A.R. Almeida et al. / Journal of Catalysis 273 (2010) 116–124
123
When KCane
C
Cane ꢃ [1 + KCnone
C
Cnone], Eq. (1) can be simplified
(0.00108 in mol Einsteinꢀ1) than for TiSi0 (0.00062 in mol Ein-
stein ), the consequence of the much slower rate of deactivation
of the silylated catalyst.
In summary, the data show that a relatively high level of silyla-
tion is required to create improved catalysts. Two regimes can be
defined:
ꢀ1
to:
r ¼ k
f
N
T
ð2Þ
When KCnoneCCnone ꢃ [1 + KCane
CCane], Eq. (1) can be simplified to:
K
Cane
C
C
Cane
f
r ¼ k N
T
ð3Þ
K
Cnone
Cnone
(1) At Si content <1.0 wt.%, the rate of cyclohexanone formation
follows the decrease in available OH sites. So the improve-
ment in cyclohexanone desorption rate constant is not
enough to compensate for the decrease in surface OH
groups.
Cyclohexanone is expected to have a much stronger adsorption
enthalpy than cyclohexane, so the second limiting case is most
realistic and considered in the following. For simplicity, we assume
that on bare TiO
rate in steady-state conditions (NT,TiS0 = N
three types of sites are distinguished: isolated OH sites (N
sites with a neighboring silane group (N ) and silylated inactive
sites (NSi), = N + N So for
+ N
This leads to the following rate equation:
2
only one set of OH sites determines the reaction
). On a silylated surface,
), OH
(
2) At Si content >1.0 wt.%, the rate of cyclohexanone formation
increases as a result of a further increased cyclohexanone
desorption rate constant. Under these conditions, the
desorption rate becomes dominant and over-compensates
the negative impact of the decrease in surface OH groups.
At higher silane content, the still available OH sites are char-
acterized by a higher turnover frequency than the original
free OH sites on TiSi0.
1
1
2
N
T
1
2
+ NSi
.
a
silylated surface
[
N
1
2
] < NT,TiSi0.
K
Cane
C
C
Cane
Cnone
K
Cane Cane
C
C
r ¼ k
f
N
1
þ k
f
N
2
ð4Þ
K
Cnone;1
K
Cnone;2 Cnone
There should be an optimum silane loading that combines the
increased surface hydrophobicity, with a sufficient number of
available surface active sites. Based on the data provided here,
the silylation loading should be at least 2.1 wt.%.
For TiSi0 this reduces to:
K
Cane
C
Cane
r
TiSi0 ¼ k
f
N
T;TiSi0
ð5Þ
K
Cnone;1
C
Cnone
The trends in surface OH sites (N
acidic OH groups represent the active sites, and desorption con-
1
+ N
2
), assuming that the
5
. Conclusions
stants (kdes) as a function of silylation are shown in Fig. 10b.
2 3 3
A commercial TiO catalyst was modified by coupling ASi(CH )
groups to its surface. The silane groups, which seems to react pref-
erentially with acidic OH sites, increase the hydrophobicity of the
1 2
The data shows for TiSi2.1: (N + N ) = 0.6NT,TiSi0. It should be
noted that for TiSi2.1, a surface coverage of 60% was obtained
and, as a consequence, the number of OH active sites which are
2
silylated-TiO catalysts. Desorption rates of cyclohexanone were
neighboring a silane group is predominant, so N
ꢂ 0.6NT,TSi0. For the rate of desorption of TiSi2.1, an analogous
relation holds: which corresponds to
Cnone,TiSi2.1 = (1/2.3)KCnone,TiSi0 (when kads is constant). So Eq. (4)
for TiSi2.1 can be simplified to:
2
1
ꢃ N and
increased by surface modification, and a linear relation between
silane loading and cyclohexanone desorption rate constant was
observed. Accordingly, during cyclohexane photo-oxidation, the
silylated catalysts showed lower tendency for deactivation. At
low silane contents, the rate of cyclohexanone formation over par-
tially deactivated surfaces decreased due to the dependency on the
number of OH groups. However, for higher silane content
N
2
kdes,TiSi2.1 = 2.3 kdes,TiSi0,
K
K
Cane Cane
C
r
TiSi2:1 ¼ k
f
0:6NT;TiSi0
¼ 1:4rTiSi0
C
Cnone
ð6Þ
ð1=2:3ÞKCnone;1
(
Si > 1.0 wt.%), the increased desorption rate of cyclohexanone
assuming that the cyclohexanone formation rate constant is the
same for TiSi0 and TiSi2.1. So the rate of cyclohexanone formation
is higher for TiSi2.1 than for TiSi0 due to the improved desorption
constant, despite the decrease in available active sites. Accordingly,
the available OH sites of TiSi2.1, taking into consideration that
approximately 60% of the OH groups is converted by silylation,
overcomes the lower number of surface OH sites with relatively
high stability.
The silylated surface groups were not stable under photo-cata-
lytic conditions. Improvement of the surface modification method
should include the use of fluorine-containing silylation agents,
which have been proven to resist photo-catalytic conditions.
show
a
higher turnover frequency than of TiSi0, i.e.,
ꢀ
3
ꢀ1
ꢀ3
ꢀ1
9
.3 ꢁ 10 min compared to 5.6 ꢁ 10 min , respectively. The
Acknowledgment
turnover numbers are 0.8 and 0.3 for TiSi2.1 and TiSi0 for the short
illumination time applied here. Previous work has shown that TiSi0
at longer illumination times shows a TON above unity and that
We thank STW, the Netherlands (Project DPC.7065) for financial
2
9
support. Thanks to Kristina Djanashvili for the Si MAS NMR mea-
surements and to Louise Vrielink (Utwente) for XRF measure-
ments. Thanks to Mariette de Groen for her contributions to this
work.
(
2
silylated) TiO is indeed a catalyst for the target reaction, albeit
deactivating.
As stated previously, Eq. (6) applies only to the rate of cyclohex-
anone formation at prolonged illumination times, after which a
certain amount of active sites is deactivated. To analyze the initial
rate of cyclohexanone formation on TiSi0, two sites should be con-
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