Detail of "3188-13-4"

Reference

Polyhydric phenols, their derivatives bearing acid-labile protective groups, positive-working radiation-sensitive resists containing the derivatives, and resist pattern formation

All Rights Reserved. Polyhydric phenols, their derivatives bearing acid-labile protective groups, positive-working radiation-sensitive resists containing the derivatives, and resist pattern formation. Shiono, Hirotoshi; Hirayama, Hiroshi; Haneda, Hideo (Tokyo Ohka Kogyo Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 2007031402 A 8 Feb 2007, 37pp. (Japanese).In this article, certain chemicals are used. One of their cas registry numbers is 106743-89-9 (Japan). CODEN: JKXXAF. APPLICATION: JP 2005-220402 29 Jul 2005. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Section cross-reference(s): 25 The polyhydric phenols and derivs. are I (R11-R13 = C1-10 alkyl; R21-R23 = H; p, s = 1, 2; q, r = 1, 3; p + q + r ￡5; t = 0-3) and I (R21-R23 = H, acid-labile protective group; 31 of R21-R23 = acid-labile protective group; R11-R13, p-t = same as above), resp. The resists contain I (R21-R23 = H, acid-labile protective group; 31 of R21-R23 = acid-labile protective group; R11-R13, p-t = same as above) as components whose alkali soly. is increased by acid action, and radiation-sensitive acid generators. The resists are expected to produce patterns with low line edge roughness. .

Study of some chemical reactions of 1-(2,4-dichlorophenoxy)-3-(diethylamino)-2-propanol

Study of some chemical reactions of 1-(2,4-dichlorophenoxy)-3-(diethylamino)-2-propanol. Mamedov, Sh.; Ramazanov, A. A. (Inst. Neftekhim. Protsessov im. Mamedalieva, Baku, USSR). Deposited Doc. 100-44-7 and 3188-13-4 which are cas registry numbers are also used here., VINITI 901-74, 6 pp. Avail. BLLD (Russian) 1974. DOCUMENT TYPE: Report CA Section: 25 (Noncondensed Aromatic Compounds) 2,4-Dichlorophenyl glycidyl ether was prepd. from 2,4-Cl2C6H3OH and epichlorohydrin and cleaved with Et2NH in the presence of H2O to give 95.2% 2,4-Cl2C6H3OCH2CH(OR)CH2NEt2 (I; R = H). The latter reacted with R1OCH2Cl (R1 = Et, Pr, Me2CH, Bu, Me2CHCH2), PhCH2Cl, and CH2:CHCN to give 40-75.3% I (R = CH2OR1, CH2Ph, CH2CH2CN). .