PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF TITANIUM DIBORIDE FILMS.

Article abstract of DOI:10.1063/1.95845

Thin films of titanium borides were deposited at temperatures from 480 to 650 degree C using a glow discharge and feed gases of TiCl//4, BCl//3, and H//2. High quality films have been obtained that are smooth, shiny, and crack-free; they have as-deposited

Full text of DOI:10.1063/1.95845

Plasma enhanced chemical vapor deposition of titanium diboride films
L. M. Williams
Citation: Applied Physics Letters 46, 43 (1985); doi: 10.1063/1.95845
View online: http://dx.doi.org/10.1063/1.95845
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/46/1?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
141.35.40.137 On: Sun, 30 Nov 2014 13:56:44

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
141.35.40.137 On: Sun, 30 Nov 2014 13:56:44

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
141.35.40.137 On: Sun, 30 Nov 2014 13:56:44