Fundamental study of electrodeposition of Co and Co-P films

Article abstract of DOI:10.1149/1.2055005

Co and Co-P alloy films were electrodeposited on a rotating disk electrode. The experimental results suggested that the ratio of partial current density consumed by phosphorus deposition to the total current density was relatively small and that the competition of electrodeposition of Co²⁺ ion and H₂ gas evolution determined the phosphorus content in the Co-P film. The addition of phosphorus acid to electrolyte solution was also found to depress the preferential growth of the (100) plane, which was observed in the electrodeposition of Co film, and induced the growth of (002) plane. A further addition of phosphorus acid resulted in the formation of amorphous-like film. The diffusion model, taking into account the dissociation of H₃PO₃ molecules, was applied to calculate the pH value at the cathode surface. The surface concentrations of Co²⁺ and H₃PO₃ were also estimated from the partial current densities. The phosphorus content of the electrodeposited film has been correlated to the surface concentration of H₃PO₃ based on a concept of adsorption equilibrium of H₃PO₃. Adsorbed H₃PO₃ molecules may hinder the surface diffusion of Co atoms, which causes the formation of the amorphous-like structure of the electrodeposited film.

Full text of DOI:10.1149/1.2055005

Fundamental Study on Electrodeposition of Co and Co−
P Films
Y. Fukunaka, S. Aikawa and Z. Asaki
J. Electrochem. Soc. 1994, Volume 141, Issue 7, Pages 1783-1791.
doi: 10.1149/1.2055005
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