
Polyhedron p. 2021 - 2028 (1997)
Update date:2022-08-04
Topics:
Kou, Fuping
Zhu, Shourong
Lin, Huakuan
Chen, Wandong
Chen, Yunti
Lin, Meirong
The kinetics of the acid dissociation of copper(II) complex of a novel C-functionalized macrocyclic dioxotetraamine has been studied using a stopped-flow spectrophotometer. It was proven that substituents decrease the acid dissociation rates. The dissociation rate follows the law vd = CcomkK1K2H2/ (1 + K1H + K1K2H2). On the intermediates we have obtained, the dissociation kinetics are interpreted by a mechanism involving the negatively charged carbonyl oxygen of the complex being rapidly protonated in a pre-equilibrium step, the rate-determining step being intramolecular hydrogen(enolic tautomer) migration(to imine nitrogen). The dissociation rate reached a plateau in strongly acidic solution. By means of temperatures coefficient method, K1, K2 of the pre-equilibrium step and ΔH≠ and ΔS≠ of the rate-determining step were obtained and the results discussed. It is the strong in-plane ligand field that increased ΔH of the rate-determining step and thus decreases the dissociation rate constant. The Broensted type linear free energy relationships do exist in this C-functionalized dioxotetraamine copper(II) complex. The results clarify insights into acid dissociation mechanisms for the 14-membered macrocyclic dioxotetraamine copper(II) complex.
Shanghai Mio Chemical Co., Ltd
Contact:0086 21- 64401188-622
Address:16 Floor NO.2 Jiefang Building, No. 4855 Dushi Road, 201100 Shanghai, P.R.China
Contact:86-15588110016
Address:LINYI CITY,SHANDONG PROVINCE,CHINA
Wuhan Kemi-Works Chemical Co., Ltd
website:http://www.kemiworks.com
Contact:86-27-85736489
Address:Rm. 1503, No. 164, Jianghan North Rd., Wuhan, 430022 China
Henan Techway Chemical Co.,Ltd.
website:http://www.techwaychem.com
Contact:+86-371-66380080
Address:No.27 Shunhe Road,
Contact:852-27701081
Address:Room 2509, New Tech Plaza, 34 Tai Yau St., San Po Kong, HK
Doi:10.1016/S0020-1693(96)05408-4
(1997)Doi:10.1016/S0022-328X(00)93850-6
(1968)Doi:10.1021/jo01255a007
(1969)Doi:10.1021/bc900482r
(2010)Doi:10.1002/cmdc.202000775
(2021)Doi:10.1016/j.bmc.2006.09.031
(2007)