Full text of DOI:10.1063/1.106898

Highfluidity chemical vapor deposition of silicon dioxide
H. Shin, S. Miyazaki, and M. Hirose
Citation: Applied Physics Letters 60, 2616 (1992); doi: 10.1063/1.106898
View online: http://dx.doi.org/10.1063/1.106898
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/60/21?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
132.174.255.116 On: Mon, 22 Dec 2014 02:27:37

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
32.174.255.116 On: Mon, 22 Dec 2014 02:27:37
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
32.174.255.116 On: Mon, 22 Dec 2014 02:27:37
1

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
32.174.255.116 On: Mon, 22 Dec 2014 02:27:37
1