Full text of DOI:10.1063/1.99291

Silicon dioxide deposition at 100°C using vacuum ultraviolet light
Jeffrey Marks and Ruby E. Robertson
Citation: Applied Physics Letters 52, 810 (1988); doi: 10.1063/1.99291
View online: http://dx.doi.org/10.1063/1.99291
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/52/10?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
128.59.222.12 On: Sat, 29 Nov 2014 08:02:00

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
128.59.222.12 On: Sat, 29 Nov 2014 08:02:00

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
128.59.222.12 On: Sat, 29 Nov 2014 08:02:00