Reactions of difluorosilylene with amines, phosphines and halomethanes the first evidence of the insertion of difluorosilylene into tetrafluorosilane

Article abstract of DOI:10.1002/jccs.199900061

The reactions of SiF₂/SiF₄ with amines, phosphines and various halomethanes were studied. The results show that in the presence of strong Lewis base (Et₃N, HNEt₂, PR₃, PR₂Cl), SiF₂ inserts initially into SiF₄ to form Si₂F₆, which was followed by subsequent reactions leading to products containing SiF₃ groups. This is the first report of the insertion of SiF₂ into SiF₄. When the reactants were a weaker base (such as RPCl₂, CX₃Br, X=F, Cl), insertion of SiF₂ into P-Cl and C-Br bonds became predominant.