- Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method for manufacturing photosensitive dry film, method for manufacturing patterned resist film, method for manufacturing substrate with mold comprising a nitrogen-containing heterocyclic compound (C), an acid generator (A) and a resin (B)
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The present invention relates to a chemically amplified positive-type photosensitive resin composition that easily forms a resist pattern having a rectangular cross-sectional shape, a photosensitive dry film including a photosensitive resin layer formed by using the chemically amplified positive-type photosensitive resin composition, a method for manufacturing the photosensitive dry film, a method for manufacturing a patterned resist film using the aforementioned chemically amplified positive-type photosensitive resin composition, a method for manufacturing a substrate with a mold using the aforementioned chemically amplified positive-type photosensitive resin composition, a method for manufacturing a plated product using the substrate with a mold, and a novel nitrogen-containing heterocyclic compound. The solution of the present invention is a chemically amplified positive-type photosensitive resin composition which comprises: a nitrogen-containing heterocyclic compound (C) which is a nitrogen-containing heterocyclic compound having a specific structure and a LogS value of -4.00 or less; wherein the chemically amplified positive-type photosensitive resin composition comprises an acid generator (A) that generates acid by irradiation with actinic rays or radiation; and a resin (B) the solubility of which in alkali is increased by the action of an acid.
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Paragraph 0346; 0347
(2020/05/06)
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- Prop-2-ynyl as a protective group for carboxylic acids: A mild method for the highly selective deprotection of prop-2-ynyl esters using tetrathiomolybdate
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It is shown that prop-2-ynyl esters are useful protecting groups for carboxylic acids and that they are selectively deprotected in the presence of other esters on treatment with tetrathiomolybdate under mild conditions.
- Ilankumaran, Palanichamy,Manoj,Chandrasekaran, Srinivasan
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p. 1957 - 1958
(2007/10/03)
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- Chemilumineszenz- und Oxidationsreactionen von Phthaloylperoxid und verwandten Verbindungen.
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Phthaloylperoxid (PPO) und 4,5-Dichlorphthaloylperoxid ergeben mit fluoreszenzfaehigen aromatischen Kohlenwasserstoffen wie 9,10-Diphenylanthracen (DPA), 9,10-Bis(phenylethinyl)anthracen, Pyren, Perylen, aber auch heterocyclischen Verbindungen wie 1,3-Diphenylbenzofuran (9), Luminol oder Fluorescein Chemilumineszenz, die Quantenausbeuten bis 1E-3 Einstein/mol erreichen kann, wenn Phthalsaeureester als Loesungsmittel eingesetzt werden.Die Chemilumineszenz wird durch Sauerstoff hinsichtlich der Maximalintensitaet gesteigert, hinsichtlich der Lichtausbeute auf etwa 80percent verringert.Da bei Derivaten des 1,3-Diphenyl-benzofurans sowohl Chemilumineszenz, als auch Bildung der entsprechenden "Photooxdationsprodukte" (bei 9: o-Dibenzoylbenzol) beobachtet wurde, wird die Moeglichkeit der Bildung von Singulett-Sauerstoff aus PPO diskutiert.Die Bildung von Phthalsaeure-halbestern aus PPO und Olefinen anstelle des Auftretens von Hydroperoxiden wird ueber die thermodynamisch moegliche intermediaere Bildung von Benzocyclobutendion erklaert und ist kein grundsaetzlicher Widerspruch gegen das Auftreten von Singulett-Sauerstoff bei PPO-Reaktionen.
- Gundermann, Karl-Dietrich,Steinfatt, Manfred,Witt, Peter,Paetz, Christian,Poeppel, Karl-Ludwig
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p. 2801 - 2822
(2007/10/02)
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