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1,1,1-triethyl-3,3,3-trimethyldisiloxane, also known as TMDSO, is a colorless and volatile liquid characterized by a faint odor. It is recognized for its role as a precursor in the production of silicon dioxide thin films through chemical vapor deposition and as a cross-linking agent in the synthesis of silicone elastomers and resins. TMDSO is regarded as a relatively safe chemical with low acute toxicity and good environmental compatibility, although its flammability and potential for irritation necessitate careful handling and the use of appropriate safety measures.

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  • 2652-41-7 Structure
  • Basic information

    1. Product Name: 1,1,1-triethyl-3,3,3-trimethyldisiloxane
    2. Synonyms: 1,1,1-triethyl-3,3,3-trimethyldisiloxane;Triethyl(Trimethylsilyloxy)Silane
    3. CAS NO:2652-41-7
    4. Molecular Formula: C9H24OSi2
    5. Molecular Weight: 204.46
    6. EINECS: N/A
    7. Product Categories: N/A
    8. Mol File: 2652-41-7.mol
  • Chemical Properties

    1. Melting Point: N/A
    2. Boiling Point: 171-172°C
    3. Flash Point: N/A
    4. Appearance: /
    5. Density: N/A
    6. Refractive Index: 1.4108
    7. Storage Temp.: N/A
    8. Solubility: N/A
    9. CAS DataBase Reference: 1,1,1-triethyl-3,3,3-trimethyldisiloxane(CAS DataBase Reference)
    10. NIST Chemistry Reference: 1,1,1-triethyl-3,3,3-trimethyldisiloxane(2652-41-7)
    11. EPA Substance Registry System: 1,1,1-triethyl-3,3,3-trimethyldisiloxane(2652-41-7)
  • Safety Data

    1. Hazard Codes: N/A
    2. Statements: N/A
    3. Safety Statements: N/A
    4. WGK Germany:
    5. RTECS:
    6. HazardClass: N/A
    7. PackingGroup: N/A
    8. Hazardous Substances Data: 2652-41-7(Hazardous Substances Data)

2652-41-7 Usage

Uses

Used in Electronics Industry:
1,1,1-triethyl-3,3,3-trimethyldisiloxane is used as a precursor for the production of silicon dioxide thin films, which are essential in the manufacturing of semiconductor devices and other electronic components. Its application in chemical vapor deposition allows for the creation of high-quality thin films with precise control over thickness and uniformity, contributing to the performance and reliability of electronic devices.
Used in Polymer Industry:
In the polymer industry, 1,1,1-triethyl-3,3,3-trimethyldisiloxane serves as a cross-linking agent in the synthesis of silicone elastomers and resins. Its ability to form stable cross-links enhances the mechanical properties, thermal stability, and durability of the resulting silicone materials, making them suitable for a wide range of applications, including sealants, adhesives, and coatings.
Used in Chemical Synthesis:
1,1,1-triethyl-3,3,3-trimethyldisiloxane is also utilized as an intermediate in the synthesis of various organosilicon compounds, which find applications in different industries such as pharmaceuticals, agriculture, and personal care products. Its versatility as a chemical building block allows for the development of new materials with tailored properties to meet specific requirements.
Safety Considerations:
While 1,1,1-triethyl-3,3,3-trimethyldisiloxane is considered relatively safe, it is important to handle it with care due to its flammability and potential for irritation to the skin, eyes, and respiratory system. Proper ventilation and the use of personal protective equipment, such as gloves, goggles, and respirators, are recommended to minimize exposure and ensure the safety of workers during its use in various applications.

Check Digit Verification of cas no

The CAS Registry Mumber 2652-41-7 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 2,6,5 and 2 respectively; the second part has 2 digits, 4 and 1 respectively.
Calculate Digit Verification of CAS Registry Number 2652-41:
(6*2)+(5*6)+(4*5)+(3*2)+(2*4)+(1*1)=77
77 % 10 = 7
So 2652-41-7 is a valid CAS Registry Number.

2652-41-7SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 16, 2017

Revision Date: Aug 16, 2017

1.Identification

1.1 GHS Product identifier

Product name triethyl(trimethylsilyloxy)silane

1.2 Other means of identification

Product number -
Other names Trimethylsilyl-triaethylsilyl-aether

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:2652-41-7 SDS

2652-41-7Downstream Products

2652-41-7Relevant articles and documents

Novel Si(II)+and Ge(II)+Compounds as Efficient Catalysts in Organosilicon Chemistry: Siloxane Coupling Reaction ?

Fritz-Langhals, Elke,Kneissl, Sotirios,Piroutek, Phillip,Werge, Sven

, (2020/09/02)

Novel catalytically active cationic Si(II) and Ge(II) compounds were synthesized and isolated in pure form. The Ge(II)+-based compounds proved to be stable against air and moisture and therefore can be handled very easily. All compounds efficiently catalyze the oxidative coupling of hydrosil(ox)anes with aldehydes and ketones as oxidation reagents and simultaneously the reductive ether coupling at very low amounts of 0.01 mol %. Because the catalysts also catalyze the reversible cyclotrimerization of aldehydes, paraldehyde can be used as a convenient source for acetaldehyde in siloxane coupling. It is shown that the reaction is especially suitable to make siloxane copolymers. Moreover, a new fluorine-free weakly coordinating boronate anion, B(SiCl3)4-, was successfully combined with the Si(II) and Ge(II) cations to give the stable catalytically active ion pairs Cp*Si:+B(SiCl3)4-, Cp*Ge:+B(SiCl3)4-, and [Cp(SiMe3)3Ge:+]B(SiCl3)4-.

