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(4-METHYLPHENYL)DIPHENYL SULFONIUM TRIFLUOROMETHANESULFONATE is a stable and crystalline chemical compound that is soluble in organic solvents. It is commonly used in organic synthesis and as a photoinitiator for polymerization reactions. Its unique photoinitiation properties make it useful for various applications in the field of chemistry.

81416-37-7

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81416-37-7 Usage

Uses

Used in Organic Synthesis:
(4-METHYLPHENYL)DIPHENYL SULFONIUM TRIFLUOROMETHANESULFONATE is used as a reagent in organic synthesis for its ability to initiate radical reactions under mild conditions.
Used in Polymer Production:
(4-METHYLPHENYL)DIPHENYL SULFONIUM TRIFLUOROMETHANESULFONATE is used as a photoinitiator in the production of polymers, coatings, and adhesives, enabling the formation of these materials through polymerization reactions.
Used in Electronics Industry:
(4-METHYLPHENYL)DIPHENYL SULFONIUM TRIFLUOROMETHANESULFONATE is used in the electronics industry for photolithography processes, where its photoinitiation properties are crucial for the patterning of semiconductor materials.
Used as a Crosslinking Agent:
(4-METHYLPHENYL)DIPHENYL SULFONIUM TRIFLUOROMETHANESULFONATE is used as a crosslinking agent for polymer materials, enhancing their stability and performance in various applications.

Check Digit Verification of cas no

The CAS Registry Mumber 81416-37-7 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 8,1,4,1 and 6 respectively; the second part has 2 digits, 3 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 81416-37:
(7*8)+(6*1)+(5*4)+(4*1)+(3*6)+(2*3)+(1*7)=117
117 % 10 = 7
So 81416-37-7 is a valid CAS Registry Number.
InChI:InChI=1/C20H17F3O3S2/c1-16-12-14-19(15-13-16)27(17-8-4-2-5-9-17,18-10-6-3-7-11-18)26-28(24,25)20(21,22)23/h2-15H,1H3

81416-37-7SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 18, 2017

Revision Date: Aug 18, 2017

1.Identification

1.1 GHS Product identifier

Product name (4-methylphenyl)-diphenylsulfanium,trifluoromethanesulfonate

1.2 Other means of identification

Product number -
Other names p-tolyldiphenylsulfonium trifluoromethanesulfonate

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:81416-37-7 SDS

81416-37-7Relevant articles and documents

Synthesis of triphenylsulfonium triflate bound copolymer for electron beam lithography

Kwon, Ojung,Sagar, Ashok D.,Kang, Ha Na,Kim, Hyun-Mi,Kim, Ki-Bum,Lee, Haiwon

, p. 6270 - 6273 (2014)

Photoacid generator (PAG) has been widely used as a key component in photoresist for highresolution patterning with high sensitivity. A novel acrylic monomer, triphenylsulfonium salt methyl methacrylate (TPSMA), was synthesized and includes triphenylsulfonium triflate as a PAG. The poly(MMA-co-TPSMA) (PMT) as a polymer-bound PAG was synthesized with methyl methacrylate (MMA) and TPSMA for electron beam lithography. Characterization of PMT was carried out by NMR and FTIR. The molecular weight was analyzed by GPC. Thermal properties were studied using TGA and DSC. Thecharacterization results were in good agreement with corresponding chemical compositions and thermal stability. PMT was subsequently employed in electron beam lithography and its lithographic performance was confirmed by FE-SEM. This PMT was accomplished to improve the lithographic performance including sensitivity, line width roughness (LWR) and resolution. We found that PMT was capable of 20 nm negative tone patterns with better sensitivity than hydrogensilsesquioxane (HSQ) which is a conventional negative tone resist. Copyright

Para-selective borylation of monosubstituted benzenes using a transient mediator

Wu, Jie,Wang, Zengwei,Chen, Xiao-Yue,Wu, Yichen,Wang, Daoming,Peng, Qian,Wang, Peng

, p. 336 - 340 (2019/12/09)

Herein, we conceptualized a transient mediator approach that has the capability of para-selective C-H functionalization of monosubstituted aromatics. This approach is enabled by in situ generation of a versatile sulfonium salt via highly electrophilic phenoxathiine or thianthrene dication intermediate which can be readily generated from its sulfoxide with trifluoromethanesulfonic anhydride. Preliminary mechanistic study implied that the remarkable para selectivity might be related to the incredible electrophilicity of thianthrene dication intermediate. The versatility of this approach was demonstrated via para-borylation of various monosubstituted simple aromatics combining the sulfonium salt formation with further photocatalyzed transformation.

Sonogashira reaction using arylsulfonium salts as cross-coupling partners

Tian, Ze-Yu,Wang, Shi-Meng,Jia, Su-Jiao,Song, Hai-Xia,Zhang, Cheng-Pan

supporting information, p. 5454 - 5457 (2017/11/06)

Triarylsulfonium, alkyl- and fluoroalkyl(diaryl)-sulfonium, and aryl(dialkyl)sulfonium triflates are successfully used as a new family of cross-coupling participants in the Sonogashira reaction as aryldiazonium, diaryliodonium, and tetraphenylphosphonium salts. It was found that terminal alkynes reacted mildly with triarylsulfonium or (2,2,2-trifluoroethyl)diphenylsulfonium triflate at room temperature under Pdand Cu-cocatalysis to give the corresponding arylalkynes in up to >99% yield. This protocol represents the first use of arylsulfonium salts as cross-coupling partners in the Pd/Cu-catalyzed Sonogashira reaction.

Chemical amplification type positive resist compositions and sulfonium salts

-

, (2008/06/13)

A chemical amplifying type positive resist composition having high transmittance, superior in sensitivity and resolution in a lithography utilizing a light having a wavelength of 220 nm or lower and confering a good profile is provided, Which comprisesan

Sulfonium salt and its manufacturing method

-

, (2008/06/13)

This invention relates to a sulfonium salt, including its manufacturing method, which is effectively used as a photoacid initiator or radical photoinitiator during polymerization and a photoacid generator, leaving the protection groups of organic compound

Sulfonium salt and its manufacturing method

-

, (2008/06/13)

This invention relates to a sulfonium salt, including its manufacturing method, which is effectively used as a photoacid initiator or radical photoinitiator during polymerization and a photoacid generator, leaving the protection groups of organic compound

REACTION OF BENZENE WITH DIPHENYL SULFOXIDES

Endo, Yasuyuki,Shudo, Koichi,Okamoto, Toshihiko

, p. 3753 - 3755 (2007/10/02)

Diphenyl sulfoxide reacted with benzenes in the presence of trifluoroacetic anhydride and trifluoromethanesulfonic acid to yield triphenylsulfonium ions in good yields.A new electrophilic spacies was proposed. - Keywords: electrophilic aromatic substituti

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