.
Angewandte
Communications
Our effort to develop such a reaction began by examining
the silylation of 4-tert-butylstyrene using TMSI. Our initial
studies were conducted at 808C in toluene with the alkene as
the limiting reagent. To systematically evaluate the use of
various phosphine ligands, [(COD)Pd(CH2TMS)2][13] (2) was
selected as the palladium precatalyst.[14] Under these con-
ditions, neither Ph3P nor Et3P (the ligands used by Murai and
Tanaka, respectively) provided more than trace yield of the
desired silyl styrene 1 (Table 1, entries 1 and 2).[15] Bisphos-
phines were also ineffective in the reaction (Table 1, entries 3
and 4).
provided 1 in 65% yield (Table 1, entry 8). Ultimately,
tBuPPh2 (q = 1578)[17] proved to be the most effective ligand
and provided 1 in 80% yield under the assay conditions
(Table 1, entry 9). After optimization (most significantly by
lowering the temperature to 508C and decreasing the
concentration), vinyl silane 1 was obtained in 98% yield
after 24 h, as assessed by GC (Table 1, entry 10).
A wide variety of styrene substrates participate in the
silyl-Heck reaction to provide vinyl silanes in high yields
(Scheme 2). Under preparative conditions (ca. 1 mmol scale),
Table 1: Identification of the catalyst for the silyl-Heck reaction.[a]
Entry
Ligand
Yield [%][b]
Entry
Ligand
Yield [%][b]
1
2
3
4
5
Et3P
6
4
0
1
1
6
7
8
Cy3P
4
Ph3P
dppe
dcpe
tBu3P
Cy2PPh
CyPPh2
tBuPPh2
tBuPPh2
27
65
80
98
9
10[c]
[a] Conc. of substrate=2m. [b] Determined by GC. [c] 2 equiv TMSI,
2.2 equiv Et3N, tol, conc.=1m, 24 h, 508C.
From the outset, we suspected that a sterically demanding,
electron-rich ligand would be required to effect the desired
reaction in high yield. Such ligands have proven effective in
a variety of challenging palladium-catalyzed transformations,
as they allow the formation of highly reactive, low-valent
palladium intermediates, which can aid in both oxidative
addition and ligand-exchange processes.[16] Surprisingly, how-
ever, neither the use of tBu3P (Tolman Angle, q = 1828)[17] nor
Cy3P (q = 1708)[17] provided significant amounts of the desired
product (Table 1, entries 5 and 6).
Scheme 2. Scope of the silyl-Heck reaction for substrates that lack
allylic hydrogen atoms. Conc. of substrate=1m. For 8, 11, and 12:
[(COD)Pd(CH2TMS)2] (10 mol%), tBuPPh2 (21 mol%), sol-
vent=PhCF3. For 9: [(COD)Pd(CH2TMS)2] (10 mol%), tBuPPh2
(21 mol%), solvent=PhCF3, TMSI (4 equiv), Et3N (4.4 equiv),
conc.=0.5m, after cleavage of the silyl enol ether, 48 h. For 10 and 13:
[(COD)Pd(CH2TMS)2] (10 mol%), tBuPPh2 (21 mol%),TMSI (3 equiv)
Et3N (3.5 equiv), 48 h.
Consideration of the intermediates in the proposed
catalytic cycle (Scheme 1) suggested that the reason for the
failure of these all-alkyl ligands might be related to the large
steric demand of the TMS group. We reasoned that large,
electron-rich, all-alkyl ligands, which provide an electronic
vinyl silane 1 was isolated in 97% yield.[18] Unsubstituted
styrene was also an excellent substrate and gave a 95% yield
of isolated 3. Both electron-rich and electron-poor substrates
proved viable in the reaction; compounds 4 and 8 were
prepared in 96% and 81% yield, respectively. The reaction
also tolerates functional groups well, with substrates that
contain aryl ethers, esters, chlorides, fluorides, and ketones all
providing products in high yields.[19] Steric hindrance on the
arene of the styrene was also tolerated; compound 10, which
contains a methyl group ortho to the alkene, was isolated in
87% yield. However, substrates that have increased substi-
tution on the alkene, such as in a- or b-methyl styrene, failed
to react in the silylation. Although the formation of highly
Lewis-basic products, such as pyridine derivative 11, was
possible, the yields in these reactions were diminished.
Increased steric demand around the site of the Lewis base,
such as in picoline derivative 12, greatly improved the
reaction, which suggests that the low yield for 11 may be
a result of ligation of the pyridyl group to the palladium
benefit to the reaction, might sterically disfavor oxidative
0
À
addition of Pd to the TMS I bond. To address the apparent
dichotomy between steric and electronic factors, we examined
ligands that contain both phenyl groups and large alkyl
groups. Although these ligands are less commonly used in
catalysis, we reasoned that they might be sufficiently electron-
donating and large enough to support low-valent palladium
complexes, and also provide sufficient space around the
resulting PdII center to accommodate the sterically demand-
ing TMS group. In accordance with this hypothesis, the use of
Cy2PPh (q = 1618)[17] significantly increased the yield of the
desired product (27%, Table 1, entry 7). This result is
particularly remarkable given the failure of both Ph3P and
Cy3P, which contain only a single type of phosphine substitu-
ent. The silyl-Heck reaction was further improved by switch-
ing to the slightly smaller CyPPh2 (q = 1538),[17] which
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Angew. Chem. Int. Ed. 2012, 51, 3663 –3667