963-96-2

Basic information

• Product Name: 2,6-Dimethoxy-9,10-anthraquinone
• Synonyms: 2,6-Dimethoxy-9,10-anthraquinone;2,6-Dimethoxyanthraquinone
• CAS NO: 963-96-2
• Molecular Formula: C₁₆H₁₂O₄
• Molecular Weight: 268.26
• Mol File: 963-96-2.mol
• Article Data: 4

Chemical Properties

• Appearance: /
• CAS DataBase Reference: 2,6-Dimethoxy-9,10-anthraquinone(CAS DataBase Reference)
• NIST Chemistry Reference: 2,6-Dimethoxy-9,10-anthraquinone(963-96-2)
• EPA Substance Registry System: 2,6-Dimethoxy-9,10-anthraquinone(963-96-2)

Safety Data

• Hazardous Substances Data: 963-96-2(Hazardous Substances Data)

Usage

Chemical group

Derived from anthraquinone

Physical state

Bright orange solid at room temperature

Uses

Dye intermediate in production of pigments and colorants, synthesis of pharmaceuticals and inks

Molecular weight

268.26 g/mol

Known for

Strong color intensity, used as coloring agent in various industrial applications

Upstream product

• 76250-90-3 2-(3-Methoxybenzoyl)-5-methoxybenzoic Acid 
• 84-60-6 anthraflavic acid 
• 84-65-1 9,10-phenanthrenequinone 
• 1644110-95-1 2-(4-methoxyphenyl)-2-(3-methoxyphenyl)acetic acid 
• 140-88-5 ethyl acrylate 
• 1604-40-6 2,6-dinitro-anthraquinone 
• 74-88-4 methyl iodide 
• 67-56-1 methanol 

Downstream Products

• 860530-91-2 2,6-dimethoxy-9,10-diphenyl-9,10-dihydro-anthracene-9,10-diol 
• 36319-03-6 2,6-dimethoxyanthracene 

Relevant articles and documents

COMPOUND FOR HARD MASK, HARD MASK COMPOSITION COMPRISING SAID COMPOUND, AND METHOD FOR FORMING SEMICONDUCTOR ELEMENT FINE PATTERN USING SAID COMPOUND

The present invention relates to a compound for a hard mask, a hard mask composition comprising the same, and a method for forming a fine pattern of a semiconductor element using the same. The compound for a hard mask according to the present invention has high solvent solubility that can be applied to a spin coating method, and thus it is possible to prepare a hard mask composition that not onlyhas excellent gap filling performance, but also has excellent heat resistance and etching resistance after curing. In addition, it is possible to provide a fine pattern forming method of a semiconductor element using the same.

Anthracene derivatives

An anthracene derivative having at least two groups of the formula: STR1 wherein R1 and R2 are independently hydrogen, alkyl, alkoxy, etc., is particular effective for forming an antireflection coating for preventing multiple reflection of exposing light from a highly reflective substrate, etc.