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Letters
J. Phys. Chem. B, Vol. 106, No. 45, 2002 11715
References and Notes
(1) Kresge, C. T.; Leonowicz, M. E.; Roth, W. J.; Vartuli, J. C.; Beck,
J. S. Nature 1992, 359, 710.
(2) Beck, J. S.; Vartuli, J. C.; Roth, W. J.; Leonowicz, M. E.; Kresge,
C. T.; Schmitt, K. D.; Chu, C. T.-W.; Olson, D. H.; Sheppard, E. W.;
McCullen, S. B.; Higgins, J. B.; Schlenker, J. L. J. Am. Chem. Soc. 1992,
114, 10834.
(3) Feng, P.; Bu, X.; Stucky, G. D.; Pine, D. J. J. Am. Chem. Soc.
2000, 122, 994.
(4) Kim, J. M.; Sakamoto, Y.; Hwang, Y. K.; Kwon, Y.; Terasaki, O.;
Park, S.; Stucky, G. D. J. Phys. Chem. B 2002, 106, 2552.
(5) Ying, J. Y.; Mehnert, C. P.; Wong, M. S. Angew. Chem., Int. Ed.
Engl. 1999, 38, 56 and references therein.
(6) Oliver, S.; Kuperman, A.; Coombs, N.; Lough, A.; Ozin, G. A.
Nature 1995, 378, 47.
(7) Ogawa, M. J. Am. Chem. Soc. 1994, 116, 1941.
(8) Dubois, M.; Gulik-Krzywichi, Th.; Cabane, B. Langmuir 1993, 9,
673.
(9) Tanev, P. T.; Pinnavaia, T. J. Science 1996, 271, 1267. Tanev, P.
T.; Liang, Y.; Pinnavaia, T. J. J. Am. Chem. Soc. 1997, 119, 8616. Kim, S.
S.; Zhang, W.; Pinnavaia, T. J. Science 1998, 282, 1302.
(10) Sayari, A.; Karra, V. R.; Reddy, J. S.; Moudrakovski, I. L. J. Chem.
Soc. Chem. Commun. 1996, 411. Chenite, A.; Page, Y. Le; Karra, V. R.;
Sayari, A. J. Chem. Soc., Chem. Commun. 1996, 413.
(11) Zhao, D. Y.; Feng, J.; Huo, Q.; Melosh, N.; Fredrickson, G. H.;
Chemlka, B. F.; Stucky, G. D. Science 1998, 279, 548.
(12) (a) Randal, M. H. Silicone surfactants; Marcel Dekker: New York,
1998. (b) Soni, S. S.; Sastry, N. V.; Aswal, V. K.; Goyal, P. S. J. Phys.
Chem. B 2002, 106, 2606.
(13) Zhao, D.; Yang, P.; Melosh, N.; Feng, J.; Chmelka, B. F.; Stucky,
G. D. AdV. Mater. 1998, 10, 1380.
(14) Yang, P.; Zhao, D.; Margolese, D. I.; Chmelka, B. F.; Stucky, G.
D. Nature 1998, 396, 152.
(15) Monnier, A.; Schu¨th, F.; Huo, Q.; Kumar, D.; Margolese, D.;
Maxwell, R. S.; Stucky, G. D.; Krishnamurty, M.; Petroff, P.; Firouzi, A.;
Janicke, M.; Chmelka, B. F. Science 1993, 261, 1299.
as silicone surfactants) is responsible for the formation of the
zero-curvature (planar) lamellar silica mesophase, and restrictive
chain configuration (such as Pluronics family, C16TA+) is
responsible for high curvature hexagonal mesophase.15 Other
metal oxides such as SnO2 and Al2O3 with similar lamellar
structure can also be obtained using silicone surfacant as the
template and corresponding anhydrous metal chlorides as
precursors in nonaqueous solutions.
In conclusion, we have demonstrated that novel silicone-based
copolymer can successfully template the assembly of the hybrid
layered oxide mesophase with the largest interlayer spacings
for the first time. The synthesis of unusual lamellar oxide
materials with silicone surfactants as the template illustrates the
novelty of this synthetic strategy. We suggest that the un-
restricted supramolecule chain configuration of siloxane may
be responsible for the formation of these unusual lamellar oxide
materials. Such hybrid oxides with long-range ordered lamellar
structure are of interest from the viewpoint of biomineralization
and may find potential applications. The possibility of producing
other oxide materials with unusual mesostructures using this
novel method is also intriguing. It will enrich our ability to create
highly ordered inorganic/organic mesostructure with larger
periodic spacing using the bottom-up approach.
Acknowledgment. Support from the Guangdong Province
“The Tenth Five-Year Plan” Key Project (20010185C) is
gratefully acknowledged.