Metal-Free Catalytic Reductive Cleavage of Enol Ethers

Chulsky, Karina,Dobrovetsky, Roman

supporting information, p. 6804 - 6807 (2018/11/02)

In contrast to the well-known reductive cleavage of the alkyl-O bond, the cleavage of the alkenyl-O bond is much more challenging especially using metal-free approaches. Unexpectedly, alkenyl-O bonds were reductively cleaved when enol ethers were reacted with Et3SiH and a catalytic amount of B(C6F5)3. Supposedly, this reaction is the result of a B(C6F5)3-catalyzed tandem hydrosilylation reaction and a silicon-assisted β-elimination. A mechanism for this cleavage reaction is proposed based on experiments and density functional theory (DFT) calculations.

DMF-activated chlorosilane chemistry: Molybdenum-catalyzed reactions of R3SiH, DMF and R′3SiCl to initially form R′3SiOSiR′3 and R3SiCl

Gonzalez, Paulina E.,Sharma, Hemant K.,Pannell, Keith H.

, p. 376 - 381 (2017/06/30)

The room temperature reactions between R3SiH (R3?=?Et3, PhMe2, Ph2Me) and R′3SiCl (R′3?=?Me3, PhMe2, Ph2Me), with an excess of dimethylformamide (DMF) in the presence of (Me3N)Mo(CO)5 as a catalyst, result in the initial formation of R3SiCl, R′3SiOSiR′3 and Me3N as detected by 29Si, 13C, 1H NMR spectroscopy and GC/MS. As the reaction proceeds, the more so if the reaction temperature is raised, mixed disiloxanes R3SiOSiR′3 and ultimately lesser amounts of R3SiOSiR3 may be detected. A mechanism involving the activation of chlorosilanes by the nucleophilic DMF is proposed to produce transient imminium siloxy ion pairs, [Me2N[dbnd]CHCl]+[R′3SiO]? ? [Me2N[dbnd]CH(OSiR′3)]+Cl? which react with R3SiH to form Me2NCH2OSiR′3 and R3SiCl. A secondary reaction of Me2NCH2OSiR′3 with R′3SiCl produces the symmetrical disiloxane R′3SiOSiR′3 and ClCH2NMe2. The final stage of the reaction is the reduction of ClCH2NMe2 by R3SiH, a reaction which is reported for the first time. The newly created chlorosilane R3SiCl can become involved in the initial DMF activation chemistry thereby forming the other disiloxanes observed as the reaction proceeds.

Photo Lewis acid generators: Photorelease of B(C6F5)3 and applications to catalysis

Khalimon, Andrey Y.,Shaw, Bryan K.,Marwitz, Adam J. V.,Piers, Warren E.,Blackwell, James M.,Parvez, Masood

supporting information, p. 18196 - 18206 (2015/10/28)

A series of molecules capable of releasing of the strong organometallic Lewis acid B(C6F5)3 upon exposure to 254 nm light have been developed. These photo Lewis acid generators (PhLAGs) can now serve as photoinitiators for several important B(C6F5)3-catalyzed reactions. Herein is described the synthesis of the triphenylsulfonium and diphenyliodonium salts of carbamato- and hydridoborates, their establishment as PhLAGs, and studies aimed at defining the mechanism of borane release. Factors affecting these photolytic reactions and the application of this concept to photoinduced hydrosilylation reactions and construction of siloxane scaffolds are also discussed.

METHODS AND COMPOUNDS FOR PHOTO LEWIS ACID GENERATION AND USES THEREOF

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Page/Page column 37; 39, (2013/10/21)

There are disclosed masked Lewis acids into compounds in which the Lewis acid can be released by exposure of the compound to light, especially ultraviolet light. These compounds can be represented by the following formula (I): ([(AEX(3-n))(n+1)Yn](n+1)-)m(Qm+)(n+1) (I). wherein briefly, E represents boron or aluminium, X is an aryl group and Y is -Ar'EAX,. These compounds are used as catalyst for hydrosilylation reaction, crosslinking of polymers, or ester deprotection reactions as photo Lewis acid generator (PhLAG).

A photo Lewis acid generator (PhLAG): Controlled photorelease of B(C 6F5)3

Khalimon, Andrey Y.,Piers, Warren E.,Blackwell, James M.,Michalak, David J.,Parvez, Masood

supporting information; experimental part, p. 9601 - 9604 (2012/07/14)

A molecule that releases the strong organometallic Lewis acid B(C 6F5)3 upon irradiation with 254 nm light has been developed. This photo Lewis acid generator (PhLAG) now enables the photocontrolled initiation of several reactions catalyzed by this important Lewis acid. Herein is described the synthesis of the triphenylsulfonium salt of a carbamato borate based on a carbazole function, its establishment as a PhLAG, and the application of the photorelease of B(C6F5) 3 to the fabrication of thin films of a polysiloxane material.

Rh(I)-catalyzed O-silylation of alcohol with vinylsilane

Park, Jung-Woo,Chang, Hoon-Jo,Jun, Chul-Ho

, p. 771 - 775 (2007/10/03)

Silyl ethers can be produced from alcohols and vinylsilanes under a rhodium(I) catalyst. The reaction is believed to proceed through an O-H bond cleavage of alcohol by rhodium(I) complex and a subsequent hydride insertion into vinylsilane followed by β-silyl elimination of the resulting β-silylethyl rhodium(III) complex. Georg Thieme Verlag Stuttgart.

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