2814-79-1

Basic information

• Product Name: ETHYLSILANE
• Synonyms: 1-Silapropane;C2H5SiH3;ETHYLSILANE;ETHYLSILANE 97%
• CAS NO: 2814-79-1
• Molecular Formula: C₂H₈Si
• Molecular Weight: 60.17
• Mol File: 2814-79-1.mol

Chemical Properties

• Melting Point: -180°C
• Boiling Point: 19 °C(lit.)
• Flash Point: <-40
• Appearance: /
• Density: 0,639 g/cm3
• Vapor Pressure: 3080mmHg at 25°C
• CAS DataBase Reference: ETHYLSILANE(CAS DataBase Reference)
• NIST Chemistry Reference: ETHYLSILANE(2814-79-1)
• EPA Substance Registry System: ETHYLSILANE(2814-79-1)

Safety Data

• Hazard Codes: F+,Xi
• Statements: 12-36/37/38
• Safety Statements: 16-26-33-36
• RIDADR: UN 1954 2.1
• WGK Germany: 3
• F: 4.5
• TSCA: No
• Hazardous Substances Data: 2814-79-1(Hazardous Substances Data)

Usage

Uses

Used in Silicon-based Material Production:
Ethylsilane is used as a precursor for the production of silicon-based materials, such as silicone rubbers and resins. It plays a crucial role in the manufacturing process, enabling the creation of these versatile materials with a wide range of applications.
Used in Specialty Chemicals and Pharmaceuticals Synthesis:
Ethylsilane is used as a starting material in the synthesis of specialty chemicals and pharmaceuticals. Its unique properties make it a valuable component in the development of new and innovative products in these industries.
Used in Semiconductor Industry:
Ethylsilane is used as a dopant in the semiconductor industry. Its ability to modify the electrical properties of semiconductor materials makes it an important component in the production of electronic devices and components.
Used in Chemical Vapor Deposition (CVD) Processes:
Ethylsilane is used in chemical vapor deposition (CVD) processes for the deposition of thin films and coatings on various substrates. Its reactivity and ability to form stable compounds make it a useful material in this application.
Used in Analytical Chemistry:
Ethylsilane is used as a derivatizing agent in analytical chemistry for the detection and analysis of various compounds. Its ability to react with specific functional groups makes it a valuable tool in this field.
Used in Research and Development:
Ethylsilane is used in research and development for the exploration of new applications and properties of organosilicon compounds. Its unique characteristics make it an interesting subject for scientific investigation and potential breakthroughs in various industries.

InChI:InChI=1/C2H8Si/c1-2-3/h2H2,1,3H3

Upstream product

• 617-86-7 triethylsilane 
• 1759-88-2 disilylmethane 
• 74-85-1 ethene 
• 7291-09-0 vinylsilane 
• 1600-29-9 n-butylsilane 
• 542-91-6 H₂SiEt₂ 

Downstream Products

• 74-85-1 ethene 
• 7291-09-0 vinylsilane 
• 10536-78-4 ethylchlorosilane 
• 1789-58-8 ethyldichlorosilane 
• 1261240-44-1 [RhH((P(C₆H₅)2CH₂)4N₂)] 
• 78-07-9 ethyltriethoxy silane 
• 154081-17-1 1,3-diethyldisiloxane 
• 74-86-2 acetylene 
• 61667-41-2 7-(2-ethoxyethoxy)-7-ethyl-3,6,8,11-tetraoxa-7-silatridecane 

Relevant articles and documents

Catalytic Disproportionation of Alkylsilanes over Sulfated ZrO2

Gas phase heterogeneous catalytic conversions of diethylsilane(E2), triethylsilane(E3) and diethyldimethylsilane(E2M2) were examined at 373 - 573 K in a closed recirculation reactor by using a sulfated ZrO2(SO3/ZrO2) catalyst. The catalyst exhibited high disproportionation activity even at 373 K.

Towards Naked Zinc(II) in the Condensed Phase: A Highly Lewis Acidic ZnII Dication Stabilized by Weakly Coordinating Carborate Anions

The employment of the hexyl-substituted anion [HexCB11Cl11]? allowed the synthesis of a ZnII species, Zn[HexCB11Cl11]2, 3, in which the Zn2+ cation is only weakly coordinated to two carborate counterions and that is soluble in low polarity organic solvents such as bromobenzene. DOSY NMR studies show the facile displacement of at least one of the counterions, and this near nakedness of the cation results in high catalytic activity in the hydrosilylation of 1-hexene and 1-methyl-1cyclohexene. Fluoride ion affinity (FIA) calculations reveal a solution Lewis acidity of 3 (FIA=262.1 kJ mol?1) that is higher than that of the landmark Lewis acid B(C6F5)3 (FIA=220.5 kJ mol?1). This high Lewis acidity leads to a high activity in catalytic CO2 and Ph2CO reduction by Et3SiH and hydrogenation of 1,1-diphenylethylene using 1,4-cyclohexadiene as the hydrogen source. Compound 3 was characterized by multinuclear NMR spectroscopy, mass spectrometry, single crystal X-ray diffraction, and DFT studies.

Reaction of Hydrogen Peroxide with Organosilanes under Chemical Vapour Deposition Conditions

When a stream of vapour at low pressure which contained a mixture of H2O2 with an organosilane, RSiH3 (R = alkyl or alkenyl), impinged on a silicon wafer, deposition of oxide films of nominal composition RxSiO(2-0.5x), where x 3 or higher alkenyl groups. or higher alkenylgroups. Possible mechanism for the Si-C bond cleavage reaction are discussed, with energetic rearrangement of radical intermediates of type Si(H)(R)(OOH)' being favoured.

Preparation of vinylsilane from monosilane and vinyl chloride

Vinylsilane (CH2=CH-SiH3) was prepared by the dehydrochlorination reaction between SiH4 and vinyl chloride. The reactions were carried out in the gas phase at 450-500°C using a tube reactor, and the maximum yield of vinylsilane was 21% when the conversion of SiH4 was 32%. A small amount of CCl4 and CH3NO2 accelerated the reaction. A reaction mechanism involving :SiH2, which was generated by the thermal decomposition of SiH4, was proposed.