl)diphenyl sulfonium trifluoromethanesulfonate plays a crucial role in various chemical and industrial processes due to its unique photoinitiation properties.

InChI:InChI=1/C20H17F3O3S2/c1-16-12-14-19(15-13-16)27(17-8-4-2-5-9-17,18-10-6-3-7-11-18)26-28(24,25)20(21,22)23/h2-15H,1H3

Upstream product

• 945-51-7 1,1'-sulfinylbisbenzene 
• 358-23-6 trifluoromethylsulfonic anhydride 
• 108-88-3 toluene 
• 3699-01-2 4-tolyl phenyl sulfide 
• 66003-76-7 Diphenyliodonium triflate 
• 27607-77-8 trimethylsilyl trifluoromethanesulfonate 
• 4294-57-9 para-methylphenylmagnesium bromide 
• 1493-13-6 trifluorormethanesulfonic acid 

Downstream Products

• 64806-63-9 3-phenoxypropylbenzene 
• 3857-04-3 [18F]fluorobenzene 
• 1225185-87-4 3-fluorobenzoic acid 2,2-difluoro-2-sulfoethyl ester diphenyl(4-methylphenyl)sulfonium salt 
• 1225185-84-1 benzoic acid 2,2-difluoro-2-sulfoethyl ester diphenyl(4-methylphenyl)sulfonium salt 
• 1187544-53-1 (adamantane-1yl)acetic acid 2,2-difluoro-2-sulfoethyl ester diphenyl(4-methylphenyl)sulfonium salt 
• 1187544-50-8 bicyclo[2.2.1]heptane-2-acetic acid 2,2-difluoro-2-sulfoethyl ester diphenyl(4-methylphenyl)sulfonium salt 
• 1187544-47-3 cyclohexylacetic acid 2,2-difluoro-2-sulfoethyl ester diphenyl(4-methylphenyl)sulfonium salt 
• 1187544-41-7 bicyclo[2.2.1]heptane-2-carboxylic acid 2,2-difluoro-2-sulfoethyl ester diphenyl(4-methylphenyl)sulfonium salt 
• 1187544-38-2 cyclohexanecarboxylic acid 2,2-difluoro-2-sulfoethyl ester diphenyl(4-methylphenyl)sulfonium salt 
• 1186620-71-2 adamantane-1-carboxylic acid 2,2-difluoro-2-sulfoethyl ester diphenyl(4-methylphenyl)sulfonium salt 

Relevant articles and documents

Synthesis of triphenylsulfonium triflate bound copolymer for electron beam lithography

Photoacid generator (PAG) has been widely used as a key component in photoresist for highresolution patterning with high sensitivity. A novel acrylic monomer, triphenylsulfonium salt methyl methacrylate (TPSMA), was synthesized and includes triphenylsulfonium triflate as a PAG. The poly(MMA-co-TPSMA) (PMT) as a polymer-bound PAG was synthesized with methyl methacrylate (MMA) and TPSMA for electron beam lithography. Characterization of PMT was carried out by NMR and FTIR. The molecular weight was analyzed by GPC. Thermal properties were studied using TGA and DSC. Thecharacterization results were in good agreement with corresponding chemical compositions and thermal stability. PMT was subsequently employed in electron beam lithography and its lithographic performance was confirmed by FE-SEM. This PMT was accomplished to improve the lithographic performance including sensitivity, line width roughness (LWR) and resolution. We found that PMT was capable of 20 nm negative tone patterns with better sensitivity than hydrogensilsesquioxane (HSQ) which is a conventional negative tone resist. Copyright

Sonogashira reaction using arylsulfonium salts as cross-coupling partners

Triarylsulfonium, alkyl- and fluoroalkyl(diaryl)-sulfonium, and aryl(dialkyl)sulfonium triflates are successfully used as a new family of cross-coupling participants in the Sonogashira reaction as aryldiazonium, diaryliodonium, and tetraphenylphosphonium salts. It was found that terminal alkynes reacted mildly with triarylsulfonium or (2,2,2-trifluoroethyl)diphenylsulfonium triflate at room temperature under Pdand Cu-cocatalysis to give the corresponding arylalkynes in up to >99% yield. This protocol represents the first use of arylsulfonium salts as cross-coupling partners in the Pd/Cu-catalyzed Sonogashira reaction.

Sulfonium salt and its manufacturing method

This invention relates to a sulfonium salt, including its manufacturing method, which is effectively used as a photoacid initiator or radical photoinitiator during polymerization and a photoacid generator, leaving the protection groups of organic compound