Hexafluorodisiloxane

Base Information

• Chemical Name: Hexafluorodisiloxane
• CAS No.: 14515-39-0
• Molecular Formula: F6O Si2
• Molecular Weight: 186.161
• Mol file: 14515-39-0.mol

Synonyms:Disiloxane,hexafluoro- (7CI,8CI,9CI); Hexafluorodisiloxane; Silicon fluoride oxide(Si2OF6)

Chemical Property of Hexafluorodisiloxane

Chemical Property:

• Refractive Index: 1.253
• PSA: 9.23000
• Density: 1.338g/cm³
• LogP: 1.69120

Purity/Quality:

97% ^*data from raw suppliers

Safty Information:

• Pictogram(s):  
• Hazard Codes: 

MSDS Files:

SDS file from LookChem

Useful:

Technology Process of Hexafluorodisiloxane

There total 8 articles about Hexafluorodisiloxane which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 68.0%

hexafluorodisilthiane (41066-09-5) + hydrogen bromide (10035-10-6,12258-64-9) → hexafluorodisiloxane (14515-39-0) + F3SiSH (95665-02-4) + silicon tetrafluoride (7783-61-1)

Guidance literature:

In neat (no solvent); byproducts: CF3SiBr; under dry N2, in a sealed tube, 60 h at room temp., molar ratio of silane and HBr was 1:1, an other non-volatile product was also formed; fractionated distn. at a low-temp. column, S-compds. were trapped at 143K, SiF4 at 77 K;

DOI:10.1002/1521-3749(200106)627:6<1217::AID-ZAAC1217>3.0.CO;2-B

Reference yield: 54.0%

trifluoro-iodo-silane (16865-60-4) + HgS, red → hexafluorodisilthiane (41066-09-5) + octafluorotrisildithiane + hexafluorodisiloxane (14515-39-0) + silicon tetrafluoride (7783-61-1)

Guidance literature:

In neat (no solvent); byproducts: HgI2; CF3SiI:HgS molar ratio was 1:2, in a sealed tube, 300 K for 7 days, under dry N2; low temp. fractionated distn., less volatile fraction was purified by passing it through a 198 K trap into a trap held at 173 K, the (F3SiS)2SiF2 was identified by NMR, its purity was 98 %;;

DOI:10.1002/1521-3749(200106)627:6<1217::AID-ZAAC1217>3.0.CO;2-B

Reference yield: 2.0%

trifluorosilane (13465-71-9) + sulfur (7704-34-9) → F2Si(H)SH (24628-34-0) + hexafluorodisiloxane (14515-39-0) + F3SiSH (95665-02-4) + silicon tetrafluoride (7783-61-1)

Guidance literature:

In gas; byproducts: H2S; equimolar amts. of F3SiH and S was reacted in an ampoule at 620 K for 48h; yield of F3SiSH was increased to 6 % at 620 K during 10 h;; volatiles were trapped at 123 and 77 K, fractionated distn., products were identified by NMR and vapor phase IR;

DOI:10.1002/1521-3749(200106)627:6<1217::AID-ZAAC1217>3.0.CO;2-B

upstream raw materials:

Dichlorodifluoromethane

silicon

antimony(III) fluoride

hexachlorodisiloxane

Downstream raw materials:

uranium pentafluoride

silicon tetrafluoride

uranyl fluoride

β-uranium(V) fluoride

Refernces

• 1、 Dement'ev,Koshlyakov,Chesnokov. "Gas-phase oxidation of vinyltrifluorosilane with nitrogen dioxide under the action of a pulse CO2 laser". experimental part. p. 624 - 634. Retrieved 2011/02/16.