New Pnictinogallanes [H2GaE(SiMe3)2]3 (E ) P, As)
J. Am. Chem. Soc., Vol. 120, No. 3, 1998 535
N(SiMe3)3 was obtained from Aldrich and used as received. 1H, 13C-
{1H}, and 31P NMR spectra were recorded on the Varian Unity 400
and Unity 600 spectrometers at 25 °C from toluene-d8 solutions and
referenced Vs SiMe4 by generally accepted methods. Mass spectra were
collected on a JEOL JMS-SX 102A spectrometer operating in the EI
mode at 20 eV; the assignment of the ion fragments was supported by
comparison with theoretical ion distributions. IR spectra of solids and
gaseous pyrolysis products were acquired by use of KBr pellets and a
gas cell, respectively, on a BOMEM Michelson MB-100 FT-IR
spectrometer. A calibrated manifold was used for volume estimations
of reaction gases. TGA/DTA analyses were acquired under an UHP
nitrogen flow on a TA Instruments SDT 2960 simultaneous TGA/DTA
apparatus. Elemental analyses were provided by E + R Microanalytical
Laboratory, Corona, NY. Melting points (uncorrected) were determined
with a Thomas-Hoover Uni-melt apparatus for samples flame sealed
in glass capillaries. Single-crystal X-ray diffraction study for 1 was
performed at the University of Delaware, Department of Chemistry
and Biochemistry, Newark, DE, on a Siemens P4 diffractometer, and
study for 2 was carried out at the University of Minnesota, X-ray
Crystallographic Laboratory, Minneapolis, MN, on a Siemens SMART
Platform CCD system with in both cases Mo KR radiation (λ ) 0.71073
Å) at 203(2) K for 1 and at 173(2) K for 2. All calculations were
carried out with the SHELXTL V5.0 or V5.03 suite of programs;18 the
structures were solved by direct methods. XRD data were collected
by using mineral oil coated samples on a Phillips XRD 3000
diffractometer utilizing Cu KR radiation; the average particle sizes of
GaP and GaAs pyrolysis products were calculated by using the Scherrer
equation applied to the (111) diffraction lines of the cubic GaP and
GaAs.
adducts at room temperature and only prolonged sonication or
reflux in hexane caused a removal of one Me3SiX equivalent
and the formation of [X2GaP(SiMe3)2]2. The pyrolyses of these
adducts at 450 °C under vacuum resulted in the formation of
mostly nanocrystalline GaP but also in retention of some Si/C
phases from thermal cracking of residual SiMe3 groups.1e On
1a,f,h,i
the other hand, the X3Ga/As(SiMe3)3
dehalosilylation
system was found for X ) Cl to eliminate at room temperature
approximately 2 equiv of Me3SiCl, but for X ) Br, I only 1
equiv of Me3SiX was observed. The pyrolyses of these
precursors yielded GaAs solids apparently containing none or
very little Si/C residues.
In the present study, the pyrolyses of the precursors from
the {GaH3}/P(SiMe3)3 system, compound 1 and the related
colored polymeric solid, under applied conditions afforded
nanocrystalline GaP with the average crystallite size of 2.3 (450
°C, vacuum) or 29.4 nm (600 °C, vacuum), and 5.1 nm (475
°C, vacuum), respectively. However, a mismatch between the
theoretical and observed TGA weight losses, the presence of
CH4 in the pyrolysis off-gases, and the elemental analysis of
the pyrolysates all clearly indicated an incomplete HSiMe3
elimination and the resulting cracking of the SiMe3 groups that
eventually led to the retention of Si/C amorphous phases in the
final product. Additionally, the detection of the P(SiMe3)3
byproduct pointed to other decomposition side reactions as well.
Interestingly, the analyzed silicon and carbon contents were
similar to those observed for some of the pyrolysis products
from the X3Ga/P(SiMe3)3 dehalosilylation systems.1e Regarding
the {GaH3}/As(SiMe3)3 system, the pyrolysis of pure compound
2 was not possible due to its fast decomposition at ambient
conditions. However, the reflux in xylenes (bp 137-144 °C)
of the colored polymeric solid obtained in this system resulted
in a product with an XRD spectrum that indicated the onset of
GaAs crystallinity. The pyrolysis of the polymeric solid at 450
°C under vacuum yielded nanocrystalline GaAs with the average
crystallite size of 3.4 nm as determined by XRD. Similarly
with the analogous phosphorus system, the analytical evidence
supported the retention of the Si/C species in the final product.
Additionally, there appeared to be a significant excess of
gallium, i.e., Ga/As was found at 1.5/1.0. This feature was a
likely consequence of the low barrier decomposition of the
precursors along the E(SiMe3)3 and H2 elimination pathways
which were much more acute for E ) As than for E ) P. These
pathways would have been expected to lead to some gallium
rich phase due to arsenic depletion (decay of GaH2 moieties
associated with H2 evolution plus the formation and removal
of the soluble As(SiMe3)3 byproduct). It should be stressed,
however, that the major crystalline product by XRD was the
nanosized GaAs and both the minor gallium rich and Si/C
byproducts seemed to be separate. In summary, the facile
HSiMe3 elimination-condensation chemistry for these precursors
was found to coexist and compete with other decomposition
pathways associated with the inherent fragility of the Ga-H
bonds.
