Full text of DOI:10.1063/1.109965

Silicon dioxide thin films prepared by chemical vapor deposition from tetrakis
dimethylamino)silane and ozone
(
Toshiro Maruyama and Toshimasa Shirai
Citation: Applied Physics Letters 63, 611 (1993); doi: 10.1063/1.109965
View online: http://dx.doi.org/10.1063/1.109965
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/63/5?ver=pdfcov
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
30.18.123.11 On: Sat, 20 Dec 2014 10:12:37
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
30.18.123.11 On: Sat, 20 Dec 2014 10:12:37
1

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
30.18.123.11 On: Sat, 20 Dec 2014 10:12:37
1