86241-19-2

Basic information

• Product Name: [BIS-(2-HYDROXY-ETHYL)-AMINO]-ACETONITRILE
• Synonyms: [BIS-(2-HYDROXY-ETHYL)-AMINO]-ACETONITRILE
• CAS NO: 86241-19-2
• Molecular Formula: C₆H₁₂N₂O₂
• Molecular Weight: 144.17168
• Mol File: 86241-19-2.mol
• Article Data: 5

Chemical Properties

• Appearance: /
• CAS DataBase Reference: [BIS-(2-HYDROXY-ETHYL)-AMINO]-ACETONITRILE(CAS DataBase Reference)
• NIST Chemistry Reference: [BIS-(2-HYDROXY-ETHYL)-AMINO]-ACETONITRILE(86241-19-2)
• EPA Substance Registry System: [BIS-(2-HYDROXY-ETHYL)-AMINO]-ACETONITRILE(86241-19-2)

Safety Data

• Hazardous Substances Data: 86241-19-2(Hazardous Substances Data)

Usage

General Description

[BIS-(2-HYDROXY-ETHYL)-AMINO]-ACETONITRILE is a chemical compound with the molecular formula C6H11N3O2. It is a derivative of acetonitrile with two hydroxyethylamine groups attached to the nitrogen atom. [BIS-(2-HYDROXY-ETHYL)-AMINO]-ACETONITRILE is commonly used in organic synthesis, particularly as a reagent in the preparation of pharmaceuticals and other organic compounds. It has also been studied for its potential as a chelating agent in coordination chemistry.[BIS-(2-HYDROXY-ETHYL)-AMINO]-ACETONITRILE is classified as a flammable liquid and should be handled with care in a laboratory setting. Overall, it is a versatile chemical with various applications in the field of organic chemistry and pharmaceutical research.

Upstream product

• 107-14-2 chloroacetonitrile 
• 111-42-2 2,2'-iminobis[ethanol] 
• 590-17-0 cyanomethyl bromide 
• 20073-50-1 2-(oxazolidin-3-yl)ethanol 
• 74-90-8 hydrogen cyanide 

Downstream Products

• 3197-06-6 N,N-bis(2-hydroxyethyl)ethylidenediamine 

Relevant articles and documents

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.

Amine compounds, resist compositions and patterning process

Amine compounds having a cyano group are useful in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.

Intermediates for the production of diethanolamine

A method of producing diethanolamine derivatives or acid salts thereof according to the reaction scheme: STR1 wherein X stands for a leaving group; and R1 stands for an alkylcarbamoyl group, which provides an industrially advantageous method of preparing the subject matter useful as an antiarrhythmic agent.