24243-71-8

Basic information

• Product Name: PROPANE-1-SULFONAMIDE
• Synonyms: PROPANE-1-SULFONAMIDE;PROPANE-1-SULPHONAMIDE;1-Propanesulfonamide;Propane-1-sulphonamide 97%;1-(Sulphamoyl)propane;Propane-1-sulphonamide97%
• CAS NO: 24243-71-8
• Molecular Formula: C₃H₉NO₂S
• Molecular Weight: 123.17
• Mol File: 24243-71-8.mol

Chemical Properties

• Melting Point: 51-52
• Boiling Point: 226.7 °C at 760 mmHg
• Flash Point: 90.9 °C
• Appearance: /
• Density: 1.198 g/cm³
• Vapor Pressure: 0.0805mmHg at 25°C
• Refractive Index: 1.464
• Storage Temp.: Sealed in dry,Room Temperature
• Solubility: Chloroform (Slightly), DMSO (Slightly), Methanol (Slightly)
• PKA: 10.87±0.60(Predicted)
• CAS DataBase Reference: PROPANE-1-SULFONAMIDE(CAS DataBase Reference)
• NIST Chemistry Reference: PROPANE-1-SULFONAMIDE(24243-71-8)
• EPA Substance Registry System: PROPANE-1-SULFONAMIDE(24243-71-8)

Safety Data

• Hazard Codes: T
• Hazardous Substances Data: 24243-71-8(Hazardous Substances Data)

Usage

Uses

Used in Chemical Synthesis:
PROPANE-1-SULFONAMIDE is used as a synthetic building block for the preparation of different electron donors in luminogenic luciferins and fluorescent dyes. Its unique chemical structure allows it to be a valuable component in the development of these compounds, which have applications in various fields, including biochemistry, molecular biology, and medical diagnostics.
Used in Pharmaceutical Industry:
In the pharmaceutical industry, PROPANE-1-SULFONAMIDE is utilized as an intermediate in the synthesis of various drugs, particularly those with antimicrobial properties. Its ability to form strong hydrogen bonds makes it a promising candidate for the development of new drugs targeting specific biological pathways.
Used in Research and Development:
PROPANE-1-SULFONAMIDE is also used in research and development for the study of various chemical reactions and processes. Its unique properties make it an interesting compound for exploring new reaction mechanisms and developing novel synthetic methods.

InChI:InChI=1/C3H9NO2S/c1-2-3-7(4,5)6/h2-3H2,1H3,(H2,4,5,6)

Upstream product

• 10147-36-1 n-propanesulfonyl chloride 
• 1120-71-4 1,3-propanesultone 

Downstream Products

• 35578-28-0 3-chloro-propane-1-sulfonic acid amide 
• 76-19-7 freon-218 
• 76-16-4 Hexafluoroethane 
• 754-03-0 ethanesulfonyl fluoride 
• 423-40-5 1-perfluoropropanesulfonyl fluoride 
• 139668-86-3 N-(4-chlorophenyl)-N'-1-propanesulfonylurea 
• 1025765-13-2 C₂₂H₂₂FN₃O₃S 
• 855479-54-8 tert-butyl [3-[3'-(cyclohexyloxy)-4'-[[(propylsulfonyl)amino]carbonyl]-4-biphenylyl]propyl][(2R)-2-hydroxy-2-phenylethyl]carbamate 
• 1269421-39-7 N-(3-amino-2-cyano-4-fluorophenyl)propane-1-sulfonamide 
• 1269421-40-0 N-(3-amino-4-chloro-2-cyanophenyl)propane-1-sulfonamide 
• 1269421-41-1 N-(3-amino-2-cyanophenyl)propane-1-sulfonamide 
• 1304515-71-6 C₂₂H₂₉F₃N₄O₂S 
• 1391608-93-7 propane-1-sulfonic acid [2-(3-chloro-4-fluoro-phenyl)-4,4-dimethyl-1,2,3,4-tetrahydro-quinoline-6-carbonyl]-amide 
• 6655-25-0 N-phenylpropane-1-sulfonamide 

Relevant articles and documents

THIAZOLIDINONE COMPOUNDS AND USE THEREOF

A pharmaceutical composition containing a compound of Formula (I) for treating an opioid receptor-associated condition. Also disclosed is a method for treating an opioid receptor-associated condition using such a compound. Further disclosed are two sets of thiazolidinone compounds of formula (I): (i) compounds each having an enantiomeric excess greater than 90% and (ii) compounds each being substituted with deuterium.

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND

There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.

QUINOXALINE COMPOUNDS AND USE THEREOF

The present invention is related to quinoxaline compounds of Formula (I) in particular for the treatment of autoimmune disorders and/or inflammatory diseases, cardiovascular diseases, neurodegenerative diseases, bacterial or viral infections, kidney diseases, platelet aggregation, cancer, transplantation, graft rejection or lung injuries.

PYRAZINE DERIVATIVES AND USE AS PI3K INHIBITORS

The present invention is related to pyrazine derivatives of Formula (I) in particular for the treatment and/or prophylaxis of autoimmune disorders and/or inflammatory diseases, cardiovascular diseases, neurodegenerative diseases, bacterial or viral infections, kidney diseases, platelet aggregation, cancer, transplantation, graft rejection or lung injuries.

Analogs of isovaleramide, a pharmaceutical composition including the same, and a method of treating central nervous system conditions or diseases

An isovaleramide analog having at least one of an increased potency, an increased half-life, and an increased stability compared to isovaleramide. The isovaleramide analog is a cyclic analog or a noncyclic analog. The isovaleramide analog is formulated into a pharmaceutical composition. A method of treating a central nervous system condition or disease is also disclosed. The method comprises administering an isovaleramide analog to a patient suffering from the central nervous system condition or disease.

Die elektrochemische fluorierung von alkansulfonamiden und alkandisulfonamiden

Alkane sulphonylamides and disulphonylamides are stable in anhydrous (HF)x and undergo quantitative fission of S-N bonds during electrochemical fluorination. Besides NF3, the corresponding perfluoroalkane sulphonyl fluorides and disulphonyl fluorides are formed.

Lithium aluminum hydride-aluminum hydride reduction of sultones

Lithium aluminum hydride-aluminum hydride reduction of secondary and tertiary (C-O) substituted γ-sultones or α-alkyl-β'-hydroxy γ-sultones yields mercapto alcohols and mercapto diols, respectively, in fair to good yield.These products result from S-O cleavage of the sultone ring.Primary sultones and α-dialkyl-β'-hydroxy γ-sultones give predominantly C-O cleavage to form sulfonic acid derivatives. β-Sultones are much less reactive toward the mixed hydride, and refluxing in dioxane is required for their reduction.