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Nanostructured Dense ZrO2 Thin Films from Nanoparticles Obtained by Emulsion Precipitation
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Fig. 6. HRTEM images of cross sections of a ZrO2 film prepared by film
coating after annealing at 600°C.
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formed from the larger tetragonal crystals because of large internal
stresses.
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Thin films were prepared by spreading, spin coating, and
controlled deposition and annealed at 500°–600°C. Spreading and
spin coating led to thin layers with a thickness of 6–30 nm.
Deposition by controlled deposition led to films with an average
thickness of 45–75 nm. After annealing the densely packed grains
were randomly orientated and were only 5–10 nm in size. HTXRD
and HRTEM showed that the powders and films were tetragonal
up to at least 1000°C, although the presence of cubic zirconia
cannot be excluded.
Homogeneous mono- or multilayers of nanocrystalline zirconia
with grain sizes Ͻ20 nm have been made so far only by reactive
sputter deposition and sol–gel methods. In particular, the latter
method yields very similar zirconia films to those obtained here.
However, layer deposition from premade particle dispersions
offers the advantage of milder deposition conditions and may
therefore be more adequate to coat certain substrates.
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