3550-35-4

Usage

Uses

Used in Chemical Synthesis:
(N,N-DIMETHYLAMINO)TRIETHYLSILANE is used as a reagent for the formation of functional groups in organic compounds, facilitating various chemical reactions.
Used in Silicon-Containing Polymers:
(N,N-DIMETHYLAMINO)TRIETHYLSILANE is used as a precursor in the synthesis of silicon-containing polymers, which have applications in materials science and electronics.
Used in Semiconductor Production:
(N,N-DIMETHYLAMINO)TRIETHYLSILANE is used as a source material in chemical vapor deposition processes, contributing to the production of semiconductors.
Used in Research and Development:
(N,N-DIMETHYLAMINO)TRIETHYLSILANE is used as a research compound for exploring new chemical reactions and applications in the field of organosilicon chemistry.
Safety Precautions:
Due to its flammable nature and potentially harmful properties, (N,N-DIMETHYLAMINO)TRIETHYLSILANE requires careful handling to prevent ingestion, inhalation, or skin contact, as it may cause severe burns and eye damage.

InChI:InChI=1/C8H17NSi/c1-9(2)7-6-8-10(3,4)5/h7H2,1-5H3

Upstream product

• 994-30-9 triethylsilyl chloride 
• 124-40-3 dimethyl amine 
• 617-86-7 triethylsilane 
• 51-80-9 bis-(dimethylamino)methane 
• 14846-56-1 bis-(triethyl silyl) tellane 

Downstream Products

• 107-46-0 Hexamethyldisiloxane 
• 2652-41-7 1,1,1-triethyl-3,3,3-trimethyl-disiloxane 
• 994-49-0 hexaethyl disiloxane 
• 68-12-2 N,N-dimethyl-formamide 
• 127-19-5 N,N-dimethyl acetamide 
• 27329-91-5 N,N-Dimethyl-2-triethylsilanyl-acetamide 
• 27329-92-6 α-(Triaethylsiloxy)vinyldimethylamin 
• 23184-21-6 N,N-Dimethyl-<1-triethylsiloxy-vinyl>-acetamid 

Relevant academic research and scientific papers

Sterically encumbered tris(trialkylsilyl) phosphine precursors for quantum dot synthesis

The synthesis of nanomaterials with a narrow size distribution is challenging, especially for III-V semiconductor nanoparticles (also known as quantum dots). Concerning phosphides, this issue has been largely attributed the use of overly reactive precursors. The problem is exacerbated due to the narrow range of competent reagents for III-V semiconductor syntheses. We report the use of sterically encumbered tris(triethylsilyl) phosphine and tris(tributylsilyl) phosphine for InP quantum dot (QD) synthesis among others. The hypothesis was that these reagents are less reactive than the near-ubiquitous precursor tris(trimethylsilyl) phosphine and can be used to create more homogeneous materials. It was found that the InP products' quantum yields and emission color saturation (fwhm) were improved, but not to the levels realized in CdSe QDs. Regardless, these reagents have other positive attributes; they are less pyrophoric and can be applied toward the synthesis of II-V semiconductors and organophosphorus compounds. Concerning safe practices, we demonstrate that ammonium bifluoride is an effective replacement for highly toxic HF for the post-treatment of III-V semiconductor quantum dots.

Wet-chemical synthesis of different bismuth telluride nanoparticles using metal organic precursors-single source vs. dual source approach

Thermolysis of the single source precursor (Et2Bi)2Te 1 in DIPB at 80 °C yielded phase-pure Bi4Te3 nanoparticles, while mixtures of Bi4Te3 and elemental Bi were formed at higher temperatures. In contrast, cubic Bi2Te particles were obtained by thermal decomposition of Et2BiTeEt 2 in DIPB. Moreover, a dual source approach (hot injection method) using the reaction of Te(SiEt3)2 and Bi(NMe2)3 was applied for the synthesis of different pure Bi-Te phases including Bi2Te, Bi4Te3 and Bi2Te3, which were characterized by PXRD, REM, TEM and EDX. The influence of reaction temperature, precursor molar ratio and thermolysis conditions on the resulting material phase was verified. Moreover, reactions of alternate bismuth precursors such as Bi(NEt2)3, Bi(NMeEt)3 and BiCl3 with Te(SiEt3)2 were investigated.

REACTION OF THE NITROGEN-CONTAINING HETEROANALOGS OF ACETALS WITH TRIETHYLSILANE

The reaction of 1,3-oxaazacycloalkanes with triethylsilane in the presence of a nickel catalyst and zinc halides was investigated.The new compounds of the triethylsilyloxy(dialkylamino)alkane type, i.e., products from the chemospecific cleavage of the heterocycle at the C2-O bond, were isolated and characterized.It was established that triethylsilane can cleave the C-N bond in acyclic aminals with the formation of triethyl(dialkylamino)silanes and tertiary amines.

19-Hydroxy-PGI2 compounds

Prostacyclin and prostacyclin-type derivatives having a 19-hydroxy feature are disclosed, including processes for preparing them and the appropriate intermediates. The compounds are useful for pharmacological purposes such as inhibition of blood platelate aggregation.

2-Decarboxy-2-hydroxymethyl-19-hydroxy-PG1 analogs

Prostaglandin derivatives having a 19,20-didehydro, a 19-hydroxy, or a 19-keto feature are disclosed, including processes for preparing them and the appropriate intermediates. A typical 19-hydroxy compound of this invention is 19-hydroxy-19-methyl-PGF2α, methyl ester, represented by the formula STR1

Bicyclic lactones

Process for preparing bicyclic lactone acrylic aldehydes and ketones of the formula STR1 wherein "n" is one or 2, wherein R1, is hydrogen, methyl, or ethyl, and wherein R4 is hydrogen or a blocking group; and those aldehydes, ketones, and intermediates prepared therein. The aldehydes and ketones are useful intermediates in preparing prostaglandins and analogs having pharmacological utility.