Reaction System H3Ga‚NMe3/P(SiMe3)3. (1) Synthesis of [H2GaP-
(SiMe3)2]3 (1) in Et2O. A sample of freshly prepared H3Ga‚NMe3 (0.40
g, 3.0 mmol) was dissolved in 30 mL of Et2O. To this was added a
solution of P(SiMe3)3 (0.75 g, 3.0 mmol) in 15 mL of Et2O at room
temperature. After being stirred overnight, the solution was partially
evacuated to 5-10 mL and stored at -30 °C, which resulted in the
formation of small colorless crystals. The crystals were separated from
the mother liquor and evacuated for 10 min (0.48 g). After the mother
liquor was further concentrated to less than 5 mL, another batch of
crystals was obtained at -30 °C (0.10 g). Total yield, 0.58 g or 78%
based on eq 1 (vide infra). Storage of solid 1 at room temperature for
several hours to days resulted in a gradual color change to yellow.
X-ray quality crystals were first obtained at -30 °C from both the
ethereal and toluene solutions of 1; however, serious twinning problems
prevented a satisfactory crystallographic refinement. Crystals of 1 of
better quality were eventually obtained from a related reaction system
in which 1 appeared to be a major byproduct.19 Melting behavior:
150-160 °C, change of color to brown-black; no melting to 300 °C.
Anal. Found (calcd) for C18H60Ga3P3Si6: C, 28.72 (28.93); H, 7.85
(8.09). 1H NMR (400 MHz): δ 0.45 (54H, SiMe3; high-neck doublet,
apparent JP-H coupling of 4.6 Hz), 4.55 (6H, GaH2, br). 1H NMR (600
MHz): δ 0.45 (54H, SiMe3; high-neck doublet, apparent JP-H coupling
of 3.6 Hz), 4.54 (6H, GaH2). 13C{1H} NMR (400 MHz) (intensity):
δ 1.982 (80), 1.955 (100), 1.929 (100), 1.902 (80). 13C NMR (600
MHz) (intensity): δ 1.998 (85), 1.979 (100), 1.965 (80), 1.946 (90).
31P{1H} NMR (400 MHz): δ -265.8. MS: m/e (intensity)(ion): peak
clusters around 746 (3)([H2GaP(SiMe3)2]3 or M), 731 (1)(M - Me),
673 (1)(M - SiMe3), 568 (25)(M - P(SiMe3)2), 496 (100)([H2GaP-
(SiMe3)2]2 - 2H or M* - 2H), 483 (2)(M* - Me), 425 (13)(M* -
SiMe3), 409 (2)(M* - SiMe3 - Me - H), 318 (12)(M* - P(SiMe3)2
- 3H), 247 (40)(H2GaP(SiMe3)2 - H or M** - H; possible contribution
from P(SiMe3)3 at m/e 250), 235 (2)(P(SiMe3)3 - Me), 178 (28)(HP-
(SiMe3)2), 163 (11)(HP(SiMe3)2 - Me), 147 (15)(P(SiMe3)2 - 2Me),
Experimental Section
73 (26)(SiMe3), 59 (2)(HSiMe2). IR: ν(Ga-H) 1837 cm-1
.
General Techniques. All experiments were performed with stan-
dard vacuum/Schlenk techniques. Solvents were distilled from sodium
benzophenone ketyl or Na/K alloy prior to use. H3Ga‚NMe3,15
(18) SHELXTL-plus V5.03 (1) or V5.0 (2), Siemens Industrial Automa-
tion, Inc., Madison, WI.
17
P(SiMe3)3,16 and As(SiMe3)3 were prepared by literature methods.
(19) The reactions of (Et2O)2Li[µ-P(SiMe3)2]GaH2 with some compounds
of the type RnMX3-n (M ) group 13 element; R ) H, alkyl, aryl; X )
halogen; n ) 0, 1, 2), performed in our laboratory, have yielded [H2GaP-
(SiMe3)2]3 as a major byproduct. X-ray quality crystals of the trimer were
obtained from the reaction between (Et2O)2Li[µ-P(SiMe3)2]GaH2 and Me2-
BBr in toluene (Wells, R. L.; Jouette, J. R.; Janik, J. F. To be submitted for
publication).
(15) Shirk, A. E.; Shriver, D. F. Inorg. Synth. 1977, 17, 42.
(16) Becker, G.; Ho¨lderich, W. Chem. Ber. 1975, 108, 2484.
(17) (a) Becker, G.; Gutenkunst, G.; Wessely, H. J. Z. Anorg. Allg. Chem.
1980, 462, 113. (b) Wells, R. L.; Self, M. S.; Johansen, J. D.; Laske, J. A.;
Aubuchon, S. R.; Jones, L. J. Inorg. Synth. 1997, 31, 150.