941228-02-0Relevant articles and documents
Chemical surface modification via radical C-C bond-forming reactions
Siegenthaler, Kai Oliver,Schaefer, Andreas,Studer, Armido
, p. 5826 - 5827 (2008/02/06)
Radical C-C bond-forming reactions at self-assembled monolayers (SAMs) can be used for the modification of alkene terminated Si wafers under neutral conditions. Many functional groups are tolerated under radical conditions and biologically interesting mol