Journal of the American Chemical Society p. 8623 - 8632 (2015)
Update date:2022-08-11
Topics:
Dhuri, Sunder N.
Cho, Kyung-Bin
Lee, Yong-Min
Shin, Sun Young
Kim, Jin Hwa
Mandal, Debasish
Shaik, Sason
Nam, Wonwoo
A comprehensive experimental and theoretical study of the reactivity patterns and reaction mechanisms in alkane hydroxylation, olefin epoxidation, cyclohexene oxidation, and sulfoxidation reactions by a mononuclear nonheme ruthenium(IV)-oxo complex, [RuIV(O)(terpy)(bpm)]2+ (1), has been conducted. In alkane hydroxylation (i.e., oxygen rebound vs oxygen non-rebound mechanisms), both the experimental and theoretical results show that the substrate radical formed via a rate-determining H atom abstraction of alkanes by 1 prefers dissociation over oxygen rebound and desaturation processes. In the oxidation of olefins by 1, the observations of a kinetic isotope effect (KIE) value of 1 and styrene oxide formation lead us to conclude that an epoxidation reaction via oxygen atom transfer (OAT) from the RuIVO complex to the C-C double bond is the dominant pathway. Density functional theory (DFT) calculations show that the epoxidation reaction is a two-step, two-spin-state process. In contrast, the oxidation of cyclohexene by 1 affords products derived from allylic C-H bond oxidation, with a high KIE value of 38(3). The preference for H atom abstraction over C-C double bond epoxidation in the oxidation of cyclohexene by 1 is elucidated by DFT calculations, which show that the energy barrier for C-H activation is 4.5 kcal mol-1 lower than the energy barrier for epoxidation. In the oxidation of sulfides, sulfoxidation by the electrophilic Ru-oxo group of 1 occurs via a direct OAT mechanism, and DFT calculations show that this is a two-spin-state reaction in which the transition state is the lowest in the S = 0 state.
View MoreContact:+86-574- 87178138; 87297407
Address:No. 809, Liudingxingzuo, cangsong road, Ningbo, China
Tianjin Te-An Chemtech Co., Ltd.(expird)
Contact:+86-22-65378638
Address:A5-8, No.80 Haiyun Street, TEDA
Puyang Willing Chemicals Co.,Ltd.
Contact:86-393-4840366
Address:Puyang Henan China
Anhui Sholon New Material Technology Co., Ltd.
website:http://www.sholonchem.com
Contact:+86-550-5261666
Address:4/F Block B, Beijing Chemical Building.No.520 Tianrun Road ,Science & Education Town Wujin District, Changzhou City Jiangsu Province
puyang hongda shengdao new material co.,ltd.
Contact:+86-393- 4896278
Address:No.29 East Zhongyuan Road
Doi:10.1039/a804664f
(1998)Doi:10.1021/j100369a040
(1990)Doi:10.1021/ic100760t
(2010)Doi:10.1080/00304948.2016.1194126
(2016)Doi:10.1016/0040-4020(95)98711-P
(1995)Doi:10.1246/bcsj.63.3640
(1990)